Nucleation and growth of AlN : self-limiting reactions and the regeneration of active sites using sequential exposures of trimethylaluminum and ammonia on silica at 600 K

The sequential reactions of trimethylaluminum (TMA) and ammonia have been studied in the 1-Torr pressure regime at 600 K with FTIR (Fourier transform infrared spectroscopy) and XPS (X-ray photoelectron spectroscopy). Transmission FTIR spectra acquired through a silica substrate reveal that extended...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Chemistry of materials 1993-10, Vol.5 (10), p.1424-1430
Hauptverfasser:	BARTRAM, M. E, MICHALSKE, T. A, ROGERS, J. W, PAINE, R. T
Format:	Artikel
Sprache:	eng
Schlagworte:	360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication ABSORPTION SPECTROSCOPY ALUMINIUM COMPOUNDS ALUMINIUM NITRIDES Cross-disciplinary physics: materials science rheology Exact sciences and technology GROWTH MATERIALS SCIENCE Methods of deposition of films and coatings film growth and epitaxy NITRIDES NITROGEN COMPOUNDS ORGANIC COMPOUNDS ORGANOMETALLIC COMPOUNDS Physics PNICTIDES SPECTROSCOPY X-RAY SPECTROSCOPY
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!