Novel hole selective CrOx contact for dopant-free back contact silicon solar cells

[Display omitted] •The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x 

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Veröffentlicht in:Materials research bulletin 2018-07, Vol.103, p.77-82
Hauptverfasser: Lin, Wenjie, Wu, Weiliang, Bao, Jie, Liu, Zongtao, Qiu, Kaifu, Cai, Lun, Yao, Zhirong, Deng, Youjun, Liang, Zongcun, Shen, Hui
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container_issue
container_start_page 77
container_title Materials research bulletin
container_volume 103
creator Lin, Wenjie
Wu, Weiliang
Bao, Jie
Liu, Zongtao
Qiu, Kaifu
Cai, Lun
Yao, Zhirong
Deng, Youjun
Liang, Zongcun
Shen, Hui
description [Display omitted] •The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x 
doi_str_mv 10.1016/j.materresbull.2018.03.032
format Article
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The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x &lt; 3) with a low melting point for high stability and high performance. In this contribution, CrOx is first applied in silicon based solar cell as the emitter. Integrating 5 nm CrOx and 2 nm LiFx into solar cell as the emitter and the back surface filed, resulted in a device efficiency of 13.6%. For further improvement, the back contact solar cell reaching an efficiency of 15.8% was fabricated, by implementing the multilayer films of CrOx (5 nm)/Au (4 nm)/ CrOx (5 nm) as the emitter. The formation of Cr(OH)3 in ambient condition, resulted in a lower work function (4.8 eV) of the CrOx film. Furthermore, the multilayer back contact solar cell demonstrated a high stability due to CrOx covered with 500 nm Ag, when stored in ambient air longer than 170 days.</description><identifier>ISSN: 0025-5408</identifier><identifier>EISSN: 1873-4227</identifier><identifier>DOI: 10.1016/j.materresbull.2018.03.032</identifier><language>eng</language><publisher>United States: Elsevier Ltd</publisher><subject>Back contact ; BACK CONTACT SOLAR CELLS ; CHROMIUM HYDROXIDES ; CHROMIUM OXIDES ; Chromium trioxide ; COATINGS ; CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ; Dopant-free ; DOPED MATERIALS ; ENERGY EFFICIENCY ; HETEROJUNCTIONS ; Hole selective contact ; HOLES ; Silicon heterojunction solar cells ; SILICON SOLAR CELLS ; SILVER ; SOLAR ENERGY ; THIN FILMS ; WORK FUNCTIONS</subject><ispartof>Materials research bulletin, 2018-07, Vol.103, p.77-82</ispartof><rights>2018 Elsevier Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c352t-3f83d91d2e0cf9512901d6f1da69be1b4e1c501cc00f1d31bf2d3e889597f9683</citedby><cites>FETCH-LOGICAL-c352t-3f83d91d2e0cf9512901d6f1da69be1b4e1c501cc00f1d31bf2d3e889597f9683</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0025540817344434$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>230,314,776,780,881,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/22805141$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Lin, Wenjie</creatorcontrib><creatorcontrib>Wu, Weiliang</creatorcontrib><creatorcontrib>Bao, Jie</creatorcontrib><creatorcontrib>Liu, Zongtao</creatorcontrib><creatorcontrib>Qiu, Kaifu</creatorcontrib><creatorcontrib>Cai, Lun</creatorcontrib><creatorcontrib>Yao, Zhirong</creatorcontrib><creatorcontrib>Deng, Youjun</creatorcontrib><creatorcontrib>Liang, Zongcun</creatorcontrib><creatorcontrib>Shen, Hui</creatorcontrib><title>Novel hole selective CrOx contact for dopant-free back contact silicon solar cells</title><title>Materials research bulletin</title><description>[Display omitted] •The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x &lt; 3) with a low melting point for high stability and high performance.•CrOx is first applied in silicon based solar cell as the emitter.•The back contact solar cell which demonstrated an efficiency of 15.8% and high stability was fabricated, by implementing the multilayer films of CrOx (5 nm)/Au (4 nm)/ CrOx (5 nm) capped by Ag (500 nm) as the emitter. The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x &lt; 3) with a low melting point for high stability and high performance. In this contribution, CrOx is first applied in silicon based solar cell as the emitter. Integrating 5 nm CrOx and 2 nm LiFx into solar cell as the emitter and the back surface filed, resulted in a device efficiency of 13.6%. For further improvement, the back contact solar cell reaching an efficiency of 15.8% was fabricated, by implementing the multilayer films of CrOx (5 nm)/Au (4 nm)/ CrOx (5 nm) as the emitter. The formation of Cr(OH)3 in ambient condition, resulted in a lower work function (4.8 eV) of the CrOx film. Furthermore, the multilayer back contact solar cell demonstrated a high stability due to CrOx covered with 500 nm Ag, when stored in ambient air longer than 170 days.</description><subject>Back contact</subject><subject>BACK CONTACT SOLAR CELLS</subject><subject>CHROMIUM HYDROXIDES</subject><subject>CHROMIUM OXIDES</subject><subject>Chromium trioxide</subject><subject>COATINGS</subject><subject>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</subject><subject>Dopant-free</subject><subject>DOPED MATERIALS</subject><subject>ENERGY EFFICIENCY</subject><subject>HETEROJUNCTIONS</subject><subject>Hole selective contact</subject><subject>HOLES</subject><subject>Silicon heterojunction solar cells</subject><subject>SILICON SOLAR CELLS</subject><subject>SILVER</subject><subject>SOLAR ENERGY</subject><subject>THIN FILMS</subject><subject>WORK FUNCTIONS</subject><issn>0025-5408</issn><issn>1873-4227</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqNUNtKxDAQDaLgevmHoM-tk6SX1DdZr7C4IPoc2nTCZs02S1IX_XtTVsRHYWCGmXPOzBxCLhjkDFh1tc437YghYOw-nMs5MJmDSMEPyIzJWmQF5_UhmQHwMisLkMfkJMY1ABSyrmfk5dnv0NGVd0gjOtSj3SGdh-Un1X4YWz1S4wPt_bYdxswERNq1-v13GK2zqabRuzZQjc7FM3JkWhfx_Cefkrf7u9f5Y7ZYPjzNbxaZFiUfM2Gk6BvWcwRtmpLxBlhfGda3VdMh6wpkugSmNUBqCtYZ3guUsimb2jSVFKfkcq_r42hV1HZEvUq3DOkJxbmEkhUsoa73KB18jAGN2ga7acOXYqAmD9Va_fVQTR4qECl4It_uyZj-2FkM0xocNPY2TFt6b_8j8w1qjoIW</recordid><startdate>20180701</startdate><enddate>20180701</enddate><creator>Lin, Wenjie</creator><creator>Wu, Weiliang</creator><creator>Bao, Jie</creator><creator>Liu, Zongtao</creator><creator>Qiu, Kaifu</creator><creator>Cai, Lun</creator><creator>Yao, Zhirong</creator><creator>Deng, Youjun</creator><creator>Liang, Zongcun</creator><creator>Shen, Hui</creator><general>Elsevier Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20180701</creationdate><title>Novel hole selective CrOx contact for dopant-free back contact silicon solar cells</title><author>Lin, Wenjie ; Wu, Weiliang ; Bao, Jie ; Liu, Zongtao ; Qiu, Kaifu ; Cai, Lun ; Yao, Zhirong ; Deng, Youjun ; Liang, Zongcun ; Shen, Hui</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c352t-3f83d91d2e0cf9512901d6f1da69be1b4e1c501cc00f1d31bf2d3e889597f9683</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Back contact</topic><topic>BACK CONTACT SOLAR CELLS</topic><topic>CHROMIUM HYDROXIDES</topic><topic>CHROMIUM OXIDES</topic><topic>Chromium trioxide</topic><topic>COATINGS</topic><topic>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</topic><topic>Dopant-free</topic><topic>DOPED MATERIALS</topic><topic>ENERGY EFFICIENCY</topic><topic>HETEROJUNCTIONS</topic><topic>Hole selective contact</topic><topic>HOLES</topic><topic>Silicon heterojunction solar cells</topic><topic>SILICON SOLAR CELLS</topic><topic>SILVER</topic><topic>SOLAR ENERGY</topic><topic>THIN FILMS</topic><topic>WORK FUNCTIONS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lin, Wenjie</creatorcontrib><creatorcontrib>Wu, Weiliang</creatorcontrib><creatorcontrib>Bao, Jie</creatorcontrib><creatorcontrib>Liu, Zongtao</creatorcontrib><creatorcontrib>Qiu, Kaifu</creatorcontrib><creatorcontrib>Cai, Lun</creatorcontrib><creatorcontrib>Yao, Zhirong</creatorcontrib><creatorcontrib>Deng, Youjun</creatorcontrib><creatorcontrib>Liang, Zongcun</creatorcontrib><creatorcontrib>Shen, Hui</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Materials research bulletin</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lin, Wenjie</au><au>Wu, Weiliang</au><au>Bao, Jie</au><au>Liu, Zongtao</au><au>Qiu, Kaifu</au><au>Cai, Lun</au><au>Yao, Zhirong</au><au>Deng, Youjun</au><au>Liang, Zongcun</au><au>Shen, Hui</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Novel hole selective CrOx contact for dopant-free back contact silicon solar cells</atitle><jtitle>Materials research bulletin</jtitle><date>2018-07-01</date><risdate>2018</risdate><volume>103</volume><spage>77</spage><epage>82</epage><pages>77-82</pages><issn>0025-5408</issn><eissn>1873-4227</eissn><abstract>[Display omitted] •The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x &lt; 3) with a low melting point for high stability and high performance.•CrOx is first applied in silicon based solar cell as the emitter.•The back contact solar cell which demonstrated an efficiency of 15.8% and high stability was fabricated, by implementing the multilayer films of CrOx (5 nm)/Au (4 nm)/ CrOx (5 nm) capped by Ag (500 nm) as the emitter. The dopant-free back contact solar cells are demonstrated based on hole selective contact material, chromium trioxide (CrOx, x &lt; 3) with a low melting point for high stability and high performance. In this contribution, CrOx is first applied in silicon based solar cell as the emitter. Integrating 5 nm CrOx and 2 nm LiFx into solar cell as the emitter and the back surface filed, resulted in a device efficiency of 13.6%. For further improvement, the back contact solar cell reaching an efficiency of 15.8% was fabricated, by implementing the multilayer films of CrOx (5 nm)/Au (4 nm)/ CrOx (5 nm) as the emitter. The formation of Cr(OH)3 in ambient condition, resulted in a lower work function (4.8 eV) of the CrOx film. Furthermore, the multilayer back contact solar cell demonstrated a high stability due to CrOx covered with 500 nm Ag, when stored in ambient air longer than 170 days.</abstract><cop>United States</cop><pub>Elsevier Ltd</pub><doi>10.1016/j.materresbull.2018.03.032</doi><tpages>6</tpages></addata></record>
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subjects Back contact
BACK CONTACT SOLAR CELLS
CHROMIUM HYDROXIDES
CHROMIUM OXIDES
Chromium trioxide
COATINGS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Dopant-free
DOPED MATERIALS
ENERGY EFFICIENCY
HETEROJUNCTIONS
Hole selective contact
HOLES
Silicon heterojunction solar cells
SILICON SOLAR CELLS
SILVER
SOLAR ENERGY
THIN FILMS
WORK FUNCTIONS
title Novel hole selective CrOx contact for dopant-free back contact silicon solar cells
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