The influence of a doping profile on the characteristics of an ion-implanted GaAs field-effect transistor with a Schottky barrier

A GaAs field-effect ion-implanted transistor with a Schottky barrier is simulated. The doping profile obtained when doping through an insulator mask is determined and the dependences of the static transistor characteristics on the parameters of the doping profile are calculated and analyzed. The phy...

Ausführliche Beschreibung