X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

The chemistry of atmospheric pressure chemical vapor deposition (APCVD) processes is believed to be complex, and detailed reports on reaction mechanisms are scarce. Here, the authors investigated the reaction mechanism of monobutyl tinchloride (MBTC) and water during SnO2 thin film growth using x-ra...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2013-01, Vol.31 (1)
Hauptverfasser:	Mannie, Gilbère J. A., Gerritsen, Gijsbert, Abbenhuis, Hendrikus C. L., van Deelen, Joop, (Hans) Niemantsverdriet, J. W., Thüne, Peter C.
Format:	Artikel
Sprache:	eng
Schlagworte:	ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY COORDINATION NUMBER COORDINATION VALENCES CRYSTAL GROWTH HYDROLYSIS INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY LAYERS NUCLEATION ORGANIC COMPOUNDS PRECURSOR REACTION KINETICS THIN FILMS TIN CHLORIDES TIN OXIDES TRANSMISSION ELECTRON MICROSCOPY WATER X-RAY PHOTOELECTRON SPECTROSCOPY
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