Ultraviolet-induced deposition of SiO[sub 2] film from tetraethoxysilane spin-coated on Si

The authors have previously proposed a method for depositing silicon dioxide films on Si from tetraethoxysilane Si(OC[sub 2]H[sub 5])[sub 4] (TEOS) using ultraviolet (UV) light from a low pressure mercury lamp. In the method, an organic solution which contains TEOS is spin-coated onto a Si wafer sur...

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Veröffentlicht in:	Journal of the Electrochemical Society 1994-06, Vol.141:6
Hauptverfasser:	Niwano, Michio, Kinashi, Koji, Saito, Kazuhiko, Miyamoto, Nobuo, Honma, Koji
Format:	Artikel
Sprache:	eng
Schlagworte:	360601 - Other Materials- Preparation & Manufacture 360606 - Other Materials- Physical Properties- (1992-) 400500 - Photochemistry CHALCOGENIDES CHEMICAL REACTIONS COATINGS DEPOSITION ELECTROMAGNETIC RADIATION ELEMENTS HYDRIDES HYDROGEN COMPOUNDS INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY MATERIALS SCIENCE ORGANIC COMPOUNDS ORGANIC SILICON COMPOUNDS OXIDES OXYGEN COMPOUNDS PHOTOCHEMICAL REACTIONS PHYSICAL PROPERTIES RADIATIONS SEMIMETALS SILANES SILICON SILICON COMPOUNDS SILICON OXIDES SPIN-ON COATING SPIN-ON COATINGS SURFACE COATING SYNTHESIS THERMODYNAMIC PROPERTIES ULTRAVIOLET RADIATION
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