Influence of local atomic configuration in AlGdN phosphor thin films on deep ultra-violet luminescence intensity

We investigated the narrowband ultraviolet emission properties of Al 0.94 Gd 0.06 N phosphor thin films pumped by an electron beam. An extremely narrow luminescence line, which was less than 1 nm from the intra-orbital f-f transition in Gd 3+ ions, was confirmed at 318 nm. The corresponding emission...

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Veröffentlicht in:Journal of applied physics 2011-11, Vol.110 (9), p.093108-093108-4
Hauptverfasser: Kitayama, Shinya, Yoshitomi, Hiroaki, Iwahashi, Shinya, Nakamura, Junya, Kita, Takashi, Chigi, Yoshitaka, Nishimoto, Tetsuro, Tanaka, Hiroyuki, Kobayashi, Mikihiro, Ishihara, Tsuguo, Izumi, Hirokazu
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Sprache:eng
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