Plasma etched polycrystalline hot-filament chemical vapor deposited diamond thin films and their electrical characteristics

Etching of hot-filament, chemical vapor deposited, diamond thin films utilizing low energy ion irradiation was investigated. The films used in this study were boron doped polycrystalline diamond, deposited on p-type (100) oriented silicon substrates. A low voltage dc corona discharge with an oxygen...

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Veröffentlicht in:	Applied physics letters 1994-11, Vol.65 (22), p.2827-2829
Hauptverfasser:	Liaw, B. Y., Stacy, T., Zhao, G., Charlson, E. J., Charlson, E. M., Meese, J. M., Prelas, M. A.
Format:	Artikel
Sprache:	eng
Schlagworte:	665300 > Interactions Between Beams & Condensed Matter-- (1992-) CARBON CHEMICAL COATING CHEMICAL VAPOR DEPOSITION CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY CORONA DISCHARGES DAMAGE DEPOSITION DIAMONDS ELECTRIC DISCHARGES ELECTRICAL PROPERTIES ELEMENTAL MINERALS ELEMENTS ETCHING MATERIALS SCIENCE MINERALS NONMETALS PHYSICAL PROPERTIES PLASMA SCHOTTKY BARRIER DIODES SEMICONDUCTOR DEVICES SEMICONDUCTOR DIODES SPUTTERING SURFACE COATING SURFACE FINISHING 360605 > Materials-- Radiation Effects SURFACE PROPERTIES
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