Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas
Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature a...
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Veröffentlicht in: | Journal of applied physics 2014-08, Vol.116 (6) |
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creator | Aussems, Damien U. B. Nishijima, Daisuke Brandt, Christian Doerner, Russell P. Cardozo, Niek J. Lopes |
description | Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7 eV and 0.7–2.0 × 1020 m−3, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4 eV and 7 × 1019–1 × 1022 m−3, respectively. |
doi_str_mv | 10.1063/1.4892675 |
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B. ; Nishijima, Daisuke ; Brandt, Christian ; Doerner, Russell P. ; Cardozo, Niek J. Lopes</creator><creatorcontrib>Aussems, Damien U. B. ; Nishijima, Daisuke ; Brandt, Christian ; Doerner, Russell P. ; Cardozo, Niek J. Lopes</creatorcontrib><description>Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7 eV and 0.7–2.0 × 1020 m−3, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4 eV and 7 × 1019–1 × 1022 m−3, respectively.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.4892675</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Applied physics ; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ; COMPARATIVE EVALUATIONS ; Density ; ELECTRIC POTENTIAL ; Electron energy ; ELECTRON TEMPERATURE ; Emission analysis ; EMISSION SPECTROSCOPY ; EV RANGE ; Laser plasmas ; LASERS ; Optical emission spectroscopy ; PLASMA ; SIMULATORS ; SURFACES ; TUNGSTEN</subject><ispartof>Journal of applied physics, 2014-08, Vol.116 (6)</ispartof><rights>2014 AIP Publishing LLC.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c386t-97272a21c1cfbd4712116723e68f498a12660b41736f0f1333dc1ba9c78ddbc03</citedby><cites>FETCH-LOGICAL-c386t-97272a21c1cfbd4712116723e68f498a12660b41736f0f1333dc1ba9c78ddbc03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27901,27902</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/22314589$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Aussems, Damien U. B.</creatorcontrib><creatorcontrib>Nishijima, Daisuke</creatorcontrib><creatorcontrib>Brandt, Christian</creatorcontrib><creatorcontrib>Doerner, Russell P.</creatorcontrib><creatorcontrib>Cardozo, Niek J. Lopes</creatorcontrib><title>Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas</title><title>Journal of applied physics</title><description>Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7 eV and 0.7–2.0 × 1020 m−3, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4 eV and 7 × 1019–1 × 1022 m−3, respectively.</description><subject>Applied physics</subject><subject>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</subject><subject>COMPARATIVE EVALUATIONS</subject><subject>Density</subject><subject>ELECTRIC POTENTIAL</subject><subject>Electron energy</subject><subject>ELECTRON TEMPERATURE</subject><subject>Emission analysis</subject><subject>EMISSION SPECTROSCOPY</subject><subject>EV RANGE</subject><subject>Laser plasmas</subject><subject>LASERS</subject><subject>Optical emission spectroscopy</subject><subject>PLASMA</subject><subject>SIMULATORS</subject><subject>SURFACES</subject><subject>TUNGSTEN</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNpFkE1LAzEQhoMoWKsH_8GCJw9bM8luPo5S_IKCB-05pLPZNqVN1mT3oL_erS14Ghge3pn3IeQW6Ayo4A8wq5RmQtZnZAJU6VLWNT0nE0oZlEpLfUmuct5SCqC4npDlR-ewTzFj7DwWuLHJYu-S_7G9j6GwoSn83q59WBexLXY2u1T-bYfgu7izqbAJSx-aAV1TdCOwt_maXLR2l93NaU7J8vnpc_5aLt5f3uaPixK5En2pJZPMMkDAdtVUEhiAkIw7odpKKwtMCLqqQHLR0hY45w3CymqUqmlWSPmU3B1zY-69yeh7hxuMIYydDGMcqlrpf6pL8WtwuTfbOKQwPmbYeKKWTFUH6v5I4WgjJ9eaLo3N07cBag5uDZiTW_4LHVlqNg</recordid><startdate>20140814</startdate><enddate>20140814</enddate><creator>Aussems, Damien U. 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B.</creatorcontrib><creatorcontrib>Nishijima, Daisuke</creatorcontrib><creatorcontrib>Brandt, Christian</creatorcontrib><creatorcontrib>Doerner, Russell P.</creatorcontrib><creatorcontrib>Cardozo, Niek J. Lopes</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Aussems, Damien U. B.</au><au>Nishijima, Daisuke</au><au>Brandt, Christian</au><au>Doerner, Russell P.</au><au>Cardozo, Niek J. Lopes</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas</atitle><jtitle>Journal of applied physics</jtitle><date>2014-08-14</date><risdate>2014</risdate><volume>116</volume><issue>6</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>Tungsten plasmas induced by unipolar arcs were investigated using optical emission spectroscopy and imaging, and compared with laser-induced tungsten plasmas. The unipolar arcs were initiated in the linear-plasma simulator PISCES-A at UCSD under fusion relevant conditions. The electron temperature and density of the unipolar arc plasmas were in the range 0.5–0.7 eV and 0.7–2.0 × 1020 m−3, respectively, and increased with increasing negative bias voltage, but did not correlate with the surface temperature. In comparison, the electron temperature and density of the laser-induced plasmas were in the range 0.6–1.4 eV and 7 × 1019–1 × 1022 m−3, respectively.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.4892675</doi><oa>free_for_read</oa></addata></record> |
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subjects | Applied physics CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS COMPARATIVE EVALUATIONS Density ELECTRIC POTENTIAL Electron energy ELECTRON TEMPERATURE Emission analysis EMISSION SPECTROSCOPY EV RANGE Laser plasmas LASERS Optical emission spectroscopy PLASMA SIMULATORS SURFACES TUNGSTEN |
title | Spectroscopic characterization and imaging of laser- and unipolar arc-induced plasmas |
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