Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics
The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the depos...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 2007-05, Vol.101 (10) |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | 10 |
container_start_page | |
container_title | Journal of applied physics |
container_volume | 101 |
creator | Bayiati, P. Tserepi, A. Petrou, P. S. Kakabakos, S. E. Misiakos, K. Gogolides, E. |
description | The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C4F8 and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon® amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in “digital” microfluidics. |
doi_str_mv | 10.1063/1.2735682 |
format | Article |
fullrecord | <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_20982880</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_2735682</sourcerecordid><originalsourceid>FETCH-LOGICAL-c292t-db9ec7fb4d0dbaca6c4e559de43bb0218bc757cd5beab56cd2d0b846b34485863</originalsourceid><addsrcrecordid>eNotkE1LxDAQhoMouK4e_AcBTx665qNpk6Ms6wcseNFzSCapG2mbkkRk_72R9TQw8_Ayz4vQLSUbSjr-QDes56KT7AytKJGq6YUg52hFCKONVL26RFc5fxFCqeRqhcJu9FBS_PGlhPkTxxkvo8mTaZxfYg7FOzyM3zFFMMnW6-HoUlwO0QbAQxinjIeYsA2xUsHhksycl5gKDjOeAqTTPkC-RheDGbO_-Z9r9PG0e9--NPu359ft474BplhpnFUe-sG2jjhrwHTQeiGU8y23tkpIC73owQnrjRUdOOaIlW1nedtKITu-Rnen3JhL0BmqAhwgznP11IwoyaQklbo_UfXDnJMf9JLCZNJRU6L_mtRU_zfJfwFkvWkx</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><creator>Bayiati, P. ; Tserepi, A. ; Petrou, P. S. ; Kakabakos, S. E. ; Misiakos, K. ; Gogolides, E.</creator><creatorcontrib>Bayiati, P. ; Tserepi, A. ; Petrou, P. S. ; Kakabakos, S. E. ; Misiakos, K. ; Gogolides, E.</creatorcontrib><description>The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C4F8 and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon® amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in “digital” microfluidics.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.2735682</identifier><language>eng</language><publisher>United States</publisher><subject>ADSORPTION ; ATOMIC FORCE MICROSCOPY ; CARBON FLUORIDES ; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ; DEPOSITION ; DIELECTRIC MATERIALS ; ELECTRIC POTENTIAL ; ELECTRODES ; ELLIPSOMETRY ; LAYERS ; PERMITTIVITY ; PLASMA ; PROTEINS ; ROUGHNESS ; SILICON NITRIDES ; SOLUTIONS ; TEFLON ; THICKNESS ; THIN FILMS ; WETTABILITY</subject><ispartof>Journal of applied physics, 2007-05, Vol.101 (10)</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c292t-db9ec7fb4d0dbaca6c4e559de43bb0218bc757cd5beab56cd2d0b846b34485863</citedby><cites>FETCH-LOGICAL-c292t-db9ec7fb4d0dbaca6c4e559de43bb0218bc757cd5beab56cd2d0b846b34485863</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27923,27924</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/20982880$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Bayiati, P.</creatorcontrib><creatorcontrib>Tserepi, A.</creatorcontrib><creatorcontrib>Petrou, P. S.</creatorcontrib><creatorcontrib>Kakabakos, S. E.</creatorcontrib><creatorcontrib>Misiakos, K.</creatorcontrib><creatorcontrib>Gogolides, E.</creatorcontrib><title>Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics</title><title>Journal of applied physics</title><description>The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C4F8 and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon® amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in “digital” microfluidics.</description><subject>ADSORPTION</subject><subject>ATOMIC FORCE MICROSCOPY</subject><subject>CARBON FLUORIDES</subject><subject>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</subject><subject>DEPOSITION</subject><subject>DIELECTRIC MATERIALS</subject><subject>ELECTRIC POTENTIAL</subject><subject>ELECTRODES</subject><subject>ELLIPSOMETRY</subject><subject>LAYERS</subject><subject>PERMITTIVITY</subject><subject>PLASMA</subject><subject>PROTEINS</subject><subject>ROUGHNESS</subject><subject>SILICON NITRIDES</subject><subject>SOLUTIONS</subject><subject>TEFLON</subject><subject>THICKNESS</subject><subject>THIN FILMS</subject><subject>WETTABILITY</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNotkE1LxDAQhoMouK4e_AcBTx665qNpk6Ms6wcseNFzSCapG2mbkkRk_72R9TQw8_Ayz4vQLSUbSjr-QDes56KT7AytKJGq6YUg52hFCKONVL26RFc5fxFCqeRqhcJu9FBS_PGlhPkTxxkvo8mTaZxfYg7FOzyM3zFFMMnW6-HoUlwO0QbAQxinjIeYsA2xUsHhksycl5gKDjOeAqTTPkC-RheDGbO_-Z9r9PG0e9--NPu359ft474BplhpnFUe-sG2jjhrwHTQeiGU8y23tkpIC73owQnrjRUdOOaIlW1nedtKITu-Rnen3JhL0BmqAhwgznP11IwoyaQklbo_UfXDnJMf9JLCZNJRU6L_mtRU_zfJfwFkvWkx</recordid><startdate>20070515</startdate><enddate>20070515</enddate><creator>Bayiati, P.</creator><creator>Tserepi, A.</creator><creator>Petrou, P. S.</creator><creator>Kakabakos, S. E.</creator><creator>Misiakos, K.</creator><creator>Gogolides, E.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20070515</creationdate><title>Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics</title><author>Bayiati, P. ; Tserepi, A. ; Petrou, P. S. ; Kakabakos, S. E. ; Misiakos, K. ; Gogolides, E.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c292t-db9ec7fb4d0dbaca6c4e559de43bb0218bc757cd5beab56cd2d0b846b34485863</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ADSORPTION</topic><topic>ATOMIC FORCE MICROSCOPY</topic><topic>CARBON FLUORIDES</topic><topic>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</topic><topic>DEPOSITION</topic><topic>DIELECTRIC MATERIALS</topic><topic>ELECTRIC POTENTIAL</topic><topic>ELECTRODES</topic><topic>ELLIPSOMETRY</topic><topic>LAYERS</topic><topic>PERMITTIVITY</topic><topic>PLASMA</topic><topic>PROTEINS</topic><topic>ROUGHNESS</topic><topic>SILICON NITRIDES</topic><topic>SOLUTIONS</topic><topic>TEFLON</topic><topic>THICKNESS</topic><topic>THIN FILMS</topic><topic>WETTABILITY</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Bayiati, P.</creatorcontrib><creatorcontrib>Tserepi, A.</creatorcontrib><creatorcontrib>Petrou, P. S.</creatorcontrib><creatorcontrib>Kakabakos, S. E.</creatorcontrib><creatorcontrib>Misiakos, K.</creatorcontrib><creatorcontrib>Gogolides, E.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Bayiati, P.</au><au>Tserepi, A.</au><au>Petrou, P. S.</au><au>Kakabakos, S. E.</au><au>Misiakos, K.</au><au>Gogolides, E.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics</atitle><jtitle>Journal of applied physics</jtitle><date>2007-05-15</date><risdate>2007</risdate><volume>101</volume><issue>10</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>The present work focuses on the plasma deposition of fluorocarbon (FC) films on surfaces and the electrostatic control of their wettability (electrowetting). Such films can be employed for actuation of fluid transport in microfluidic devices, when deposited over patterned electrodes. Here, the deposition was performed using C4F8 and the plasma parameters that permit the creation of films with optimized properties desirable for electrowetting were established. The wettability of the plasma-deposited surfaces was characterized by means of contact angle measurements (in the static and dynamic mode). The thickness of the deposited films was probed in situ by means of spectroscopic ellipsometry, while the surface roughness was provided by atomic force microscopy. These plasma-deposited FC films in combination with silicon nitride, a material of high dielectric constant, were used to create a dielectric structure that requires reduced voltages for successful electrowetting. Electrowetting experiments using protein solutions were conducted on such optimized dielectric structures and were compared with similar structures bearing commercial spin-coated Teflon® amorphous fluoropolymer (AF) film as the hydrophobic top layer. Our results show that plasma-deposited FC films have desirable electrowetting behavior and minimal protein adsorption, a requirement for successful transport of biological solutions in “digital” microfluidics.</abstract><cop>United States</cop><doi>10.1063/1.2735682</doi><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0021-8979 |
ispartof | Journal of applied physics, 2007-05, Vol.101 (10) |
issn | 0021-8979 1089-7550 |
language | eng |
recordid | cdi_osti_scitechconnect_20982880 |
source | AIP Journals Complete; AIP Digital Archive |
subjects | ADSORPTION ATOMIC FORCE MICROSCOPY CARBON FLUORIDES CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS DEPOSITION DIELECTRIC MATERIALS ELECTRIC POTENTIAL ELECTRODES ELLIPSOMETRY LAYERS PERMITTIVITY PLASMA PROTEINS ROUGHNESS SILICON NITRIDES SOLUTIONS TEFLON THICKNESS THIN FILMS WETTABILITY |
title | Electrowetting on plasma-deposited fluorocarbon hydrophobic films for biofluid transport in microfluidics |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T00%3A05%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrowetting%20on%20plasma-deposited%20fluorocarbon%20hydrophobic%20films%20for%20biofluid%20transport%20in%20microfluidics&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Bayiati,%20P.&rft.date=2007-05-15&rft.volume=101&rft.issue=10&rft.issn=0021-8979&rft.eissn=1089-7550&rft_id=info:doi/10.1063/1.2735682&rft_dat=%3Ccrossref_osti_%3E10_1063_1_2735682%3C/crossref_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |