Characterization of CuO/n–Si pn junction synthesized by successive ionic layer adsorption and reaction method

Transparent conducting Copper oxide CuO thin films were successfully synthesized on glass and n-type Silicon substrates by successive ionic layer adsorption and reaction method. The crystal structure, surface texture, optical and electrical properties were studied. The results revealed that the depo...

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Veröffentlicht in:Optical and quantum electronics 2019-07, Vol.51 (7), p.1-13, Article 233
Hauptverfasser: Alkhayatt, Adel H. Omran, Jaafer, Mustafa D., Al Alak, Hassan Hadi Ali, Ali, Asala H.
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container_issue 7
container_start_page 1
container_title Optical and quantum electronics
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creator Alkhayatt, Adel H. Omran
Jaafer, Mustafa D.
Al Alak, Hassan Hadi Ali
Ali, Asala H.
description Transparent conducting Copper oxide CuO thin films were successfully synthesized on glass and n-type Silicon substrates by successive ionic layer adsorption and reaction method. The crystal structure, surface texture, optical and electrical properties were studied. The results revealed that the deposited CuO thin films at different cycles number (5, 10, 15), have polycrystalline structure nature with monoclinic phase, and the crystallite size increases with the increase of cycles number. The average roughness and the root mean square values increase with increasing cycles number. The optical energy band gap and Urbach energy was decrement from 2.33 eV and 1.2 eV for 5 cycles to 2.1 eV and 0.82 eV for 15 cycles. The electrical properties of Ni/CuO/n–Si pn junction were studied using current–voltage (I–V) measurements. The barrier heights ( Φ B ) of Ni/CuO/n–Si thin films were calculated and its values are (0.716, 0.736, 0.723) eV, for 5, 10 and 15 cycles respectively with an applied bias voltage of 3 V.
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The results revealed that the deposited CuO thin films at different cycles number (5, 10, 15), have polycrystalline structure nature with monoclinic phase, and the crystallite size increases with the increase of cycles number. The average roughness and the root mean square values increase with increasing cycles number. The optical energy band gap and Urbach energy was decrement from 2.33 eV and 1.2 eV for 5 cycles to 2.1 eV and 0.82 eV for 15 cycles. The electrical properties of Ni/CuO/n–Si pn junction were studied using current–voltage (I–V) measurements. The barrier heights ( Φ B ) of Ni/CuO/n–Si thin films were calculated and its values are (0.716, 0.736, 0.723) eV, for 5, 10 and 15 cycles respectively with an applied bias voltage of 3 V.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11082-019-1951-4</doi><tpages>13</tpages></addata></record>
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subjects ADSORPTION
Characterization and Evaluation of Materials
Computer Communication Networks
COPPER OXIDES
Crystal structure
Crystallites
ELECTRIC POTENTIAL
Electrical Engineering
ELECTRICAL PROPERTIES
Energy gap
GLASS
Glass substrates
Lasers
Mean square values
MONOCLINIC LATTICES
NANOSCIENCE AND NANOTECHNOLOGY
NANOSTRUCTURES
Optical Devices
Optical properties
Optics
P-n junctions
Photonics
Physics
Physics and Astronomy
POLYCRYSTALS
ROUGHNESS
SEMICONDUCTOR JUNCTIONS
SILICON
Silicon substrates
SUBSTRATES
Surface layers
THIN FILMS
title Characterization of CuO/n–Si pn junction synthesized by successive ionic layer adsorption and reaction method
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