Few-cycle atomic layer deposition to nanoengineer polybenzimidazole for H2/CO2 separation

Atomic layer deposition (ALD) creates uniform sub-nanometer films on a variety of surfaces and nanopore walls and has been used to modify polymers to improve surface affinity towards specific molecules, solvent resistance, and barrier properties to gases and vapors. Here, for the first time, we demo...

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Veröffentlicht in:	Chemical engineering journal (Lausanne, Switzerland : 1996) Switzerland : 1996), 2023-11, Vol.479
Hauptverfasser:	Hu, Leiqing, Lee, Won-Il, Subramanian, Ashwanth, Deng, Erda, Kisslinger, Kim, Fan, Shouhong, Bui, Vinh T., Ding, Yifu, Nam, Chang-Yong, Lin, Haiqing
Format:	Artikel
Sprache:	eng
Schlagworte:	AlOx Atomic layer deposition H2/CO2 separation membranes MATERIALS SCIENCE Polybenzimidazole Vapor-phase infiltration
Online-Zugang:	Volltext
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