Effect of anisotropic strain on the crosshatch electrical activity in relaxed GeSi films

The physical origin of the crosshatch electrical activity in relaxed GeSi films was studied using a near-field scanning optical microscope (NSOM). The contrast and patterns in the near-field photocurrent images depend on the polarization direction of the NSOM light. These results rule out compositio...

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Veröffentlicht in:Physical review letters 2001-04, Vol.86 (16), p.3598-3601
Hauptverfasser: Gray, M H, Hsu, J W, Giovane, L, Bulsara, M T
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container_title Physical review letters
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creator Gray, M H
Hsu, J W
Giovane, L
Bulsara, M T
description The physical origin of the crosshatch electrical activity in relaxed GeSi films was studied using a near-field scanning optical microscope (NSOM). The contrast and patterns in the near-field photocurrent images depend on the polarization direction of the NSOM light. These results rule out composition nonuniformity, junction depth variation, and scanning artifacts as dominant sources of the contrast. Numerical calculations show that local changes in band structure due to strain fields of the misfit dislocations are responsible for the experimental observations.
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subjects CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
DISLOCATIONS
OPTICAL MICROSCOPES
ORIGIN
PHOTOCURRENTS
POLARIZATION
STRAINS
title Effect of anisotropic strain on the crosshatch electrical activity in relaxed GeSi films
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