High temperature oxidation behavior of Ni-based superalloy GH202

The isothermal oxidation kinetic and oxidation behavior of Ni-based superalloy GH202 were investigated at temperatures from 800°C to 1100°C. The microstructure of GH202 was characterized by scanning electron microscope (SEM) and electron back-scattered diffraction (EBSD). The composition and morphol...

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Veröffentlicht in:	Materials characterization 2016-08, Vol.118, p.122-128
Hauptverfasser:	Cao, Jiangdong, Zhang, Junsong, Chen, Ruifang, Ye, Yunxia, Hua, Yinqun
Format:	Artikel
Sprache:	eng
Schlagworte:	ACTIVATION ENERGY ALUMINIUM BACKSCATTERING CHROMATES CHROMIUM OXIDES CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY CROSS SECTIONS DIFFUSION ELECTRON DIFFRACTION ELECTRON MICROPROBE ANALYSIS ELECTRON PROBES GH202 GRAIN BOUNDARIES HEAT RESISTING ALLOYS High temperature oxidation behavior Internal oxidation LAYERS MATERIALS SCIENCE MORPHOLOGY Ni-based superalloy Nickel base alloys OXIDATION Oxides OXYGEN Scale (corrosion) SCANNING ELECTRON MICROSCOPY Superalloys TEMPERATURE RANGE 1000-4000 K Titanium dioxide TITANIUM OXIDES X-RAY DIFFRACTION
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