Electron Attachment Reaction Rates in 2D Atomic Hydrogen-Electron Mixed System on Liquid Helium Surface
We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This beh...
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| creator | Arai, Toshikazu Mitsui, Tomoyuki Yayama, Hideki |
| description | We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient Ke is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE. |
| doi_str_mv | 10.1063/1.2354615 |
| format | Conference Proceeding |
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The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient Ke is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. 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The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient Ke is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.</description><subject>ATOMIC AND MOLECULAR PHYSICS</subject><subject>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</subject><subject>ELECTRON ATTACHMENT</subject><subject>ELECTRONS</subject><subject>HELIUM</subject><subject>HELIUM 4</subject><subject>HYDROGEN</subject><subject>LIQUIDS</subject><subject>MAGNETIC FIELDS</subject><subject>REACTION KINETICS</subject><subject>TEMPERATURE DEPENDENCE</subject><subject>TEMPERATURE RANGE 0000-0013 K</subject><issn>0094-243X</issn><issn>1551-7616</issn><isbn>0735403473</isbn><isbn>9780735403475</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2006</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNo9T1tLwzAUDl7AbfrgPwgIvnXm0qbJ45jTCRVhU_CtxORsi7SNa1Jw_97IxIfDx_lunIPQNSVTSgS_o1PGi1zQ4gSNaFHQrBRUnKIxKRNNeF7yMzQiROUZy_n7BRqH8EkIU2UpR2i7aMDE3nd4FqM2uxa6iFegTXSJW-kIAbsOs_uk-9YZvDzY3m-hy_6Dz-4bLF4fQoQWp71y-8FZvITGDS1eD_1GG7hE5xvdBLj6wwl6e1i8zpdZ9fL4NJ9VmWc0j5khsAGZhkv4INRyUJIRKAtqRWk10bLgVHEopABhQYk8KRJMellpLQWfoJtjrw_R1cG4CGZnfNelY2tGpMyl-HXdHl1fvd8PEGLdumCgaXQHfgg1U5xypij_ATrCZyA</recordid><startdate>20060101</startdate><enddate>20060101</enddate><creator>Arai, Toshikazu</creator><creator>Mitsui, Tomoyuki</creator><creator>Yayama, Hideki</creator><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20060101</creationdate><title>Electron Attachment Reaction Rates in 2D Atomic Hydrogen-Electron Mixed System on Liquid Helium Surface</title><author>Arai, Toshikazu ; Mitsui, Tomoyuki ; Yayama, Hideki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o214t-c0efe8efe38eb01d3e9820e751d67da0a853193e586e6de96451d8ec7619aa863</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2006</creationdate><topic>ATOMIC AND MOLECULAR PHYSICS</topic><topic>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</topic><topic>ELECTRON ATTACHMENT</topic><topic>ELECTRONS</topic><topic>HELIUM</topic><topic>HELIUM 4</topic><topic>HYDROGEN</topic><topic>LIQUIDS</topic><topic>MAGNETIC FIELDS</topic><topic>REACTION KINETICS</topic><topic>TEMPERATURE DEPENDENCE</topic><topic>TEMPERATURE RANGE 0000-0013 K</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Arai, Toshikazu</creatorcontrib><creatorcontrib>Mitsui, Tomoyuki</creatorcontrib><creatorcontrib>Yayama, Hideki</creatorcontrib><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Arai, Toshikazu</au><au>Mitsui, Tomoyuki</au><au>Yayama, Hideki</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Electron Attachment Reaction Rates in 2D Atomic Hydrogen-Electron Mixed System on Liquid Helium Surface</atitle><btitle>AIP conference proceedings</btitle><date>2006-01-01</date><risdate>2006</risdate><volume>850</volume><issue>1</issue><spage>83</spage><epage>84</epage><pages>83-84</pages><issn>0094-243X</issn><eissn>1551-7616</eissn><isbn>0735403473</isbn><isbn>9780735403475</isbn><abstract>We have measured the temperature dependence of the electron attachment reaction rate of atomic hydrogen (H) on a liquid 4He surface in applied magnetic fields of 0-5 T at 0.2-0.6 K. The measured surface state electron (SSE) losses are faster at lower temperatures for a given magnetic field. This behavior can be qualitatively understood, since the surface coverage of adsorbed H is large at low temperature and the collisions between H and SSE are frequent. However, the reaction is faster than expected based on the collision frequency argument. The measured reaction rate coefficient Ke is strongly temperature dependent. We observe that, as the temperature is lowered, Ke increases by several orders of magnitude. This indicates that some additional effect enhances electron attachment at low temperature. We discuss a possible reaction mechanism between H and SSE.</abstract><cop>United States</cop><doi>10.1063/1.2354615</doi><tpages>2</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0094-243X |
| ispartof | AIP conference proceedings, 2006, Vol.850 (1), p.83-84 |
| issn | 0094-243X 1551-7616 |
| language | eng |
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| source | AIP Journals Complete |
| subjects | ATOMIC AND MOLECULAR PHYSICS CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ELECTRON ATTACHMENT ELECTRONS HELIUM HELIUM 4 HYDROGEN LIQUIDS MAGNETIC FIELDS REACTION KINETICS TEMPERATURE DEPENDENCE TEMPERATURE RANGE 0000-0013 K |
| title | Electron Attachment Reaction Rates in 2D Atomic Hydrogen-Electron Mixed System on Liquid Helium Surface |
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