Organosilane-assisted selective etching strategy for fabrication of hollow/rattle-type mesoporous organosilica nanospheres

A facile strategy to fabricate hollow or rattle-type mesoporous silica nanospheres (HMSNs or RMSNs) with organic functional groups and porous shell was developed. Herein, thiol-HMSNs were obtained via treating vinyl-SiO1.5 @cyano&thiol-SiO1.5 prepared by using 3-mercaptopropyltrimethoxysilane (M...

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Veröffentlicht in:	Journal of solid state chemistry 2018-10, Vol.266, p.279-285
Hauptverfasser:	Wang, Yu, Wang, Pengpeng, Chen, Lianxi, Li, Jie, Liu, Zhenhui
Format:	Artikel
Sprache:	eng
Schlagworte:	ETCHING FABRICATION Hollow INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY NANOSTRUCTURES ORGANIC SILICON COMPOUNDS Organosilica PORE STRUCTURE POROUS MATERIALS Rattle-type Selective etching SPECIFIC SURFACE AREA SYNTHESIS
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