Analysis of scattering mechanisms in zinc oxide films grown by the atomic layer deposition technique

In this work, the analysis of the temperature-dependent electrical conductivity of highly crystalline zinc oxide (ZnO) thin films obtained by the Atomic Layer Deposition (ALD) method is performed. It is deduced that the most important scattering mechanisms are: scattering by ionized defects (at low...

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Veröffentlicht in:Journal of applied physics 2015-07, Vol.118 (3)
Hauptverfasser: Krajewski, Tomasz A., Dybko, Krzysztof, Luka, Grzegorz, Wachnicki, Lukasz, Kopalko, Krzysztof, Paszkowicz, Wojciech, Godlewski, Marek, Guziewicz, Elzbieta
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container_issue 3
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container_title Journal of applied physics
container_volume 118
creator Krajewski, Tomasz A.
Dybko, Krzysztof
Luka, Grzegorz
Wachnicki, Lukasz
Kopalko, Krzysztof
Paszkowicz, Wojciech
Godlewski, Marek
Guziewicz, Elzbieta
description In this work, the analysis of the temperature-dependent electrical conductivity of highly crystalline zinc oxide (ZnO) thin films obtained by the Atomic Layer Deposition (ALD) method is performed. It is deduced that the most important scattering mechanisms are: scattering by ionized defects (at low temperatures) as well as by phonons (mainly optical ones) at higher temperatures. Nevertheless, the role of grain boundaries in the carrier mobility limitation ought to be included as well. These conclusions are based on theoretical analysis and temperature-dependent Hall mobility measurements. The presented results prove that existing models can explain the mobility behavior in the ALD-ZnO films, being helpful for understanding their transport properties, which are strongly related both to the crystalline quality of deposited ZnO material and defects in its lattice.
doi_str_mv 10.1063/1.4927294
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subjects CARRIER MOBILITY
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
DEPOSITION
ELECTRIC CONDUCTIVITY
GRAIN BOUNDARIES
LAYERS
PHONONS
SCATTERING
TEMPERATURE DEPENDENCE
THIN FILMS
ZINC OXIDES
title Analysis of scattering mechanisms in zinc oxide films grown by the atomic layer deposition technique
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