Effects of temperature dependent pre-amorphization implantation on NiPt silicide formation and thermal stability on Si(100)

Using temperature controlled Si and C ion implantation, we studied the effects of pre-amorphization implantation on NiPt alloy silicide phase formation. In situ synchrotron x-ray diffraction and resistance measurements were used to monitor phase and morphology evolution in silicide films. Results sh...

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Veröffentlicht in:	Applied physics letters 2013-04, Vol.102 (17)
Hauptverfasser:	Ozcan, Ahmet S., Wall, Donald, Jordan-Sweet, Jean, Lavoie, Christian
Format:	Artikel
Sprache:	eng
Schlagworte:	AMORPHOUS STATE CARBON IONS EVOLUTION ION IMPLANTATION MATERIALS SCIENCE NICKEL ALLOYS NUCLEATION PLATINUM ALLOYS SILICIDES SILICON ALLOYS SILICON IONS STABILITY SUBSTRATES TEMPERATURE DEPENDENCE THIN FILMS X-RAY DIFFRACTION
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