Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors

Freeze-out behavior of radiation hardened N polysilicon gate CMOS devices is studied at liquid-nitrogen temperature before and after irradiation at different dose levels. Explanations are given for the threshold voltage variations and freeze-out effects both before and after irradiation. The degree...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) 1991-12, Vol.38 (6), p.1289-1296
Hauptverfasser: PANTELAKIS, D. C, HEMMENWAY, D. F, VAN VONNO, N. W, SANDERS, T. J
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1296
container_issue 6
container_start_page 1289
container_title IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
container_volume 38
creator PANTELAKIS, D. C
HEMMENWAY, D. F
VAN VONNO, N. W
SANDERS, T. J
description Freeze-out behavior of radiation hardened N polysilicon gate CMOS devices is studied at liquid-nitrogen temperature before and after irradiation at different dose levels. Explanations are given for the threshold voltage variations and freeze-out effects both before and after irradiation. The degree of freeze-out of the counterdope implant is controlled by temperature, applied gate potential, and applied body-to-source potential. Based on experimental results of this work, freeze-out is not significantly affected by irradiation doses, or the magnitude of the gate bias during radiation
doi_str_mv 10.1109/23.124107
format Article
fullrecord <record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_5825970</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>28301024</sourcerecordid><originalsourceid>FETCH-LOGICAL-o240t-c0fd32d9a178fbe748002f38934e7a6b219800a018632f43d7f8aabc7111b17a3</originalsourceid><addsrcrecordid>eNotj81LAzEQxYMoWKsH_4NFxItszeSjSY5S_IJqD-p5mWazNrLd1CQ9tH-9gfY0vDc_Zt4j5BroBICaB8YnwARQdUJGIKWuQSp9SkaUgq6NMOacXKT0W6SQVI7I93N0bu_qsM2VXWFEm130e8w-DFXoqoitP4iybN3g2urjfhP6XfK9t8X-weyq2fvis8oRh-RTDjFdkrMO--SujnNc_jx9zV7r-eLlbfY4rwMTNNeWdi1nrUFQuls6JTSlrOPacOEUTpcMTHGwRJ9y1gneqk4jLq0CgCUo5GNyc7gbUvZNsj47uyqpBmdzIzWTRtEC3R2gTQx_W5dys_bJur7HwYVtapjmFCgTBbw9gpgs9l3pY31qNtGvMe4aCVNBleH_KB9rKQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28301024</pqid></control><display><type>article</type><title>Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors</title><source>IEEE Electronic Library (IEL)</source><creator>PANTELAKIS, D. C ; HEMMENWAY, D. F ; VAN VONNO, N. W ; SANDERS, T. J</creator><creatorcontrib>PANTELAKIS, D. C ; HEMMENWAY, D. F ; VAN VONNO, N. W ; SANDERS, T. J</creatorcontrib><description>Freeze-out behavior of radiation hardened N polysilicon gate CMOS devices is studied at liquid-nitrogen temperature before and after irradiation at different dose levels. Explanations are given for the threshold voltage variations and freeze-out effects both before and after irradiation. The degree of freeze-out of the counterdope implant is controlled by temperature, applied gate potential, and applied body-to-source potential. Based on experimental results of this work, freeze-out is not significantly affected by irradiation doses, or the magnitude of the gate bias during radiation</description><identifier>ISSN: 0018-9499</identifier><identifier>EISSN: 1558-1578</identifier><identifier>DOI: 10.1109/23.124107</identifier><identifier>CODEN: IETNAE</identifier><language>eng</language><publisher>New York, NY: Institute of Electrical and Electronics Engineers</publisher><subject>426000 -- Engineering-- Components, Electron Devices &amp; Circuits-- (1990-) ; Applied sciences ; CRYSTALS ; Design. Technologies. Operation analysis. Testing ; DOSE RATES ; ELECTRODES ; Electronics ; ELEMENTS ; ENERGY ; ENGINEERING ; Exact sciences and technology ; HARDENING ; INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY ; Integrated circuits ; MOS TRANSISTORS ; PHYSICAL RADIATION EFFECTS ; POLYCRYSTALS ; RADIATION EFFECTS ; RADIATION HARDENING ; SEMICONDUCTOR DEVICES ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; SEMIMETALS ; SILICON ; TEMPERATURE RANGE ; TEMPERATURE RANGE 0065-0273 K ; THRESHOLD ENERGY ; TRANSISTORS 440200 -- Radiation Effects on Instrument Components, Instruments, or Electronic Systems</subject><ispartof>IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), 1991-12, Vol.38 (6), p.1289-1296</ispartof><rights>1992 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,309,310,314,776,780,785,786,881,23910,23911,25119,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=5164079$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/5825970$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>PANTELAKIS, D. C</creatorcontrib><creatorcontrib>HEMMENWAY, D. F</creatorcontrib><creatorcontrib>VAN VONNO, N. W</creatorcontrib><creatorcontrib>SANDERS, T. J</creatorcontrib><title>Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors</title><title>IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)</title><description>Freeze-out behavior of radiation hardened N polysilicon gate CMOS devices is studied at liquid-nitrogen temperature before and after irradiation at different dose levels. Explanations are given for the threshold voltage variations and freeze-out effects both before and after irradiation. The degree of freeze-out of the counterdope implant is controlled by temperature, applied gate potential, and applied body-to-source potential. Based on experimental results of this work, freeze-out is not significantly affected by irradiation doses, or the magnitude of the gate bias during radiation</description><subject>426000 -- Engineering-- Components, Electron Devices &amp; Circuits-- (1990-)</subject><subject>Applied sciences</subject><subject>CRYSTALS</subject><subject>Design. Technologies. Operation analysis. Testing</subject><subject>DOSE RATES</subject><subject>ELECTRODES</subject><subject>Electronics</subject><subject>ELEMENTS</subject><subject>ENERGY</subject><subject>ENGINEERING</subject><subject>Exact sciences and technology</subject><subject>HARDENING</subject><subject>INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY</subject><subject>Integrated circuits</subject><subject>MOS TRANSISTORS</subject><subject>PHYSICAL RADIATION EFFECTS</subject><subject>POLYCRYSTALS</subject><subject>RADIATION EFFECTS</subject><subject>RADIATION HARDENING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>SEMIMETALS</subject><subject>SILICON</subject><subject>TEMPERATURE RANGE</subject><subject>TEMPERATURE RANGE 0065-0273 K</subject><subject>THRESHOLD ENERGY</subject><subject>TRANSISTORS 440200 -- Radiation Effects on Instrument Components, Instruments, or Electronic Systems</subject><issn>0018-9499</issn><issn>1558-1578</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1991</creationdate><recordtype>article</recordtype><recordid>eNotj81LAzEQxYMoWKsH_4NFxItszeSjSY5S_IJqD-p5mWazNrLd1CQ9tH-9gfY0vDc_Zt4j5BroBICaB8YnwARQdUJGIKWuQSp9SkaUgq6NMOacXKT0W6SQVI7I93N0bu_qsM2VXWFEm130e8w-DFXoqoitP4iybN3g2urjfhP6XfK9t8X-weyq2fvis8oRh-RTDjFdkrMO--SujnNc_jx9zV7r-eLlbfY4rwMTNNeWdi1nrUFQuls6JTSlrOPacOEUTpcMTHGwRJ9y1gneqk4jLq0CgCUo5GNyc7gbUvZNsj47uyqpBmdzIzWTRtEC3R2gTQx_W5dys_bJur7HwYVtapjmFCgTBbw9gpgs9l3pY31qNtGvMe4aCVNBleH_KB9rKQ</recordid><startdate>19911201</startdate><enddate>19911201</enddate><creator>PANTELAKIS, D. C</creator><creator>HEMMENWAY, D. F</creator><creator>VAN VONNO, N. W</creator><creator>SANDERS, T. J</creator><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>19911201</creationdate><title>Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors</title><author>PANTELAKIS, D. C ; HEMMENWAY, D. F ; VAN VONNO, N. W ; SANDERS, T. J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o240t-c0fd32d9a178fbe748002f38934e7a6b219800a018632f43d7f8aabc7111b17a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1991</creationdate><topic>426000 -- Engineering-- Components, Electron Devices &amp; Circuits-- (1990-)</topic><topic>Applied sciences</topic><topic>CRYSTALS</topic><topic>Design. Technologies. Operation analysis. Testing</topic><topic>DOSE RATES</topic><topic>ELECTRODES</topic><topic>Electronics</topic><topic>ELEMENTS</topic><topic>ENERGY</topic><topic>ENGINEERING</topic><topic>Exact sciences and technology</topic><topic>HARDENING</topic><topic>INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY</topic><topic>Integrated circuits</topic><topic>MOS TRANSISTORS</topic><topic>PHYSICAL RADIATION EFFECTS</topic><topic>POLYCRYSTALS</topic><topic>RADIATION EFFECTS</topic><topic>RADIATION HARDENING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>SEMIMETALS</topic><topic>SILICON</topic><topic>TEMPERATURE RANGE</topic><topic>TEMPERATURE RANGE 0065-0273 K</topic><topic>THRESHOLD ENERGY</topic><topic>TRANSISTORS 440200 -- Radiation Effects on Instrument Components, Instruments, or Electronic Systems</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>PANTELAKIS, D. C</creatorcontrib><creatorcontrib>HEMMENWAY, D. F</creatorcontrib><creatorcontrib>VAN VONNO, N. W</creatorcontrib><creatorcontrib>SANDERS, T. J</creatorcontrib><collection>Pascal-Francis</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>PANTELAKIS, D. C</au><au>HEMMENWAY, D. F</au><au>VAN VONNO, N. W</au><au>SANDERS, T. J</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors</atitle><jtitle>IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)</jtitle><date>1991-12-01</date><risdate>1991</risdate><volume>38</volume><issue>6</issue><spage>1289</spage><epage>1296</epage><pages>1289-1296</pages><issn>0018-9499</issn><eissn>1558-1578</eissn><coden>IETNAE</coden><abstract>Freeze-out behavior of radiation hardened N polysilicon gate CMOS devices is studied at liquid-nitrogen temperature before and after irradiation at different dose levels. Explanations are given for the threshold voltage variations and freeze-out effects both before and after irradiation. The degree of freeze-out of the counterdope implant is controlled by temperature, applied gate potential, and applied body-to-source potential. Based on experimental results of this work, freeze-out is not significantly affected by irradiation doses, or the magnitude of the gate bias during radiation</abstract><cop>New York, NY</cop><pub>Institute of Electrical and Electronics Engineers</pub><doi>10.1109/23.124107</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0018-9499
ispartof IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), 1991-12, Vol.38 (6), p.1289-1296
issn 0018-9499
1558-1578
language eng
recordid cdi_osti_scitechconnect_5825970
source IEEE Electronic Library (IEL)
subjects 426000 -- Engineering-- Components, Electron Devices & Circuits-- (1990-)
Applied sciences
CRYSTALS
Design. Technologies. Operation analysis. Testing
DOSE RATES
ELECTRODES
Electronics
ELEMENTS
ENERGY
ENGINEERING
Exact sciences and technology
HARDENING
INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
Integrated circuits
MOS TRANSISTORS
PHYSICAL RADIATION EFFECTS
POLYCRYSTALS
RADIATION EFFECTS
RADIATION HARDENING
SEMICONDUCTOR DEVICES
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
SEMIMETALS
SILICON
TEMPERATURE RANGE
TEMPERATURE RANGE 0065-0273 K
THRESHOLD ENERGY
TRANSISTORS 440200 -- Radiation Effects on Instrument Components, Instruments, or Electronic Systems
title Freeze-out characterization of radiation hardened N+polysilicon gate CMOS transistors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T22%3A54%3A23IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Freeze-out%20characterization%20of%20radiation%20hardened%20N+polysilicon%20gate%20CMOS%20transistors&rft.jtitle=IEEE%20Transactions%20on%20Nuclear%20Science%20(Institute%20of%20Electrical%20and%20Electronics%20Engineers);%20(United%20States)&rft.au=PANTELAKIS,%20D.%20C&rft.date=1991-12-01&rft.volume=38&rft.issue=6&rft.spage=1289&rft.epage=1296&rft.pages=1289-1296&rft.issn=0018-9499&rft.eissn=1558-1578&rft.coden=IETNAE&rft_id=info:doi/10.1109/23.124107&rft_dat=%3Cproquest_osti_%3E28301024%3C/proquest_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28301024&rft_id=info:pmid/&rfr_iscdi=true