Control of plasma uniformity in a capacitive discharge using two very high frequency power sources

Very high frequency (VHF) capacitively coupled plasma (CCP) discharges are being employed for dielectric etching due to VHF's various benefits including low plasma potential, high electron density, and controllable dissociation. If the plasma is generated using multiple VHF sources, one can exp...

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Veröffentlicht in:	Journal of applied physics 2009-08, Vol.106 (3), p.033301-033301-7
Hauptverfasser:	Bera, Kallol, Rauf, Shahid, Ramaswamy, Kartik, Collins, Ken
Format:	Artikel
Sprache:	eng
Schlagworte:	70 PLASMA PHYSICS AND FUSION TECHNOLOGY BOUNDARY LAYERS CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS DIELECTRIC MATERIALS DIFFERENTIAL EQUATIONS DISSOCIATION ELECTRIC DISCHARGES ELECTRIC POTENTIAL ELECTRIC PROBES ELECTRODES ELECTROMAGNETIC RADIATION ELECTRON DENSITY EQUATIONS FREQUENCY RANGE HIGH-FREQUENCY DISCHARGES LANGMUIR PROBE LAYERS MATERIALS MAXWELL EQUATIONS MHZ RANGE MHZ RANGE 100-1000 PARTIAL DIFFERENTIAL EQUATIONS PLASMA PLASMA DENSITY PLASMA POTENTIAL PLASMA SIMULATION PLASMA WAVES PROBES RADIATIONS SIMULATION TWO-DIMENSIONAL CALCULATIONS
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