High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations

An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shap...

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Veröffentlicht in:Journal of applied physics 2005-07, Vol.98 (1)
Hauptverfasser: Hnatovsky, C., Taylor, R. S., Simova, E., Bhardwaj, V. R., Rayner, D. M., Corkum, P. B.
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Sprache:eng
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