Single impact crater functions for ion bombardment of silicon
The average effect of a single 500 eV incident argon ion on a silicon surface is studied using molecular dynamics simulations. More than 10 3 ion impacts at random surface points are averaged for each of seven incidence angles, from 0° to 28° off normal, to determine a local surface height change fu...
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Veröffentlicht in: | Applied physics letters 2008-03, Vol.92 (13), p.131909-131909-3 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | The average effect of a single
500
eV
incident argon ion on a silicon surface is studied using molecular dynamics simulations. More than
10
3
ion impacts at random surface points are averaged for each of seven incidence angles, from 0° to 28° off normal, to determine a local surface height change function, or a
crater function
. The crater shapes are mostly determined by mass rearrangement; sputtering has a relatively small effect. Analytical fitting functions are provided for several cases, and may serve as input into kinetic Monte Carlo calculations or stability analyses for surfaces subjected to ion bombardment. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2905297 |