Kinetic origin of island intermixing during the growth of Ge on Si(001)

The effects of substrate temperature, growth rate, and postgrowth annealing on the composition of Ge islands grown on Si(001) were investigated with a combination of selective wet chemical etching and atomic force microscopy. A simple kinetic model comprising only surface diffusion processes can exp...

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Veröffentlicht in:Physical review. B, Condensed matter and materials physics Condensed matter and materials physics, 2005-11, Vol.72 (19), p.195320.1-195320.6, Article 195320
Hauptverfasser: KATSAROS, G, COSTANTINI, G, STOFFEL, M, ESTEBAN, R, BITTNER, A. M, RASTELLI, A, DENKER, U, SCHMIDT, O. G, KEM, K
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Sprache:eng
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