Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction
Not provided.
Gespeichert in:
| Veröffentlicht in: | Journal of the American Chemical Society 2022-12, Vol.145 (1) |
|---|---|
| Hauptverfasser: | , , , , , , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 1 |
| container_start_page | |
| container_title | Journal of the American Chemical Society |
| container_volume | 145 |
| creator | Wang, Jia-Wei Ma, Fan Jin, Tao He, Piao Luo, Zhi-Mei Kupfer, Stephan Karnahl, Michael Zhao, Fengyi Xu, Zihao Lian, Tianquan Huang, Yong-Liang Jiang, Long Fu, Li-Zhi Ouyang, Gangfeng Yi, Xiao-Yi |
| description | Not provided. |
| format | Article |
| fullrecord | <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_2419184</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2419184</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_24191843</originalsourceid><addsrcrecordid>eNpjYeA0MDAw0jW3MDPmYOAqLs4Cck2MLAw5GZw98nPzc1ILSjKTFRxzNDw9PTUVAjLyS_KLU_OKM0syq1KLihXS8osUXEqLEpNyUhWc_RWMICqKUlNKk0sy8_N4GFjTEnOKU3mhNDeDkptriLOHbn5xSWZ8cXJmSWpyRnJ-Xl5qckm8kYmhpaGFiTFRigCvmTiy</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction</title><source>ACS Publications</source><creator>Wang, Jia-Wei ; Ma, Fan ; Jin, Tao ; He, Piao ; Luo, Zhi-Mei ; Kupfer, Stephan ; Karnahl, Michael ; Zhao, Fengyi ; Xu, Zihao ; Lian, Tianquan ; Huang, Yong-Liang ; Jiang, Long ; Fu, Li-Zhi ; Ouyang, Gangfeng ; Yi, Xiao-Yi</creator><creatorcontrib>Wang, Jia-Wei ; Ma, Fan ; Jin, Tao ; He, Piao ; Luo, Zhi-Mei ; Kupfer, Stephan ; Karnahl, Michael ; Zhao, Fengyi ; Xu, Zihao ; Lian, Tianquan ; Huang, Yong-Liang ; Jiang, Long ; Fu, Li-Zhi ; Ouyang, Gangfeng ; Yi, Xiao-Yi ; Emory Univ., Atlanta, GA (United States)</creatorcontrib><description>Not provided.</description><identifier>ISSN: 0002-7863</identifier><language>eng</language><publisher>United States: American Chemical Society (ACS)</publisher><subject>Chemistry</subject><ispartof>Journal of the American Chemical Society, 2022-12, Vol.145 (1)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000000325007578 ; 0000000267550002 ; 0000000319667131 ; 0000000264287528 ; 0000000283513690 ; 0000000154829496 ; 000000031569014X ; 0000000308058533 ; 0000000207976036</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/2419184$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Wang, Jia-Wei</creatorcontrib><creatorcontrib>Ma, Fan</creatorcontrib><creatorcontrib>Jin, Tao</creatorcontrib><creatorcontrib>He, Piao</creatorcontrib><creatorcontrib>Luo, Zhi-Mei</creatorcontrib><creatorcontrib>Kupfer, Stephan</creatorcontrib><creatorcontrib>Karnahl, Michael</creatorcontrib><creatorcontrib>Zhao, Fengyi</creatorcontrib><creatorcontrib>Xu, Zihao</creatorcontrib><creatorcontrib>Lian, Tianquan</creatorcontrib><creatorcontrib>Huang, Yong-Liang</creatorcontrib><creatorcontrib>Jiang, Long</creatorcontrib><creatorcontrib>Fu, Li-Zhi</creatorcontrib><creatorcontrib>Ouyang, Gangfeng</creatorcontrib><creatorcontrib>Yi, Xiao-Yi</creatorcontrib><creatorcontrib>Emory Univ., Atlanta, GA (United States)</creatorcontrib><title>Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction</title><title>Journal of the American Chemical Society</title><description>Not provided.</description><subject>Chemistry</subject><issn>0002-7863</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNpjYeA0MDAw0jW3MDPmYOAqLs4Cck2MLAw5GZw98nPzc1ILSjKTFRxzNDw9PTUVAjLyS_KLU_OKM0syq1KLihXS8osUXEqLEpNyUhWc_RWMICqKUlNKk0sy8_N4GFjTEnOKU3mhNDeDkptriLOHbn5xSWZ8cXJmSWpyRnJ-Xl5qckm8kYmhpaGFiTFRigCvmTiy</recordid><startdate>20221220</startdate><enddate>20221220</enddate><creator>Wang, Jia-Wei</creator><creator>Ma, Fan</creator><creator>Jin, Tao</creator><creator>He, Piao</creator><creator>Luo, Zhi-Mei</creator><creator>Kupfer, Stephan</creator><creator>Karnahl, Michael</creator><creator>Zhao, Fengyi</creator><creator>Xu, Zihao</creator><creator>Lian, Tianquan</creator><creator>Huang, Yong-Liang</creator><creator>Jiang, Long</creator><creator>Fu, Li-Zhi</creator><creator>Ouyang, Gangfeng</creator><creator>Yi, Xiao-Yi</creator><general>American Chemical Society (ACS)</general><scope>OTOTI</scope><orcidid>https://orcid.org/0000000325007578</orcidid><orcidid>https://orcid.org/0000000267550002</orcidid><orcidid>https://orcid.org/0000000319667131</orcidid><orcidid>https://orcid.org/0000000264287528</orcidid><orcidid>https://orcid.org/0000000283513690</orcidid><orcidid>https://orcid.org/0000000154829496</orcidid><orcidid>https://orcid.org/000000031569014X</orcidid><orcidid>https://orcid.org/0000000308058533</orcidid><orcidid>https://orcid.org/0000000207976036</orcidid></search><sort><creationdate>20221220</creationdate><title>Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction</title><author>Wang, Jia-Wei ; Ma, Fan ; Jin, Tao ; He, Piao ; Luo, Zhi-Mei ; Kupfer, Stephan ; Karnahl, Michael ; Zhao, Fengyi ; Xu, Zihao ; Lian, Tianquan ; Huang, Yong-Liang ; Jiang, Long ; Fu, Li-Zhi ; Ouyang, Gangfeng ; Yi, Xiao-Yi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_24191843</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wang, Jia-Wei</creatorcontrib><creatorcontrib>Ma, Fan</creatorcontrib><creatorcontrib>Jin, Tao</creatorcontrib><creatorcontrib>He, Piao</creatorcontrib><creatorcontrib>Luo, Zhi-Mei</creatorcontrib><creatorcontrib>Kupfer, Stephan</creatorcontrib><creatorcontrib>Karnahl, Michael</creatorcontrib><creatorcontrib>Zhao, Fengyi</creatorcontrib><creatorcontrib>Xu, Zihao</creatorcontrib><creatorcontrib>Lian, Tianquan</creatorcontrib><creatorcontrib>Huang, Yong-Liang</creatorcontrib><creatorcontrib>Jiang, Long</creatorcontrib><creatorcontrib>Fu, Li-Zhi</creatorcontrib><creatorcontrib>Ouyang, Gangfeng</creatorcontrib><creatorcontrib>Yi, Xiao-Yi</creatorcontrib><creatorcontrib>Emory Univ., Atlanta, GA (United States)</creatorcontrib><collection>OSTI.GOV</collection><jtitle>Journal of the American Chemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wang, Jia-Wei</au><au>Ma, Fan</au><au>Jin, Tao</au><au>He, Piao</au><au>Luo, Zhi-Mei</au><au>Kupfer, Stephan</au><au>Karnahl, Michael</au><au>Zhao, Fengyi</au><au>Xu, Zihao</au><au>Lian, Tianquan</au><au>Huang, Yong-Liang</au><au>Jiang, Long</au><au>Fu, Li-Zhi</au><au>Ouyang, Gangfeng</au><au>Yi, Xiao-Yi</au><aucorp>Emory Univ., Atlanta, GA (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction</atitle><jtitle>Journal of the American Chemical Society</jtitle><date>2022-12-20</date><risdate>2022</risdate><volume>145</volume><issue>1</issue><issn>0002-7863</issn><abstract>Not provided.</abstract><cop>United States</cop><pub>American Chemical Society (ACS)</pub><orcidid>https://orcid.org/0000000325007578</orcidid><orcidid>https://orcid.org/0000000267550002</orcidid><orcidid>https://orcid.org/0000000319667131</orcidid><orcidid>https://orcid.org/0000000264287528</orcidid><orcidid>https://orcid.org/0000000283513690</orcidid><orcidid>https://orcid.org/0000000154829496</orcidid><orcidid>https://orcid.org/000000031569014X</orcidid><orcidid>https://orcid.org/0000000308058533</orcidid><orcidid>https://orcid.org/0000000207976036</orcidid></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0002-7863 |
| ispartof | Journal of the American Chemical Society, 2022-12, Vol.145 (1) |
| issn | 0002-7863 |
| language | eng |
| recordid | cdi_osti_scitechconnect_2419184 |
| source | ACS Publications |
| subjects | Chemistry |
| title | Homoleptic Al(III) Photosensitizers for Durable CO 2 Photoreduction |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T09%3A26%3A02IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Homoleptic%20Al(III)%20Photosensitizers%20for%20Durable%20CO%202%20Photoreduction&rft.jtitle=Journal%20of%20the%20American%20Chemical%20Society&rft.au=Wang,%20Jia-Wei&rft.aucorp=Emory%20Univ.,%20Atlanta,%20GA%20(United%20States)&rft.date=2022-12-20&rft.volume=145&rft.issue=1&rft.issn=0002-7863&rft_id=info:doi/&rft_dat=%3Costi%3E2419184%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |