Highly sensitive silicon microreactor for catalyst testing
A novel microfabricated chemical reactor for highly sensitive measurements of catalytic activity and surface kinetics is presented. The reactor is fabricated in a silicon chip and is intended for gas-phase reactions at pressures ranging from 0.1 to 5.0 bar. A high sensitivity is obtained by directin...
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Veröffentlicht in: | Review of scientific instruments 2009-12, Vol.80 (12), p.124101-124101-10 |
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creator | Henriksen, Toke R. Olsen, Jakob L. Vesborg, Peter Chorkendorff, Ib Hansen, Ole |
description | A novel microfabricated chemical reactor for highly sensitive measurements of catalytic activity and surface kinetics is presented. The reactor is fabricated in a silicon chip and is intended for gas-phase reactions at pressures ranging from 0.1 to 5.0 bar. A high sensitivity is obtained by directing the entire gas flow through the catalyst bed to a mass spectrometer, thus ensuring that nearly all reaction products are present in the analyzed gas flow. Although the device can be employed for testing a wide range of catalysts, the primary aim of the design is to allow characterization of model catalysts which can only be obtained in small quantities. Such measurements are of significant fundamental interest but are challenging because of the low surface areas involved. The relationship between the reaction zone gas flow and the pressure in the reaction zone is investigated experimentally. A corresponding theoretical model is presented, and the gas flow through an on-chip flow-limiting capillary is predicted to be in the intermediate regime. The experimental data for the gas flow are found to be in good agreement with the theoretical model. At typical experimental conditions, the total gas flow through the reaction zone is around
3
×
10
14
molecules
s
−
1
, corresponding to a gas residence time in the reaction zone of about 11 s. To demonstrate the operation of the microreactor, CO oxidation on low-area platinum thin film circles is employed as a test reaction. Using temperature ramping, it is found that platinum catalysts with areas as small as
15
μ
m
2
are conveniently characterized with the device. |
doi_str_mv | 10.1063/1.3270191 |
format | Article |
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3
×
10
14
molecules
s
−
1
, corresponding to a gas residence time in the reaction zone of about 11 s. To demonstrate the operation of the microreactor, CO oxidation on low-area platinum thin film circles is employed as a test reaction. Using temperature ramping, it is found that platinum catalysts with areas as small as
15
μ
m
2
are conveniently characterized with the device.</description><identifier>ISSN: 0034-6748</identifier><identifier>EISSN: 1089-7623</identifier><identifier>DOI: 10.1063/1.3270191</identifier><identifier>PMID: 20059154</identifier><identifier>CODEN: RSINAK</identifier><language>eng</language><publisher>United States: American Institute of Physics</publisher><subject>CARBON MONOXIDE ; CATALYSIS ; CATALYSTS ; CHEMICAL ANALYSIS ; CHEMICAL REACTORS ; GAS FLOW ; INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY ; MASS SPECTROSCOPY ; MATERIALS SCIENCE ; MATERIALS TESTING ; OPERATION ; OXIDATION ; PLATINUM ; REACTION KINETICS ; SEMICONDUCTOR MATERIALS ; SENSITIVITY ; SILICON ; SURFACE AREA ; THIN FILMS</subject><ispartof>Review of scientific instruments, 2009-12, Vol.80 (12), p.124101-124101-10</ispartof><rights>American Institute of Physics</rights><rights>2009 American Institute of Physics</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c509t-fbf4f9793737cb03ea52e520ebd50e633b25cd69d5f73047496ee18a639482373</citedby><cites>FETCH-LOGICAL-c509t-fbf4f9793737cb03ea52e520ebd50e633b25cd69d5f73047496ee18a639482373</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/rsi/article-lookup/doi/10.1063/1.3270191$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>230,314,780,784,794,885,1559,4512,27924,27925,76384,76390</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/20059154$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/22051124$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Henriksen, Toke R.</creatorcontrib><creatorcontrib>Olsen, Jakob L.</creatorcontrib><creatorcontrib>Vesborg, Peter</creatorcontrib><creatorcontrib>Chorkendorff, Ib</creatorcontrib><creatorcontrib>Hansen, Ole</creatorcontrib><title>Highly sensitive silicon microreactor for catalyst testing</title><title>Review of scientific instruments</title><addtitle>Rev Sci Instrum</addtitle><description>A novel microfabricated chemical reactor for highly sensitive measurements of catalytic activity and surface kinetics is presented. The reactor is fabricated in a silicon chip and is intended for gas-phase reactions at pressures ranging from 0.1 to 5.0 bar. A high sensitivity is obtained by directing the entire gas flow through the catalyst bed to a mass spectrometer, thus ensuring that nearly all reaction products are present in the analyzed gas flow. Although the device can be employed for testing a wide range of catalysts, the primary aim of the design is to allow characterization of model catalysts which can only be obtained in small quantities. Such measurements are of significant fundamental interest but are challenging because of the low surface areas involved. The relationship between the reaction zone gas flow and the pressure in the reaction zone is investigated experimentally. A corresponding theoretical model is presented, and the gas flow through an on-chip flow-limiting capillary is predicted to be in the intermediate regime. The experimental data for the gas flow are found to be in good agreement with the theoretical model. At typical experimental conditions, the total gas flow through the reaction zone is around
3
×
10
14
molecules
s
−
1
, corresponding to a gas residence time in the reaction zone of about 11 s. To demonstrate the operation of the microreactor, CO oxidation on low-area platinum thin film circles is employed as a test reaction. Using temperature ramping, it is found that platinum catalysts with areas as small as
15
μ
m
2
are conveniently characterized with the device.</description><subject>CARBON MONOXIDE</subject><subject>CATALYSIS</subject><subject>CATALYSTS</subject><subject>CHEMICAL ANALYSIS</subject><subject>CHEMICAL REACTORS</subject><subject>GAS FLOW</subject><subject>INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY</subject><subject>MASS SPECTROSCOPY</subject><subject>MATERIALS SCIENCE</subject><subject>MATERIALS TESTING</subject><subject>OPERATION</subject><subject>OXIDATION</subject><subject>PLATINUM</subject><subject>REACTION KINETICS</subject><subject>SEMICONDUCTOR MATERIALS</subject><subject>SENSITIVITY</subject><subject>SILICON</subject><subject>SURFACE AREA</subject><subject>THIN FILMS</subject><issn>0034-6748</issn><issn>1089-7623</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNqNkM1LwzAchoMobk4P_gNS8CAKnflq03gQZKgTBl70HNL01y3Sj9lkg_33ZnTOk2IgJIcnb97fg9A5wWOCU3ZLxowKTCQ5QEOCMxmLlLJDNMSY8TgVPBugE-c-cFgJIcdoQMNFkoQP0d3UzhfVJnLQOOvtGiJnK2vaJqqt6doOtPFtF5VhG-11tXE-8uC8bean6KjUlYOz3TlC70-Pb5NpPHt9fpk8zGKTYOnjMi95KYVkggmTYwY6oZBQDHmRYEgZy2liilQWSSkY5oLLFIBkOmWSZzS8GqHLPrcN3ypnrAezCA0bMF5Ruh2J8kBd9dSyaz9XoaGqrTNQVbqBduWUYCwVgjMSyOueDPM510Gplp2tdbdRBKutT0XUzmdgL3apq7yGYk9-CwzAfQ9se2lv2-b3tF612qtWQXUIuPl3wF_wuu1-QLUsSvYFEJOf0w</recordid><startdate>20091201</startdate><enddate>20091201</enddate><creator>Henriksen, Toke R.</creator><creator>Olsen, Jakob L.</creator><creator>Vesborg, Peter</creator><creator>Chorkendorff, Ib</creator><creator>Hansen, Ole</creator><general>American Institute of Physics</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>OTOTI</scope></search><sort><creationdate>20091201</creationdate><title>Highly sensitive silicon microreactor for catalyst testing</title><author>Henriksen, Toke R. ; Olsen, Jakob L. ; Vesborg, Peter ; Chorkendorff, Ib ; Hansen, Ole</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c509t-fbf4f9793737cb03ea52e520ebd50e633b25cd69d5f73047496ee18a639482373</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>CARBON MONOXIDE</topic><topic>CATALYSIS</topic><topic>CATALYSTS</topic><topic>CHEMICAL ANALYSIS</topic><topic>CHEMICAL REACTORS</topic><topic>GAS FLOW</topic><topic>INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY</topic><topic>MASS SPECTROSCOPY</topic><topic>MATERIALS SCIENCE</topic><topic>MATERIALS TESTING</topic><topic>OPERATION</topic><topic>OXIDATION</topic><topic>PLATINUM</topic><topic>REACTION KINETICS</topic><topic>SEMICONDUCTOR MATERIALS</topic><topic>SENSITIVITY</topic><topic>SILICON</topic><topic>SURFACE AREA</topic><topic>THIN FILMS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Henriksen, Toke R.</creatorcontrib><creatorcontrib>Olsen, Jakob L.</creatorcontrib><creatorcontrib>Vesborg, Peter</creatorcontrib><creatorcontrib>Chorkendorff, Ib</creatorcontrib><creatorcontrib>Hansen, Ole</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>OSTI.GOV</collection><jtitle>Review of scientific instruments</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Henriksen, Toke R.</au><au>Olsen, Jakob L.</au><au>Vesborg, Peter</au><au>Chorkendorff, Ib</au><au>Hansen, Ole</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Highly sensitive silicon microreactor for catalyst testing</atitle><jtitle>Review of scientific instruments</jtitle><addtitle>Rev Sci Instrum</addtitle><date>2009-12-01</date><risdate>2009</risdate><volume>80</volume><issue>12</issue><spage>124101</spage><epage>124101-10</epage><pages>124101-124101-10</pages><issn>0034-6748</issn><eissn>1089-7623</eissn><coden>RSINAK</coden><abstract>A novel microfabricated chemical reactor for highly sensitive measurements of catalytic activity and surface kinetics is presented. The reactor is fabricated in a silicon chip and is intended for gas-phase reactions at pressures ranging from 0.1 to 5.0 bar. A high sensitivity is obtained by directing the entire gas flow through the catalyst bed to a mass spectrometer, thus ensuring that nearly all reaction products are present in the analyzed gas flow. Although the device can be employed for testing a wide range of catalysts, the primary aim of the design is to allow characterization of model catalysts which can only be obtained in small quantities. Such measurements are of significant fundamental interest but are challenging because of the low surface areas involved. The relationship between the reaction zone gas flow and the pressure in the reaction zone is investigated experimentally. A corresponding theoretical model is presented, and the gas flow through an on-chip flow-limiting capillary is predicted to be in the intermediate regime. The experimental data for the gas flow are found to be in good agreement with the theoretical model. At typical experimental conditions, the total gas flow through the reaction zone is around
3
×
10
14
molecules
s
−
1
, corresponding to a gas residence time in the reaction zone of about 11 s. To demonstrate the operation of the microreactor, CO oxidation on low-area platinum thin film circles is employed as a test reaction. Using temperature ramping, it is found that platinum catalysts with areas as small as
15
μ
m
2
are conveniently characterized with the device.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><pmid>20059154</pmid><doi>10.1063/1.3270191</doi><tpages>10</tpages><oa>free_for_read</oa></addata></record> |
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source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
subjects | CARBON MONOXIDE CATALYSIS CATALYSTS CHEMICAL ANALYSIS CHEMICAL REACTORS GAS FLOW INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY MASS SPECTROSCOPY MATERIALS SCIENCE MATERIALS TESTING OPERATION OXIDATION PLATINUM REACTION KINETICS SEMICONDUCTOR MATERIALS SENSITIVITY SILICON SURFACE AREA THIN FILMS |
title | Highly sensitive silicon microreactor for catalyst testing |
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