Self-organized patterns along sidewalls of iron silicide nanowires on Si(110) and their origin

Iron silicide (cubic FeSi2) nanowires have been grown on Si(110) by reactive deposition epitaxy and investigated by scanning tunneling microscopy and scanning/transmission electron microscopy. On an otherwise uniform nanowire, a semi-periodic pattern along the edges of FeSi2 nanowires has been disco...

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Veröffentlicht in:Applied physics letters 2014-11, Vol.105 (19)
Hauptverfasser: Das, Debolina, Mahato, J. C., Bisi, Bhaskar, Satpati, B., Dev, B. N.
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Mahato, J. C.
Bisi, Bhaskar
Satpati, B.
Dev, B. N.
description Iron silicide (cubic FeSi2) nanowires have been grown on Si(110) by reactive deposition epitaxy and investigated by scanning tunneling microscopy and scanning/transmission electron microscopy. On an otherwise uniform nanowire, a semi-periodic pattern along the edges of FeSi2 nanowires has been discovered. The origin of such growth patterns has been traced to initial growth of silicide nanodots with a pyramidal Si base at the chevron-like atomic arrangement of a clean reconstructed Si(110) surface. The pyramidal base evolves into a comb-like structure along the edges of the nanowires. This causes the semi-periodic structure of the iron silicide nanowires along their edges.
doi_str_mv 10.1063/1.4901815
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source AIP Journals Complete; Alma/SFX Local Collection
subjects Applied physics
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
Disilicides
Epitaxial growth
EPITAXY
Intermetallic compounds
Iron silicide
IRON SILICIDES
Microscopy
NANOWIRES
Periodic structures
PERIODICITY
QUANTUM DOTS
Scanning electron microscopy
SCANNING TUNNELING MICROSCOPY
SILICON
Silicon substrates
TRANSMISSION ELECTRON MICROSCOPY
title Self-organized patterns along sidewalls of iron silicide nanowires on Si(110) and their origin
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