Application of X-ray diffraction methods in the study of micrometer-sized porous Si layers
An X-ray analysis of porous silicon layers (Sb-doped n + -Si(111)) obtained by anodic oxidation for different times with a current of 50 mA/cm 2 is performed by the methods of double-crystal rocking curves and total external reflection. A nondestructive method for monitoring the stationary process o...
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Veröffentlicht in: | Crystallography reports 2009-05, Vol.54 (3), p.379-385 |
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