Single impact crater functions for ion bombardment of silicon

The average effect of a single 500 eV incident argon ion on a silicon surface is studied using molecular dynamics simulations. More than 10 3 ion impacts at random surface points are averaged for each of seven incidence angles, from 0° to 28° off normal, to determine a local surface height change fu...

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Veröffentlicht in:Applied physics letters 2008-03, Vol.92 (13), p.131909-131909-3
Hauptverfasser: Kalyanasundaram, N., Ghazisaeidi, M., Freund, J. B., Johnson, H. T.
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Sprache:eng
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Zusammenfassung:The average effect of a single 500 eV incident argon ion on a silicon surface is studied using molecular dynamics simulations. More than 10 3 ion impacts at random surface points are averaged for each of seven incidence angles, from 0° to 28° off normal, to determine a local surface height change function, or a crater function . The crater shapes are mostly determined by mass rearrangement; sputtering has a relatively small effect. Analytical fitting functions are provided for several cases, and may serve as input into kinetic Monte Carlo calculations or stability analyses for surfaces subjected to ion bombardment.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2905297