Atomic layer deposition of alternative glass microchannel plates

The technique of atomic layer deposition (ALD) has enabled the development of alternative glass microchannel plates (MCPs) with independently tunable resistive and emissive layers, resulting in excellent thickness uniformity across the large area (20 × 20 cm), high aspect ratio (60:1 L/d) glass subs...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2016-01, Vol.34 (1)
Hauptverfasser:	O'Mahony, Aileen, Craven, Christopher A., Minot, Michael J., Popecki, Mark A., Renaud, Joseph M., Bennis, Daniel C., Bond, Justin L., Stochaj, Michael E., Foley, Michael R., Adams, Bernhard W., Mane, Anil U., Elam, Jeffrey W., Ertley, Camden, Siegmund, Oswald H. W.
Format:	Artikel
Sprache:	eng
Schlagworte:	ASPECT RATIO BACKGROUND NOISE BOROSILICATE GLASS CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY DEPOSITION LAYERS LEAD OXIDES LIFETIME MICROCHANNEL ELECTRON MULTIPLIERS STABILITY SUBSTRATES THICKNESS
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