Local stress engineering of magnetic anisotropy in soft magnetic thin films

The magnetic anisotropy of amorphous thin films was modified laterally by masked ion irradiation without alteration of the intrinsic magnetic properties. The changes were introduced by local ion implantation in a protection layer, causing additional stress-induced magnetic anisotropy in the magnetos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Applied physics letters 2009-02, Vol.94 (6), p.062506-062506-3
Hauptverfasser:	Martin, Norbert, McCord, Jeffrey, Gerber, Andreas, Strache, Thomas, Gemming, Thomas, Mönch, Ingolf, Farag, Nayel, Schäfer, Rudolf, Fassbender, Jürgen, Quandt, Eckhard, Schultz, Ludwig
Format:	Artikel
Sprache:	eng
Schlagworte:	AMORPHOUS STATE ANISOTROPY ION IMPLANTATION LAYERS MAGNETIC MATERIALS MAGNETIZATION MAGNETOSTRICTION MATERIALS SCIENCE STRESSES THIN FILMS
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!