Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow

Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconduc...

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Veröffentlicht in:Review of scientific instruments 2016-02, Vol.87 (2), p.02A902-02A902
Hauptverfasser: Nikolaev, A G, Oks, E M, Vizir, A V, Yushkov, G Yu, Frolova, V P
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Sprache:eng
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