Optical Flatness Metrology for 300 mm Silicon Wafers

The National Institute of Standards and Technology (NIST) is developing two interferometric methods for measuring the thickness, thickness variation, and flatness of free-standing and chucked silicon wafers with diameters up to 300 mm. The "eXtremely accurate CALIBration InterferometeR" (X...

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Veröffentlicht in:	AIP conference proceedings 2005-09, Vol.788 (1), p.599-603
Hauptverfasser:	Griesmann, Ulf, Wang, Quandou, Raymond, Thomas D
Format:	Artikel
Sprache:	eng
Schlagworte:	ACCURACY CALIBRATION INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY INTERFEROMETERS SEMICONDUCTOR DEVICES SILICON THICKNESS VARIATIONS WAVELENGTHS
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