Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3}
An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO{sub 3} films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but...
Gespeichert in:
| Veröffentlicht in: | APL materials 2014-02, Vol.2 (2) |
|---|---|
| Hauptverfasser: | , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 2 |
| container_start_page | |
| container_title | APL materials |
| container_volume | 2 |
| creator | Siemons, W. Beekman, C. Budai, J. D. Christen, H. M. Fowlkes, J. D. Balke, N. Tischler, J. Z. Xu, R. Liu, W. Gonzales, C. M. |
| description | An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO{sub 3} films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but does not result in measureable changes to morphology or stoichiometry. Therefore, this change would go undetected with standard laboratory equipment, but can significantly influence local material properties and must be taken into account when using a FIB to manufacture nanostructures. The damage is significantly reduced when a thin metallic layer is present on top of the film during the milling process, clearly indicating that the reduced crystallinity is caused by ion beam induced charging. |
| doi_str_mv | 10.1063/1.4866051 |
| format | Article |
| fullrecord | <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_22269553</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>22269553</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_222695533</originalsourceid><addsrcrecordid>eNqNir0KwjAYRYMoWLSDbxBwjubHhHZVLIKDi4NbSZOvNtI2QlooiO9uBwdHl3vOgYvQitENo0ps2WaXKEUlm6CIM6WIFPw2_fE5ikN4UEoZFSJJVYTOmTd9AEucb0kBusGutb0Bi61u9B3GxF01TunqJmBfYuObZw0D9oOzgPcug8sr9AUW7yWalboOEH-5QOvseD2ciA-dy4NxHZjK-LYF0-Wcc5VKKcR_rw9Do0Ix</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3}</title><source>DOAJ Directory of Open Access Journals</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><creator>Siemons, W. ; Beekman, C. ; Budai, J. D. ; Christen, H. M. ; Fowlkes, J. D. ; Balke, N. ; Tischler, J. Z. ; Xu, R. ; Liu, W. ; Gonzales, C. M.</creator><creatorcontrib>Siemons, W. ; Beekman, C. ; Budai, J. D. ; Christen, H. M. ; Fowlkes, J. D. ; Balke, N. ; Tischler, J. Z. ; Xu, R. ; Liu, W. ; Gonzales, C. M.</creatorcontrib><description>An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO{sub 3} films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but does not result in measureable changes to morphology or stoichiometry. Therefore, this change would go undetected with standard laboratory equipment, but can significantly influence local material properties and must be taken into account when using a FIB to manufacture nanostructures. The damage is significantly reduced when a thin metallic layer is present on top of the film during the milling process, clearly indicating that the reduced crystallinity is caused by ion beam induced charging.</description><identifier>ISSN: 2166-532X</identifier><identifier>EISSN: 2166-532X</identifier><identifier>DOI: 10.1063/1.4866051</identifier><language>eng</language><publisher>United States</publisher><subject>CRYSTALS ; EPITAXY ; ION BEAMS ; LAYERS ; MATERIALS SCIENCE ; NANOSCIENCE AND NANOTECHNOLOGY ; NANOSTRUCTURES ; OXIDES ; PEROVSKITE ; SYNCHROTRONS ; THIN FILMS ; X RADIATION</subject><ispartof>APL materials, 2014-02, Vol.2 (2)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,860,881,27901,27902</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/22269553$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Siemons, W.</creatorcontrib><creatorcontrib>Beekman, C.</creatorcontrib><creatorcontrib>Budai, J. D.</creatorcontrib><creatorcontrib>Christen, H. M.</creatorcontrib><creatorcontrib>Fowlkes, J. D.</creatorcontrib><creatorcontrib>Balke, N.</creatorcontrib><creatorcontrib>Tischler, J. Z.</creatorcontrib><creatorcontrib>Xu, R.</creatorcontrib><creatorcontrib>Liu, W.</creatorcontrib><creatorcontrib>Gonzales, C. M.</creatorcontrib><title>Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3}</title><title>APL materials</title><description>An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO{sub 3} films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but does not result in measureable changes to morphology or stoichiometry. Therefore, this change would go undetected with standard laboratory equipment, but can significantly influence local material properties and must be taken into account when using a FIB to manufacture nanostructures. The damage is significantly reduced when a thin metallic layer is present on top of the film during the milling process, clearly indicating that the reduced crystallinity is caused by ion beam induced charging.</description><subject>CRYSTALS</subject><subject>EPITAXY</subject><subject>ION BEAMS</subject><subject>LAYERS</subject><subject>MATERIALS SCIENCE</subject><subject>NANOSCIENCE AND NANOTECHNOLOGY</subject><subject>NANOSTRUCTURES</subject><subject>OXIDES</subject><subject>PEROVSKITE</subject><subject>SYNCHROTRONS</subject><subject>THIN FILMS</subject><subject>X RADIATION</subject><issn>2166-532X</issn><issn>2166-532X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNqNir0KwjAYRYMoWLSDbxBwjubHhHZVLIKDi4NbSZOvNtI2QlooiO9uBwdHl3vOgYvQitENo0ps2WaXKEUlm6CIM6WIFPw2_fE5ikN4UEoZFSJJVYTOmTd9AEucb0kBusGutb0Bi61u9B3GxF01TunqJmBfYuObZw0D9oOzgPcug8sr9AUW7yWalboOEH-5QOvseD2ciA-dy4NxHZjK-LYF0-Wcc5VKKcR_rw9Do0Ix</recordid><startdate>20140201</startdate><enddate>20140201</enddate><creator>Siemons, W.</creator><creator>Beekman, C.</creator><creator>Budai, J. D.</creator><creator>Christen, H. M.</creator><creator>Fowlkes, J. D.</creator><creator>Balke, N.</creator><creator>Tischler, J. Z.</creator><creator>Xu, R.</creator><creator>Liu, W.</creator><creator>Gonzales, C. M.</creator><scope>OTOTI</scope></search><sort><creationdate>20140201</creationdate><title>Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3}</title><author>Siemons, W. ; Beekman, C. ; Budai, J. D. ; Christen, H. M. ; Fowlkes, J. D. ; Balke, N. ; Tischler, J. Z. ; Xu, R. ; Liu, W. ; Gonzales, C. M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_222695533</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>CRYSTALS</topic><topic>EPITAXY</topic><topic>ION BEAMS</topic><topic>LAYERS</topic><topic>MATERIALS SCIENCE</topic><topic>NANOSCIENCE AND NANOTECHNOLOGY</topic><topic>NANOSTRUCTURES</topic><topic>OXIDES</topic><topic>PEROVSKITE</topic><topic>SYNCHROTRONS</topic><topic>THIN FILMS</topic><topic>X RADIATION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Siemons, W.</creatorcontrib><creatorcontrib>Beekman, C.</creatorcontrib><creatorcontrib>Budai, J. D.</creatorcontrib><creatorcontrib>Christen, H. M.</creatorcontrib><creatorcontrib>Fowlkes, J. D.</creatorcontrib><creatorcontrib>Balke, N.</creatorcontrib><creatorcontrib>Tischler, J. Z.</creatorcontrib><creatorcontrib>Xu, R.</creatorcontrib><creatorcontrib>Liu, W.</creatorcontrib><creatorcontrib>Gonzales, C. M.</creatorcontrib><collection>OSTI.GOV</collection><jtitle>APL materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Siemons, W.</au><au>Beekman, C.</au><au>Budai, J. D.</au><au>Christen, H. M.</au><au>Fowlkes, J. D.</au><au>Balke, N.</au><au>Tischler, J. Z.</au><au>Xu, R.</au><au>Liu, W.</au><au>Gonzales, C. M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3}</atitle><jtitle>APL materials</jtitle><date>2014-02-01</date><risdate>2014</risdate><volume>2</volume><issue>2</issue><issn>2166-532X</issn><eissn>2166-532X</eissn><abstract>An unexpected, strong deterioration of crystal quality is observed in epitaxial perovskite BiFeO{sub 3} films in which microscale features have been patterned by focused-ion-beam (FIB) milling. Specifically, synchrotron x-ray microdiffraction shows that the damaged region extends to tens of μm, but does not result in measureable changes to morphology or stoichiometry. Therefore, this change would go undetected with standard laboratory equipment, but can significantly influence local material properties and must be taken into account when using a FIB to manufacture nanostructures. The damage is significantly reduced when a thin metallic layer is present on top of the film during the milling process, clearly indicating that the reduced crystallinity is caused by ion beam induced charging.</abstract><cop>United States</cop><doi>10.1063/1.4866051</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 2166-532X |
| ispartof | APL materials, 2014-02, Vol.2 (2) |
| issn | 2166-532X 2166-532X |
| language | eng |
| recordid | cdi_osti_scitechconnect_22269553 |
| source | DOAJ Directory of Open Access Journals; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals |
| subjects | CRYSTALS EPITAXY ION BEAMS LAYERS MATERIALS SCIENCE NANOSCIENCE AND NANOTECHNOLOGY NANOSTRUCTURES OXIDES PEROVSKITE SYNCHROTRONS THIN FILMS X RADIATION |
| title | Focused-ion-beam induced damage in thin films of complex oxide BiFeO{sub 3} |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-12T23%3A08%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Focused-ion-beam%20induced%20damage%20in%20thin%20films%20of%20complex%20oxide%20BiFeO%7Bsub%203%7D&rft.jtitle=APL%20materials&rft.au=Siemons,%20W.&rft.date=2014-02-01&rft.volume=2&rft.issue=2&rft.issn=2166-532X&rft.eissn=2166-532X&rft_id=info:doi/10.1063/1.4866051&rft_dat=%3Costi%3E22269553%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |