Efficient sub 100 nm focusing of hard x rays

An x-ray beam with energy of 20.5 keV has been efficiently focused down to a spot size as small as 90 nm × 90 nm by a Kirkpatrick-Baez reflecting mirrors device. The first mirror, coated with a graded multilayer, plays both the role of vertical focusing device and monochromator, resulting in a very...

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Veröffentlicht in:Review of scientific instruments 2005-06, Vol.76 (6), p.063709-063709-5
Hauptverfasser: Hignette, O., Cloetens, P., Rostaing, G., Bernard, P., Morawe, C.
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container_end_page 063709-5
container_issue 6
container_start_page 063709
container_title Review of scientific instruments
container_volume 76
creator Hignette, O.
Cloetens, P.
Rostaing, G.
Bernard, P.
Morawe, C.
description An x-ray beam with energy of 20.5 keV has been efficiently focused down to a spot size as small as 90 nm × 90 nm by a Kirkpatrick-Baez reflecting mirrors device. The first mirror, coated with a graded multilayer, plays both the role of vertical focusing device and monochromator, resulting in a very high flux ( 2 × 10 11 photons ∕ s ) and medium monochromaticity ( Δ E ∕ E ∼ 10 − 2 ) . Evaluation of the error contributions shows that the vertical focus is presently limited by the mirror figure errors, while the horizontal focus is limited by the horizontal extension of the x-ray source. With a gain in excess of a few million, this device opens up new possibilities in trace element nanoanalysis and fast projection microscopy.
doi_str_mv 10.1063/1.1928191
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subjects BEAMS
ERRORS
FOCUSING
HARD X RADIATION
INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
KEV RANGE 10-100
MICROSCOPY
MIRRORS
MONOCHROMATORS
OPTICS
PHOTONS
X-RAY SOURCES
title Efficient sub 100 nm focusing of hard x rays
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