Heteroepitaxy of group IV-VI nitrides by atomic layer deposition

Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (α-Al2O3) is demonstrated using atomic layer deposition. High quality, epitaxial films are produced at significantly lower temperatures than required by conventional deposition methods. Characterization of el...

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Veröffentlicht in:Applied physics letters 2013-11, Vol.103 (21)
Hauptverfasser: Klug, Jeffrey A., Becker, Nicholas G., Groll, Nickolas R., Cao, Chaoyue, Weimer, Matthew S., Pellin, Michael J., Zasadzinski, John F., Proslier, Thomas
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container_issue 21
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container_title Applied physics letters
container_volume 103
creator Klug, Jeffrey A.
Becker, Nicholas G.
Groll, Nickolas R.
Cao, Chaoyue
Weimer, Matthew S.
Pellin, Michael J.
Zasadzinski, John F.
Proslier, Thomas
description Heteroepitaxial growth of selected group IV-VI nitrides on various orientations of sapphire (α-Al2O3) is demonstrated using atomic layer deposition. High quality, epitaxial films are produced at significantly lower temperatures than required by conventional deposition methods. Characterization of electrical and superconducting properties of epitaxial films reveals a reduced room temperature resistivity and increased residual resistance ratio for films deposited on sapphire compared to polycrystalline samples deposited concurrently on fused quartz substrates.
doi_str_mv 10.1063/1.4831977
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subjects ALUMINIUM OXIDES
Aluminum oxide
Applied physics
Atomic layer epitaxy
DEPOSITION
Electrical properties
EPITAXY
Fused quartz
MATERIALS SCIENCE
NITRIDES
ORIENTATION
POLYCRYSTALS
QUARTZ
SAPPHIRE
SUBSTRATES
title Heteroepitaxy of group IV-VI nitrides by atomic layer deposition
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