The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges
Dual-frequency capacitive discharges are used to separately control the mean ion energy, ε ¯ ion , and flux, Γ ion , at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2 + 27 MHz at different pressures using Particle in Cell simulat...
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| Veröffentlicht in: | Applied physics letters 2010-08, Vol.97 (8), p.081501-081501-3 |
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| container_end_page | 081501-3 |
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| container_issue | 8 |
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| container_title | Applied physics letters |
| container_volume | 97 |
| creator | Donkó, Z. Schulze, J. Hartmann, P. Korolov, I. Czarnetzki, U. Schüngel, E. |
| description | Dual-frequency capacitive discharges are used to separately control the mean ion energy,
ε
¯
ion
, and flux,
Γ
ion
, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at
2
+
27
MHz
at different pressures using Particle in Cell simulations. For secondary yield
γ
≈
0
,
Γ
ion
decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high
γ
due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited.
ε
¯
ion
increases with
γ
, which might allow an
in situ
determination of
γ
-coefficients. |
| doi_str_mv | 10.1063/1.3481427 |
| format | Article |
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ε
¯
ion
, and flux,
Γ
ion
, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at
2
+
27
MHz
at different pressures using Particle in Cell simulations. For secondary yield
γ
≈
0
,
Γ
ion
decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high
γ
due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited.
ε
¯
ion
increases with
γ
, which might allow an
in situ
determination of
γ
-coefficients.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.3481427</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>United States: American Institute of Physics</publisher><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY ; ARGON ; ATOMIC AND MOLECULAR PHYSICS ; CHARGED PARTICLES ; CHARGED-PARTICLE TRANSPORT ; COMPUTERIZED SIMULATION ; CONTROL ; COUPLING ; ELECTRIC DISCHARGES ; ELECTRIC POTENTIAL ; ELECTRODES ; ELECTROMAGNETIC RADIATION ; ELECTRONS ; ELEMENTARY PARTICLES ; ELEMENTS ; FERMIONS ; FLUIDS ; FREQUENCY RANGE ; GASES ; HIGH-FREQUENCY DISCHARGES ; IONS ; LEPTONS ; MHZ RANGE ; NONMETALS ; PLASMA ; PLASMA SHEATH ; PLASMA SIMULATION ; RADIATION TRANSPORT ; RADIATIONS ; RADIOWAVE RADIATION ; RARE GASES ; SIMULATION</subject><ispartof>Applied physics letters, 2010-08, Vol.97 (8), p.081501-081501-3</ispartof><rights>2010 American Institute of Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c378t-1685d7aee6d0697207c1de84c3e3383108239a66ced26223cf18d96eba5c14a43</citedby><cites>FETCH-LOGICAL-c378t-1685d7aee6d0697207c1de84c3e3383108239a66ced26223cf18d96eba5c14a43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.3481427$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>230,314,776,780,790,881,1553,4498,27901,27902,76126,76132</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/21466900$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Donkó, Z.</creatorcontrib><creatorcontrib>Schulze, J.</creatorcontrib><creatorcontrib>Hartmann, P.</creatorcontrib><creatorcontrib>Korolov, I.</creatorcontrib><creatorcontrib>Czarnetzki, U.</creatorcontrib><creatorcontrib>Schüngel, E.</creatorcontrib><title>The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges</title><title>Applied physics letters</title><description>Dual-frequency capacitive discharges are used to separately control the mean ion energy,
ε
¯
ion
, and flux,
Γ
ion
, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at
2
+
27
MHz
at different pressures using Particle in Cell simulations. For secondary yield
γ
≈
0
,
Γ
ion
decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high
γ
due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited.
ε
¯
ion
increases with
γ
, which might allow an
in situ
determination of
γ
-coefficients.</description><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</subject><subject>ARGON</subject><subject>ATOMIC AND MOLECULAR PHYSICS</subject><subject>CHARGED PARTICLES</subject><subject>CHARGED-PARTICLE TRANSPORT</subject><subject>COMPUTERIZED SIMULATION</subject><subject>CONTROL</subject><subject>COUPLING</subject><subject>ELECTRIC DISCHARGES</subject><subject>ELECTRIC POTENTIAL</subject><subject>ELECTRODES</subject><subject>ELECTROMAGNETIC RADIATION</subject><subject>ELECTRONS</subject><subject>ELEMENTARY PARTICLES</subject><subject>ELEMENTS</subject><subject>FERMIONS</subject><subject>FLUIDS</subject><subject>FREQUENCY RANGE</subject><subject>GASES</subject><subject>HIGH-FREQUENCY DISCHARGES</subject><subject>IONS</subject><subject>LEPTONS</subject><subject>MHZ RANGE</subject><subject>NONMETALS</subject><subject>PLASMA</subject><subject>PLASMA SHEATH</subject><subject>PLASMA SIMULATION</subject><subject>RADIATION TRANSPORT</subject><subject>RADIATIONS</subject><subject>RADIOWAVE RADIATION</subject><subject>RARE GASES</subject><subject>SIMULATION</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LxDAQhoMouK4e_AcBTx665qNN04sgi1-w4GU9h5hMdiO1qUkr7t_wF5ulC548DTPvwzDzIHRJyYISwW_ogpeSlqw-QjNK6rrglMpjNCOE8EI0FT1FZym957ZinM_Qz3oLGJwDM-DgcAITOqvjDkObRzF0CYcODxlK0OuoB8CZyEG7x33OoIO42WHdWeza8Rv7DttRt4WL8DlCZ3bY6F4bP_gvaHMTxr4Fi6O2PuA_yPpktjpuIJ2jE6fbBBeHOkevD_fr5VOxenl8Xt6tCsNrORRUyMrWGkBYIpqakdpQC7I0HDiXnBLJeKOFMGCZYIwbR6VtBLzpytBSl3yOrqa9IQ1epXwhmG1-rsuPK0ZLIZosbY6uJ8rEkFIEp_roP7IhRYnaK1dUHZRn9nZi98v0kO38D2fvavKuglOTd_4LAFqLFg</recordid><startdate>20100823</startdate><enddate>20100823</enddate><creator>Donkó, Z.</creator><creator>Schulze, J.</creator><creator>Hartmann, P.</creator><creator>Korolov, I.</creator><creator>Czarnetzki, U.</creator><creator>Schüngel, E.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20100823</creationdate><title>The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges</title><author>Donkó, Z. ; Schulze, J. ; Hartmann, P. ; Korolov, I. ; Czarnetzki, U. ; Schüngel, E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c378t-1685d7aee6d0697207c1de84c3e3383108239a66ced26223cf18d96eba5c14a43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</topic><topic>ARGON</topic><topic>ATOMIC AND MOLECULAR PHYSICS</topic><topic>CHARGED PARTICLES</topic><topic>CHARGED-PARTICLE TRANSPORT</topic><topic>COMPUTERIZED SIMULATION</topic><topic>CONTROL</topic><topic>COUPLING</topic><topic>ELECTRIC DISCHARGES</topic><topic>ELECTRIC POTENTIAL</topic><topic>ELECTRODES</topic><topic>ELECTROMAGNETIC RADIATION</topic><topic>ELECTRONS</topic><topic>ELEMENTARY PARTICLES</topic><topic>ELEMENTS</topic><topic>FERMIONS</topic><topic>FLUIDS</topic><topic>FREQUENCY RANGE</topic><topic>GASES</topic><topic>HIGH-FREQUENCY DISCHARGES</topic><topic>IONS</topic><topic>LEPTONS</topic><topic>MHZ RANGE</topic><topic>NONMETALS</topic><topic>PLASMA</topic><topic>PLASMA SHEATH</topic><topic>PLASMA SIMULATION</topic><topic>RADIATION TRANSPORT</topic><topic>RADIATIONS</topic><topic>RADIOWAVE RADIATION</topic><topic>RARE GASES</topic><topic>SIMULATION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Donkó, Z.</creatorcontrib><creatorcontrib>Schulze, J.</creatorcontrib><creatorcontrib>Hartmann, P.</creatorcontrib><creatorcontrib>Korolov, I.</creatorcontrib><creatorcontrib>Czarnetzki, U.</creatorcontrib><creatorcontrib>Schüngel, E.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Donkó, Z.</au><au>Schulze, J.</au><au>Hartmann, P.</au><au>Korolov, I.</au><au>Czarnetzki, U.</au><au>Schüngel, E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges</atitle><jtitle>Applied physics letters</jtitle><date>2010-08-23</date><risdate>2010</risdate><volume>97</volume><issue>8</issue><spage>081501</spage><epage>081501-3</epage><pages>081501-081501-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Dual-frequency capacitive discharges are used to separately control the mean ion energy,
ε
¯
ion
, and flux,
Γ
ion
, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at
2
+
27
MHz
at different pressures using Particle in Cell simulations. For secondary yield
γ
≈
0
,
Γ
ion
decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high
γ
due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited.
ε
¯
ion
increases with
γ
, which might allow an
in situ
determination of
γ
-coefficients.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><doi>10.1063/1.3481427</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 2010-08, Vol.97 (8), p.081501-081501-3 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_osti_scitechconnect_21466900 |
| source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
| subjects | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY ARGON ATOMIC AND MOLECULAR PHYSICS CHARGED PARTICLES CHARGED-PARTICLE TRANSPORT COMPUTERIZED SIMULATION CONTROL COUPLING ELECTRIC DISCHARGES ELECTRIC POTENTIAL ELECTRODES ELECTROMAGNETIC RADIATION ELECTRONS ELEMENTARY PARTICLES ELEMENTS FERMIONS FLUIDS FREQUENCY RANGE GASES HIGH-FREQUENCY DISCHARGES IONS LEPTONS MHZ RANGE NONMETALS PLASMA PLASMA SHEATH PLASMA SIMULATION RADIATION TRANSPORT RADIATIONS RADIOWAVE RADIATION RARE GASES SIMULATION |
| title | The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges |
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