rf-generated ambient-afterglow plasma
Atmospheric pressure plasmas have gained importance due to their potential application in polymer surface treatment, surface cleaning of metals, thin film deposition, and destruction of biological hazards. In this paper a radio-frequency driven atmospheric pressure afterglow plasma source in argon a...
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| Veröffentlicht in: | Journal of applied physics 2006-04, Vol.99 (7), p.073303-073303-6 |
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| container_end_page | 073303-6 |
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| container_issue | 7 |
| container_start_page | 073303 |
| container_title | Journal of applied physics |
| container_volume | 99 |
| creator | Shakir, Shariff Mynampati, Sandhya Pashaie, Bijan Dhali, Shirshak K. |
| description | Atmospheric pressure plasmas have gained importance due to their potential application in polymer surface treatment, surface cleaning of metals, thin film deposition, and destruction of biological hazards. In this paper a radio-frequency driven atmospheric pressure afterglow plasma source in argon and helium is discussed. The light intensity measurement shows that the radio-frequency discharge is continuous in time unlike the intermittent nature of a low frequency dielectric-barrier discharge. The discharge, under ambient conditions, can be generated in argon, helium, and nitrogen. Spectroscopic measurements show that metastables are capable of producing oxygen atoms and other excited species. The argon afterglow, in particular, is capable of dissociating oxygen molecules in the ambient gas. An afterglow model has been developed to study the interaction of the plasma with the ambient gas. Results from applications of the plasma to surface treatment of metals and polymers, and bacterial decontamination are briefly discussed. |
| doi_str_mv | 10.1063/1.2187275 |
| format | Article |
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In this paper a radio-frequency driven atmospheric pressure afterglow plasma source in argon and helium is discussed. The light intensity measurement shows that the radio-frequency discharge is continuous in time unlike the intermittent nature of a low frequency dielectric-barrier discharge. The discharge, under ambient conditions, can be generated in argon, helium, and nitrogen. Spectroscopic measurements show that metastables are capable of producing oxygen atoms and other excited species. The argon afterglow, in particular, is capable of dissociating oxygen molecules in the ambient gas. An afterglow model has been developed to study the interaction of the plasma with the ambient gas. Results from applications of the plasma to surface treatment of metals and polymers, and bacterial decontamination are briefly discussed.</description><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</subject><subject>AFTERGLOW</subject><subject>ARGON</subject><subject>ATMOSPHERIC PRESSURE</subject><subject>DECONTAMINATION</subject><subject>DEPOSITION</subject><subject>DIELECTRIC MATERIALS</subject><subject>HELIUM</subject><subject>HIGH-FREQUENCY DISCHARGES</subject><subject>NITROGEN</subject><subject>OXYGEN</subject><subject>PLASMA</subject><subject>PLASMA DIAGNOSTICS</subject><subject>RADIOWAVE RADIATION</subject><subject>SURFACE CLEANING</subject><subject>SURFACE TREATMENTS</subject><subject>THIN FILMS</subject><subject>WALL EFFECTS</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNp10E1LAzEUheEgCtbqwn9QEBcuUu-dTCbJRpDiFxTc6DrE5KaOzEdJAuK_t2WKO1dn83AWL2OXCEuERtziskKtKiWP2AxBG66khGM2A6iQa6PMKTvL-QsAUQszY9cp8g0NlFyhsHD9R0tD4S4WSptu_F5sO5d7d85OousyXRx2zt4fH95Wz3z9-vSyul9zL7AqXHmSPgQpjZOhCkhCeEVGUTDexdh4qhsZwAiioB0IE7E2jamlM1qC8GLOrqbfMZfWZt8W8p9-HAbyxVagtAasd-pmUj6NOSeKdpva3qUfi2D3FSzaQ4WdvZvs_syVdhz-xynavxT2kEL8AsCXY2A</recordid><startdate>20060401</startdate><enddate>20060401</enddate><creator>Shakir, Shariff</creator><creator>Mynampati, Sandhya</creator><creator>Pashaie, Bijan</creator><creator>Dhali, Shirshak K.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20060401</creationdate><title>rf-generated ambient-afterglow plasma</title><author>Shakir, Shariff ; Mynampati, Sandhya ; Pashaie, Bijan ; Dhali, Shirshak K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c312t-7ce5cdd559a5d2d1e33c7e97ed9caff6ce465d093eed8a039f1496945a98503c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</topic><topic>AFTERGLOW</topic><topic>ARGON</topic><topic>ATMOSPHERIC PRESSURE</topic><topic>DECONTAMINATION</topic><topic>DEPOSITION</topic><topic>DIELECTRIC MATERIALS</topic><topic>HELIUM</topic><topic>HIGH-FREQUENCY DISCHARGES</topic><topic>NITROGEN</topic><topic>OXYGEN</topic><topic>PLASMA</topic><topic>PLASMA DIAGNOSTICS</topic><topic>RADIOWAVE RADIATION</topic><topic>SURFACE CLEANING</topic><topic>SURFACE TREATMENTS</topic><topic>THIN FILMS</topic><topic>WALL EFFECTS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shakir, Shariff</creatorcontrib><creatorcontrib>Mynampati, Sandhya</creatorcontrib><creatorcontrib>Pashaie, Bijan</creatorcontrib><creatorcontrib>Dhali, Shirshak K.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shakir, Shariff</au><au>Mynampati, Sandhya</au><au>Pashaie, Bijan</au><au>Dhali, Shirshak K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>rf-generated ambient-afterglow plasma</atitle><jtitle>Journal of applied physics</jtitle><date>2006-04-01</date><risdate>2006</risdate><volume>99</volume><issue>7</issue><spage>073303</spage><epage>073303-6</epage><pages>073303-073303-6</pages><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>Atmospheric pressure plasmas have gained importance due to their potential application in polymer surface treatment, surface cleaning of metals, thin film deposition, and destruction of biological hazards. In this paper a radio-frequency driven atmospheric pressure afterglow plasma source in argon and helium is discussed. The light intensity measurement shows that the radio-frequency discharge is continuous in time unlike the intermittent nature of a low frequency dielectric-barrier discharge. The discharge, under ambient conditions, can be generated in argon, helium, and nitrogen. Spectroscopic measurements show that metastables are capable of producing oxygen atoms and other excited species. The argon afterglow, in particular, is capable of dissociating oxygen molecules in the ambient gas. An afterglow model has been developed to study the interaction of the plasma with the ambient gas. Results from applications of the plasma to surface treatment of metals and polymers, and bacterial decontamination are briefly discussed.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><doi>10.1063/1.2187275</doi></addata></record> |
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| ispartof | Journal of applied physics, 2006-04, Vol.99 (7), p.073303-073303-6 |
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| language | eng |
| recordid | cdi_osti_scitechconnect_20788014 |
| source | AIP Journals Complete; AIP Digital Archive |
| subjects | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY AFTERGLOW ARGON ATMOSPHERIC PRESSURE DECONTAMINATION DEPOSITION DIELECTRIC MATERIALS HELIUM HIGH-FREQUENCY DISCHARGES NITROGEN OXYGEN PLASMA PLASMA DIAGNOSTICS RADIOWAVE RADIATION SURFACE CLEANING SURFACE TREATMENTS THIN FILMS WALL EFFECTS |
| title | rf-generated ambient-afterglow plasma |
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