Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange

Metal sulfide and oxysulfide thin films deposited by atomic layer deposition (ALD) are important functional materials for a range of applications including solar cells, catalysts, and electronic devices. However, ALD of sulfur-containing films typically requires H2S, a toxic, corrosive, and flammabl...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Chemistry of materials 2023-03, Vol.35 (6), p.2503-2517
Hauptverfasser:	Lenef, Julia D., Gayle, Andrew J., Jo, Jaesung, Fuelling, Kalyn M., Yadavalli, Srinivas K., Ortiz-Ortiz, Alondra M., Sun, Kai, Peterson, Rebecca L., Dasgupta, Neil P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry Materials Science
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!