Electroplated L1{sub 0} CoPt thick-film permanent magnets
The fabrication and magnetic characterization of 15-μm-thick electroplated L1{sub 0} CoPt hard magnets with good magnetic properties is reported in this paper. Experimental study of the dependence of the magnets' properties on annealing temperature reveals that an intrinsic coercivity H{sub ci}...
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| Veröffentlicht in: | Journal of applied physics 2014-05, Vol.115 (17) |
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| creator | Oniku, Ololade D. Qi, Bin Arnold, David P. |
| description | The fabrication and magnetic characterization of 15-μm-thick electroplated L1{sub 0} CoPt hard magnets with good magnetic properties is reported in this paper. Experimental study of the dependence of the magnets' properties on annealing temperature reveals that an intrinsic coercivity H{sub ci} = ∼800 kA/m (10 kOe), squareness >0.8, and energy product of >150 kJ/m{sup 3} are obtained for photolithographically patterned structures (250 μm × 2 mm stripes; 15 μm thickness) electroplated on silicon substrates and annealed in hydrogen forming gas at 700 °C. Scanning electron microscopy is used to inspect the morphology of both the as-deposited and annealed magnetic layers, and X-ray Diffractometer analysis on the magnets annealed at 700 °C confirm a phase transformation to an ordered L1{sub 0} CoPt structure, with a minor phase of hcp Co. These thick films are intended for microsystems/MEMS applications. |
| doi_str_mv | 10.1063/1.4867119 |
| format | Article |
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Experimental study of the dependence of the magnets' properties on annealing temperature reveals that an intrinsic coercivity H{sub ci} = ∼800 kA/m (10 kOe), squareness >0.8, and energy product of >150 kJ/m{sup 3} are obtained for photolithographically patterned structures (250 μm × 2 mm stripes; 15 μm thickness) electroplated on silicon substrates and annealed in hydrogen forming gas at 700 °C. Scanning electron microscopy is used to inspect the morphology of both the as-deposited and annealed magnetic layers, and X-ray Diffractometer analysis on the magnets annealed at 700 °C confirm a phase transformation to an ordered L1{sub 0} CoPt structure, with a minor phase of hcp Co. 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Experimental study of the dependence of the magnets' properties on annealing temperature reveals that an intrinsic coercivity H{sub ci} = ∼800 kA/m (10 kOe), squareness >0.8, and energy product of >150 kJ/m{sup 3} are obtained for photolithographically patterned structures (250 μm × 2 mm stripes; 15 μm thickness) electroplated on silicon substrates and annealed in hydrogen forming gas at 700 °C. Scanning electron microscopy is used to inspect the morphology of both the as-deposited and annealed magnetic layers, and X-ray Diffractometer analysis on the magnets annealed at 700 °C confirm a phase transformation to an ordered L1{sub 0} CoPt structure, with a minor phase of hcp Co. These thick films are intended for microsystems/MEMS applications.</description><subject>ANNEALING</subject><subject>COBALT</subject><subject>COERCIVE FORCE</subject><subject>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</subject><subject>HCP LATTICES</subject><subject>HYDROGEN</subject><subject>INTERMETALLIC COMPOUNDS</subject><subject>LAYERS</subject><subject>MAGNETIC PROPERTIES</subject><subject>MICROSTRUCTURE</subject><subject>MORPHOLOGY</subject><subject>PERMANENT MAGNETS</subject><subject>PHASE TRANSFORMATIONS</subject><subject>PLATINUM</subject><subject>SCANNING ELECTRON MICROSCOPY</subject><subject>SILICON</subject><subject>SUBSTRATES</subject><subject>X-RAY DIFFRACTION</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNotzs1KxDAUQOEgCtbRhW8QcJ0xN2n-llJGRyjoQtdDk9w41TYdJnElvruCrs7u4xByDXwNXMtbWLdWGwB3Qhrg1jGjFD8lDecCmHXGnZOLUt45B7DSNcRtJgz1uBymoWKkPXyVT0_5N-2W50rrfgwfLI3TTA94nIeMudJ5eMtYyyU5S8NU8Oq_K_J6v3nptqx_enjs7nq2AMjKnMPgVQSPqFADCK9jAjc4DxFitKCCFrLVPqW29SY5CaCS0Sq1SRtu5Irc_LlLqeOuhLFi2Icl59_vnRDCSGOt_AHdnEcd</recordid><startdate>20140507</startdate><enddate>20140507</enddate><creator>Oniku, Ololade D.</creator><creator>Qi, Bin</creator><creator>Arnold, David P.</creator><scope>OTOTI</scope></search><sort><creationdate>20140507</creationdate><title>Electroplated L1{sub 0} CoPt thick-film permanent magnets</title><author>Oniku, Ololade D. ; Qi, Bin ; Arnold, David P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o113t-99ecb5d1bee5e6112b6df19a9b1d1dd815c62346bff44b7f93115f765f4f67073</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>ANNEALING</topic><topic>COBALT</topic><topic>COERCIVE FORCE</topic><topic>CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY</topic><topic>HCP LATTICES</topic><topic>HYDROGEN</topic><topic>INTERMETALLIC COMPOUNDS</topic><topic>LAYERS</topic><topic>MAGNETIC PROPERTIES</topic><topic>MICROSTRUCTURE</topic><topic>MORPHOLOGY</topic><topic>PERMANENT MAGNETS</topic><topic>PHASE TRANSFORMATIONS</topic><topic>PLATINUM</topic><topic>SCANNING ELECTRON MICROSCOPY</topic><topic>SILICON</topic><topic>SUBSTRATES</topic><topic>X-RAY DIFFRACTION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Oniku, Ololade D.</creatorcontrib><creatorcontrib>Qi, Bin</creatorcontrib><creatorcontrib>Arnold, David P.</creatorcontrib><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Oniku, Ololade D.</au><au>Qi, Bin</au><au>Arnold, David P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electroplated L1{sub 0} CoPt thick-film permanent magnets</atitle><jtitle>Journal of applied physics</jtitle><date>2014-05-07</date><risdate>2014</risdate><volume>115</volume><issue>17</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>The fabrication and magnetic characterization of 15-μm-thick electroplated L1{sub 0} CoPt hard magnets with good magnetic properties is reported in this paper. Experimental study of the dependence of the magnets' properties on annealing temperature reveals that an intrinsic coercivity H{sub ci} = ∼800 kA/m (10 kOe), squareness >0.8, and energy product of >150 kJ/m{sup 3} are obtained for photolithographically patterned structures (250 μm × 2 mm stripes; 15 μm thickness) electroplated on silicon substrates and annealed in hydrogen forming gas at 700 °C. Scanning electron microscopy is used to inspect the morphology of both the as-deposited and annealed magnetic layers, and X-ray Diffractometer analysis on the magnets annealed at 700 °C confirm a phase transformation to an ordered L1{sub 0} CoPt structure, with a minor phase of hcp Co. These thick films are intended for microsystems/MEMS applications.</abstract><cop>United States</cop><doi>10.1063/1.4867119</doi></addata></record> |
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| source | AIP Journals Complete; Alma/SFX Local Collection |
| subjects | ANNEALING COBALT COERCIVE FORCE CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY HCP LATTICES HYDROGEN INTERMETALLIC COMPOUNDS LAYERS MAGNETIC PROPERTIES MICROSTRUCTURE MORPHOLOGY PERMANENT MAGNETS PHASE TRANSFORMATIONS PLATINUM SCANNING ELECTRON MICROSCOPY SILICON SUBSTRATES X-RAY DIFFRACTION |
| title | Electroplated L1{sub 0} CoPt thick-film permanent magnets |
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