Pulsed laser deposition of ITO thin films and their characteristics

Pulsed laser deposition of ITO thin films and their characteristics

The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentratio...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2012-03, Vol.46 (3), p.410-413
Hauptverfasser: Zuev, D. A., Lotin, A. A., Novodvorsky, O. A., Lebedev, F. V., Khramova, O. D., Petuhov, I. A., Putilin, Ph. N., Shatohin, A. N., Rumyanzeva, M. N., Gaskov, A. M.
Format: Artikel
Sprache:eng
Schlagworte:
Dielectric films
Electric properties
ENERGY BEAM DEPOSITION
Fabrication
GLASS
INDIUM
LASER RADIATION
Magnetic Materials
Magnetism
MATERIALS SCIENCE
OPTICAL PROPERTIES
Physics
Physics and Astronomy
SUBSTRATES
Testing of Materials and Structures
THIN FILMS
TIN OXIDES
Treatment
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Zusammenfassung:The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentration in the target. The transmittance of grown ITO films in the visible spectral region exceeds 85%. The minimum value of resistivity 1.79 × 10 −4 Ω cm has been achieved in the ITO films with content of Sn 5 at %.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782612030256