Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations
The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell model. Three distinct regimes of plasma behavior can be identified as a function of the magnetic field. In the first regime at...
Gespeichert in:
Veröffentlicht in: | Physics of plasmas 2024-10, Vol.31 (10) |
---|---|
Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | 10 |
container_start_page | |
container_title | Physics of plasmas |
container_volume | 31 |
creator | Ganta, Sathya S Bera, Kallol Rauf, Shahid Kaganovich, Igor Khrabrov, Alexander Powis, Andrew T Sydorenko, Dmytro Xu, Liang |
description | The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell model. Three distinct regimes of plasma behavior can be identified as a function of the magnetic field. In the first regime at low magnetic fields, asymmetric plasma profiles are observed within the CCP chamber due to the effect of
E→×B→ drift. As the magnetic field increases, instabilities develop and form self-organized spoke-shaped structures that are distinctly seen within the bulk plasma closer to the sheath. In this second regime, the spoke-shaped coherent structures rotate inside the plasma chamber in the
−E→×B→ direction, where
E→ and
B→ are the DC electric and magnetic field vectors, respectively, and the DC electric field exists in the sheath and pre-sheath regions. The spoke rotation frequency is in the megahertz range. As the magnetic field strength increases further, the rotating coherent spokes continue to exist near the sheath. The coherent structures are, however, accompanied by new small-scale incoherent structures originating and moving within the bulk plasma region away from the sheath. This is the third regime of plasma behavior. The threshold values of the magnetic field between these regimes were found not to vary with changing plasma reactor geometry (e.g., area ratio between ground and powered electrodes) or the use of an external capacitor between the RF-powered electrode and the RF source. The threshold values of the magnetic field between these regimes shift toward higher values with increasing gas pressure. Analysis of the results indicates that the rotating structures are due to the lower hybrid instability driven by density gradients and electron-neutral collisions. This paper provides guidance on the upper limit of the magnetic field for instability-free operation in low-pressure CCP-based semiconductor deposition and etch systems that use the external magnetic field for plasma uniformity control. |
doi_str_mv | 10.1063/5.0221111 |
format | Article |
fullrecord | <record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_2478144</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3123905838</sourcerecordid><originalsourceid>FETCH-LOGICAL-c209t-451ac3da07cce40fd7a4768377c8bcd33fe152636d7d3dd44d72f402e3bd1f283</originalsourceid><addsrcrecordid>eNp9kU1LAzEQhhdRsFYP_oOgFytszddutkcpVguCIgreQppka0o2uya7lXrwt5t1e3YuMwMP77wzkyTnCE4RzMlNNoUYoxgHyQjBYpaynNHDvmYwzXP6fpychLCBENI8K0bJz9JtdWjNWrTGrYFxoRUrY01rdIgdqMTa6dZ8awVs_ZU2XofQeQ2kaISM1FbbHZB119hIvCxAY0WoBOhCr9YI3xppdWpcKrW14Op5OZ-AYKrOxnm1C6fJUSls0Gf7PE7eFnev84f08el-Ob99TCWGszalGRKSKAGZlJrCUjFBWV4QxmSxkoqQUqMM5yRXTBGlKFUMlxRiTVYKlbgg4-Ri0K3jrjxE51p-yNo5LVuOKSsQpRG6HKDG159dvArf1J130RcnCJMZzArSS00GSvo6BK9L3nhTCb_jCPL-Bzzj-x9E9npg-4l_G_8D_wL69ofA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>3123905838</pqid></control><display><type>article</type><title>Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations</title><source>Alma/SFX Local Collection</source><creator>Ganta, Sathya S ; Bera, Kallol ; Rauf, Shahid ; Kaganovich, Igor ; Khrabrov, Alexander ; Powis, Andrew T ; Sydorenko, Dmytro ; Xu, Liang</creator><creatorcontrib>Ganta, Sathya S ; Bera, Kallol ; Rauf, Shahid ; Kaganovich, Igor ; Khrabrov, Alexander ; Powis, Andrew T ; Sydorenko, Dmytro ; Xu, Liang ; Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)</creatorcontrib><description>The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell model. Three distinct regimes of plasma behavior can be identified as a function of the magnetic field. In the first regime at low magnetic fields, asymmetric plasma profiles are observed within the CCP chamber due to the effect of
E→×B→ drift. As the magnetic field increases, instabilities develop and form self-organized spoke-shaped structures that are distinctly seen within the bulk plasma closer to the sheath. In this second regime, the spoke-shaped coherent structures rotate inside the plasma chamber in the
−E→×B→ direction, where
E→ and
B→ are the DC electric and magnetic field vectors, respectively, and the DC electric field exists in the sheath and pre-sheath regions. The spoke rotation frequency is in the megahertz range. As the magnetic field strength increases further, the rotating coherent spokes continue to exist near the sheath. The coherent structures are, however, accompanied by new small-scale incoherent structures originating and moving within the bulk plasma region away from the sheath. This is the third regime of plasma behavior. The threshold values of the magnetic field between these regimes were found not to vary with changing plasma reactor geometry (e.g., area ratio between ground and powered electrodes) or the use of an external capacitor between the RF-powered electrode and the RF source. The threshold values of the magnetic field between these regimes shift toward higher values with increasing gas pressure. Analysis of the results indicates that the rotating structures are due to the lower hybrid instability driven by density gradients and electron-neutral collisions. This paper provides guidance on the upper limit of the magnetic field for instability-free operation in low-pressure CCP-based semiconductor deposition and etch systems that use the external magnetic field for plasma uniformity control.</description><identifier>ISSN: 1070-664X</identifier><identifier>EISSN: 1089-7674</identifier><identifier>DOI: 10.1063/5.0221111</identifier><identifier>CODEN: PHPAEN</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Bulk density ; Chambers ; Density gradients ; Direct current ; Electric field strength ; Electrical grounding ; Electrodes ; Electrons ; External pressure ; Gas pressure ; Low pressure ; Magnetic fields ; Particle in cell technique ; Plasma ; Pressure effects ; Radio frequency ; Rotating plasmas ; Rotation ; Sheaths ; Spokes ; Structural stability</subject><ispartof>Physics of plasmas, 2024-10, Vol.31 (10)</ispartof><rights>Author(s)</rights><rights>2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c209t-451ac3da07cce40fd7a4768377c8bcd33fe152636d7d3dd44d72f402e3bd1f283</cites><orcidid>0000-0002-9948-8098 ; 0009-0009-9705-7225 ; 0000-0003-0755-8376 ; 0000-0002-2791-203X ; 0000-0002-8729-1984 ; 0000-0001-5689-6115 ; 0000-0003-0653-5682 ; 0000000306535682 ; 0000000307558376 ; 0000000299488098 ; 000000022791203X ; 0000000156896115 ; 0000000287291984 ; 0009000997057225</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882,27905,27906</link.rule.ids><backlink>$$Uhttps://www.osti.gov/servlets/purl/2478144$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Ganta, Sathya S</creatorcontrib><creatorcontrib>Bera, Kallol</creatorcontrib><creatorcontrib>Rauf, Shahid</creatorcontrib><creatorcontrib>Kaganovich, Igor</creatorcontrib><creatorcontrib>Khrabrov, Alexander</creatorcontrib><creatorcontrib>Powis, Andrew T</creatorcontrib><creatorcontrib>Sydorenko, Dmytro</creatorcontrib><creatorcontrib>Xu, Liang</creatorcontrib><creatorcontrib>Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)</creatorcontrib><title>Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations</title><title>Physics of plasmas</title><description>The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell model. Three distinct regimes of plasma behavior can be identified as a function of the magnetic field. In the first regime at low magnetic fields, asymmetric plasma profiles are observed within the CCP chamber due to the effect of
E→×B→ drift. As the magnetic field increases, instabilities develop and form self-organized spoke-shaped structures that are distinctly seen within the bulk plasma closer to the sheath. In this second regime, the spoke-shaped coherent structures rotate inside the plasma chamber in the
−E→×B→ direction, where
E→ and
B→ are the DC electric and magnetic field vectors, respectively, and the DC electric field exists in the sheath and pre-sheath regions. The spoke rotation frequency is in the megahertz range. As the magnetic field strength increases further, the rotating coherent spokes continue to exist near the sheath. The coherent structures are, however, accompanied by new small-scale incoherent structures originating and moving within the bulk plasma region away from the sheath. This is the third regime of plasma behavior. The threshold values of the magnetic field between these regimes were found not to vary with changing plasma reactor geometry (e.g., area ratio between ground and powered electrodes) or the use of an external capacitor between the RF-powered electrode and the RF source. The threshold values of the magnetic field between these regimes shift toward higher values with increasing gas pressure. Analysis of the results indicates that the rotating structures are due to the lower hybrid instability driven by density gradients and electron-neutral collisions. This paper provides guidance on the upper limit of the magnetic field for instability-free operation in low-pressure CCP-based semiconductor deposition and etch systems that use the external magnetic field for plasma uniformity control.</description><subject>Bulk density</subject><subject>Chambers</subject><subject>Density gradients</subject><subject>Direct current</subject><subject>Electric field strength</subject><subject>Electrical grounding</subject><subject>Electrodes</subject><subject>Electrons</subject><subject>External pressure</subject><subject>Gas pressure</subject><subject>Low pressure</subject><subject>Magnetic fields</subject><subject>Particle in cell technique</subject><subject>Plasma</subject><subject>Pressure effects</subject><subject>Radio frequency</subject><subject>Rotating plasmas</subject><subject>Rotation</subject><subject>Sheaths</subject><subject>Spokes</subject><subject>Structural stability</subject><issn>1070-664X</issn><issn>1089-7674</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNp9kU1LAzEQhhdRsFYP_oOgFytszddutkcpVguCIgreQppka0o2uya7lXrwt5t1e3YuMwMP77wzkyTnCE4RzMlNNoUYoxgHyQjBYpaynNHDvmYwzXP6fpychLCBENI8K0bJz9JtdWjNWrTGrYFxoRUrY01rdIgdqMTa6dZ8awVs_ZU2XofQeQ2kaISM1FbbHZB119hIvCxAY0WoBOhCr9YI3xppdWpcKrW14Op5OZ-AYKrOxnm1C6fJUSls0Gf7PE7eFnev84f08el-Ob99TCWGszalGRKSKAGZlJrCUjFBWV4QxmSxkoqQUqMM5yRXTBGlKFUMlxRiTVYKlbgg4-Ri0K3jrjxE51p-yNo5LVuOKSsQpRG6HKDG159dvArf1J130RcnCJMZzArSS00GSvo6BK9L3nhTCb_jCPL-Bzzj-x9E9npg-4l_G_8D_wL69ofA</recordid><startdate>20241001</startdate><enddate>20241001</enddate><creator>Ganta, Sathya S</creator><creator>Bera, Kallol</creator><creator>Rauf, Shahid</creator><creator>Kaganovich, Igor</creator><creator>Khrabrov, Alexander</creator><creator>Powis, Andrew T</creator><creator>Sydorenko, Dmytro</creator><creator>Xu, Liang</creator><general>American Institute of Physics</general><general>American Institute of Physics (AIP)</general><scope>AJDQP</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>OIOZB</scope><scope>OTOTI</scope><orcidid>https://orcid.org/0000-0002-9948-8098</orcidid><orcidid>https://orcid.org/0009-0009-9705-7225</orcidid><orcidid>https://orcid.org/0000-0003-0755-8376</orcidid><orcidid>https://orcid.org/0000-0002-2791-203X</orcidid><orcidid>https://orcid.org/0000-0002-8729-1984</orcidid><orcidid>https://orcid.org/0000-0001-5689-6115</orcidid><orcidid>https://orcid.org/0000-0003-0653-5682</orcidid><orcidid>https://orcid.org/0000000306535682</orcidid><orcidid>https://orcid.org/0000000307558376</orcidid><orcidid>https://orcid.org/0000000299488098</orcidid><orcidid>https://orcid.org/000000022791203X</orcidid><orcidid>https://orcid.org/0000000156896115</orcidid><orcidid>https://orcid.org/0000000287291984</orcidid><orcidid>https://orcid.org/0009000997057225</orcidid></search><sort><creationdate>20241001</creationdate><title>Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations</title><author>Ganta, Sathya S ; Bera, Kallol ; Rauf, Shahid ; Kaganovich, Igor ; Khrabrov, Alexander ; Powis, Andrew T ; Sydorenko, Dmytro ; Xu, Liang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c209t-451ac3da07cce40fd7a4768377c8bcd33fe152636d7d3dd44d72f402e3bd1f283</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Bulk density</topic><topic>Chambers</topic><topic>Density gradients</topic><topic>Direct current</topic><topic>Electric field strength</topic><topic>Electrical grounding</topic><topic>Electrodes</topic><topic>Electrons</topic><topic>External pressure</topic><topic>Gas pressure</topic><topic>Low pressure</topic><topic>Magnetic fields</topic><topic>Particle in cell technique</topic><topic>Plasma</topic><topic>Pressure effects</topic><topic>Radio frequency</topic><topic>Rotating plasmas</topic><topic>Rotation</topic><topic>Sheaths</topic><topic>Spokes</topic><topic>Structural stability</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ganta, Sathya S</creatorcontrib><creatorcontrib>Bera, Kallol</creatorcontrib><creatorcontrib>Rauf, Shahid</creatorcontrib><creatorcontrib>Kaganovich, Igor</creatorcontrib><creatorcontrib>Khrabrov, Alexander</creatorcontrib><creatorcontrib>Powis, Andrew T</creatorcontrib><creatorcontrib>Sydorenko, Dmytro</creatorcontrib><creatorcontrib>Xu, Liang</creatorcontrib><creatorcontrib>Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)</creatorcontrib><collection>AIP Open Access Journals</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV - Hybrid</collection><collection>OSTI.GOV</collection><jtitle>Physics of plasmas</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ganta, Sathya S</au><au>Bera, Kallol</au><au>Rauf, Shahid</au><au>Kaganovich, Igor</au><au>Khrabrov, Alexander</au><au>Powis, Andrew T</au><au>Sydorenko, Dmytro</au><au>Xu, Liang</au><aucorp>Princeton Plasma Physics Laboratory (PPPL), Princeton, NJ (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations</atitle><jtitle>Physics of plasmas</jtitle><date>2024-10-01</date><risdate>2024</risdate><volume>31</volume><issue>10</issue><issn>1070-664X</issn><eissn>1089-7674</eissn><coden>PHPAEN</coden><abstract>The effect of a uniform magnetic field on particle transport in low-pressure radio frequency (RF) capacitively coupled plasma (CCP) has been studied using a particle-in-cell model. Three distinct regimes of plasma behavior can be identified as a function of the magnetic field. In the first regime at low magnetic fields, asymmetric plasma profiles are observed within the CCP chamber due to the effect of
E→×B→ drift. As the magnetic field increases, instabilities develop and form self-organized spoke-shaped structures that are distinctly seen within the bulk plasma closer to the sheath. In this second regime, the spoke-shaped coherent structures rotate inside the plasma chamber in the
−E→×B→ direction, where
E→ and
B→ are the DC electric and magnetic field vectors, respectively, and the DC electric field exists in the sheath and pre-sheath regions. The spoke rotation frequency is in the megahertz range. As the magnetic field strength increases further, the rotating coherent spokes continue to exist near the sheath. The coherent structures are, however, accompanied by new small-scale incoherent structures originating and moving within the bulk plasma region away from the sheath. This is the third regime of plasma behavior. The threshold values of the magnetic field between these regimes were found not to vary with changing plasma reactor geometry (e.g., area ratio between ground and powered electrodes) or the use of an external capacitor between the RF-powered electrode and the RF source. The threshold values of the magnetic field between these regimes shift toward higher values with increasing gas pressure. Analysis of the results indicates that the rotating structures are due to the lower hybrid instability driven by density gradients and electron-neutral collisions. This paper provides guidance on the upper limit of the magnetic field for instability-free operation in low-pressure CCP-based semiconductor deposition and etch systems that use the external magnetic field for plasma uniformity control.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/5.0221111</doi><tpages>18</tpages><orcidid>https://orcid.org/0000-0002-9948-8098</orcidid><orcidid>https://orcid.org/0009-0009-9705-7225</orcidid><orcidid>https://orcid.org/0000-0003-0755-8376</orcidid><orcidid>https://orcid.org/0000-0002-2791-203X</orcidid><orcidid>https://orcid.org/0000-0002-8729-1984</orcidid><orcidid>https://orcid.org/0000-0001-5689-6115</orcidid><orcidid>https://orcid.org/0000-0003-0653-5682</orcidid><orcidid>https://orcid.org/0000000306535682</orcidid><orcidid>https://orcid.org/0000000307558376</orcidid><orcidid>https://orcid.org/0000000299488098</orcidid><orcidid>https://orcid.org/000000022791203X</orcidid><orcidid>https://orcid.org/0000000156896115</orcidid><orcidid>https://orcid.org/0000000287291984</orcidid><orcidid>https://orcid.org/0009000997057225</orcidid><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1070-664X |
ispartof | Physics of plasmas, 2024-10, Vol.31 (10) |
issn | 1070-664X 1089-7674 |
language | eng |
recordid | cdi_osti_scitechconnect_2478144 |
source | Alma/SFX Local Collection |
subjects | Bulk density Chambers Density gradients Direct current Electric field strength Electrical grounding Electrodes Electrons External pressure Gas pressure Low pressure Magnetic fields Particle in cell technique Plasma Pressure effects Radio frequency Rotating plasmas Rotation Sheaths Spokes Structural stability |
title | Investigating instabilities in magnetized low-pressure capacitively coupled RF plasma using particle-in-cell (PIC) simulations |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T19%3A11%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Investigating%20instabilities%20in%20magnetized%20low-pressure%20capacitively%20coupled%20RF%20plasma%20using%20particle-in-cell%20(PIC)%20simulations&rft.jtitle=Physics%20of%20plasmas&rft.au=Ganta,%20Sathya%20S&rft.aucorp=Princeton%20Plasma%20Physics%20Laboratory%20(PPPL),%20Princeton,%20NJ%20(United%20States)&rft.date=2024-10-01&rft.volume=31&rft.issue=10&rft.issn=1070-664X&rft.eissn=1089-7674&rft.coden=PHPAEN&rft_id=info:doi/10.1063/5.0221111&rft_dat=%3Cproquest_osti_%3E3123905838%3C/proquest_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=3123905838&rft_id=info:pmid/&rfr_iscdi=true |