High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations
An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shap...
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| Veröffentlicht in: | Journal of applied physics 2005-07, Vol.98 (1) |
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| container_title | Journal of applied physics |
| container_volume | 98 |
| creator | Hnatovsky, C. Taylor, R. S. Simova, E. Bhardwaj, V. R. Rayner, D. M. Corkum, P. B. |
| description | An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shapes of the irradiated zones near the threshold for modification can be predicted by taking proper account of spherical aberration caused by the refractive index mismatched air–silica interface. We establish a depth dependence of the pulse energy required to initiate modification and characterize the relationship between numerical aperture of the writing lens and practically achievable writing depth. We also show that spatial characteristics of the laser-modified zones can be controlled by a specially designed focusing system which allows correction for a variable amount of spherical aberration. |
| doi_str_mv | 10.1063/1.1944223 |
| format | Article |
| fullrecord | <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_20713950</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_1944223</sourcerecordid><originalsourceid>FETCH-LOGICAL-c388t-4db8007f6142908035685bbaedc0fca80a89842637e8e29c79dbfcb4a977bc7f3</originalsourceid><addsrcrecordid>eNotkMFOwzAQRC0EEqVw4A8sceKQso6T2D6iCihSJS5wjmxnTY2SuLLdQ36E7yVtOa00ejOzGkLuGawYNPyJrZiqqrLkF2TBQKpC1DVckgVAyQqphLomNyn9ADAmuVqQ343_3hURU-gP2YeRpnzoJhoc3e9CDn7sDhY7OoTOO2_1CfEjdYc0q8n3s0b3MZwpM1FN8xyY-4m6YE-QwyGHhDaMHe11wkgN6uEYknc4ezHhaPHYqA3GeKpIt-TK6T7h3f9dkq_Xl8_1pth-vL2vn7eF5VLmouqMBBCuYVWpQAKvG1kbo7Gz4KyWoKWSVdlwgRJLZYXqjLOm0koIY4XjS_Jwzg0p-zZZn9Hu5ldHtLktQTCuapipxzNlY0gpomv30Q86Ti2D9jh7y9r_2fkfbTZ38Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><creator>Hnatovsky, C. ; Taylor, R. S. ; Simova, E. ; Bhardwaj, V. R. ; Rayner, D. M. ; Corkum, P. B.</creator><creatorcontrib>Hnatovsky, C. ; Taylor, R. S. ; Simova, E. ; Bhardwaj, V. R. ; Rayner, D. M. ; Corkum, P. B.</creatorcontrib><description>An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shapes of the irradiated zones near the threshold for modification can be predicted by taking proper account of spherical aberration caused by the refractive index mismatched air–silica interface. We establish a depth dependence of the pulse energy required to initiate modification and characterize the relationship between numerical aperture of the writing lens and practically achievable writing depth. We also show that spatial characteristics of the laser-modified zones can be controlled by a specially designed focusing system which allows correction for a variable amount of spherical aberration.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.1944223</identifier><language>eng</language><publisher>United States</publisher><subject>AIR ; APERTURES ; ATOMIC FORCE MICROSCOPY ; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ; CORRECTIONS ; ETCHING ; FABRICATION ; FOCUSING ; GEOMETRICAL ABERRATIONS ; INTERFACES ; LASER RADIATION ; LASERS ; LENSES ; MODIFICATIONS ; PULSES ; REFRACTIVE INDEX ; SILICA ; SPATIAL RESOLUTION</subject><ispartof>Journal of applied physics, 2005-07, Vol.98 (1)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c388t-4db8007f6142908035685bbaedc0fca80a89842637e8e29c79dbfcb4a977bc7f3</citedby><cites>FETCH-LOGICAL-c388t-4db8007f6142908035685bbaedc0fca80a89842637e8e29c79dbfcb4a977bc7f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27901,27902</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/20713950$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Hnatovsky, C.</creatorcontrib><creatorcontrib>Taylor, R. S.</creatorcontrib><creatorcontrib>Simova, E.</creatorcontrib><creatorcontrib>Bhardwaj, V. R.</creatorcontrib><creatorcontrib>Rayner, D. M.</creatorcontrib><creatorcontrib>Corkum, P. B.</creatorcontrib><title>High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations</title><title>Journal of applied physics</title><description>An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shapes of the irradiated zones near the threshold for modification can be predicted by taking proper account of spherical aberration caused by the refractive index mismatched air–silica interface. We establish a depth dependence of the pulse energy required to initiate modification and characterize the relationship between numerical aperture of the writing lens and practically achievable writing depth. We also show that spatial characteristics of the laser-modified zones can be controlled by a specially designed focusing system which allows correction for a variable amount of spherical aberration.</description><subject>AIR</subject><subject>APERTURES</subject><subject>ATOMIC FORCE MICROSCOPY</subject><subject>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</subject><subject>CORRECTIONS</subject><subject>ETCHING</subject><subject>FABRICATION</subject><subject>FOCUSING</subject><subject>GEOMETRICAL ABERRATIONS</subject><subject>INTERFACES</subject><subject>LASER RADIATION</subject><subject>LASERS</subject><subject>LENSES</subject><subject>MODIFICATIONS</subject><subject>PULSES</subject><subject>REFRACTIVE INDEX</subject><subject>SILICA</subject><subject>SPATIAL RESOLUTION</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNotkMFOwzAQRC0EEqVw4A8sceKQso6T2D6iCihSJS5wjmxnTY2SuLLdQ36E7yVtOa00ejOzGkLuGawYNPyJrZiqqrLkF2TBQKpC1DVckgVAyQqphLomNyn9ADAmuVqQ343_3hURU-gP2YeRpnzoJhoc3e9CDn7sDhY7OoTOO2_1CfEjdYc0q8n3s0b3MZwpM1FN8xyY-4m6YE-QwyGHhDaMHe11wkgN6uEYknc4ezHhaPHYqA3GeKpIt-TK6T7h3f9dkq_Xl8_1pth-vL2vn7eF5VLmouqMBBCuYVWpQAKvG1kbo7Gz4KyWoKWSVdlwgRJLZYXqjLOm0koIY4XjS_Jwzg0p-zZZn9Hu5ldHtLktQTCuapipxzNlY0gpomv30Q86Ti2D9jh7y9r_2fkfbTZ38Q</recordid><startdate>20050701</startdate><enddate>20050701</enddate><creator>Hnatovsky, C.</creator><creator>Taylor, R. S.</creator><creator>Simova, E.</creator><creator>Bhardwaj, V. R.</creator><creator>Rayner, D. M.</creator><creator>Corkum, P. B.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20050701</creationdate><title>High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations</title><author>Hnatovsky, C. ; Taylor, R. S. ; Simova, E. ; Bhardwaj, V. R. ; Rayner, D. M. ; Corkum, P. B.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c388t-4db8007f6142908035685bbaedc0fca80a89842637e8e29c79dbfcb4a977bc7f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>AIR</topic><topic>APERTURES</topic><topic>ATOMIC FORCE MICROSCOPY</topic><topic>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</topic><topic>CORRECTIONS</topic><topic>ETCHING</topic><topic>FABRICATION</topic><topic>FOCUSING</topic><topic>GEOMETRICAL ABERRATIONS</topic><topic>INTERFACES</topic><topic>LASER RADIATION</topic><topic>LASERS</topic><topic>LENSES</topic><topic>MODIFICATIONS</topic><topic>PULSES</topic><topic>REFRACTIVE INDEX</topic><topic>SILICA</topic><topic>SPATIAL RESOLUTION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hnatovsky, C.</creatorcontrib><creatorcontrib>Taylor, R. S.</creatorcontrib><creatorcontrib>Simova, E.</creatorcontrib><creatorcontrib>Bhardwaj, V. R.</creatorcontrib><creatorcontrib>Rayner, D. M.</creatorcontrib><creatorcontrib>Corkum, P. B.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hnatovsky, C.</au><au>Taylor, R. S.</au><au>Simova, E.</au><au>Bhardwaj, V. R.</au><au>Rayner, D. M.</au><au>Corkum, P. B.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations</atitle><jtitle>Journal of applied physics</jtitle><date>2005-07-01</date><risdate>2005</risdate><volume>98</volume><issue>1</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>An ultrahigh-resolution (20nm) technique of selective chemical etching and atomic force microscopy has been used to study the photoinduced modification in fused silica produced at various depths by tightly focused femtosecond laser radiation affected by spherical aberration. We demonstrate that shapes of the irradiated zones near the threshold for modification can be predicted by taking proper account of spherical aberration caused by the refractive index mismatched air–silica interface. We establish a depth dependence of the pulse energy required to initiate modification and characterize the relationship between numerical aperture of the writing lens and practically achievable writing depth. We also show that spatial characteristics of the laser-modified zones can be controlled by a specially designed focusing system which allows correction for a variable amount of spherical aberration.</abstract><cop>United States</cop><doi>10.1063/1.1944223</doi></addata></record> |
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| identifier | ISSN: 0021-8979 |
| ispartof | Journal of applied physics, 2005-07, Vol.98 (1) |
| issn | 0021-8979 1089-7550 |
| language | eng |
| recordid | cdi_osti_scitechconnect_20713950 |
| source | AIP Journals Complete; AIP Digital Archive |
| subjects | AIR APERTURES ATOMIC FORCE MICROSCOPY CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS CORRECTIONS ETCHING FABRICATION FOCUSING GEOMETRICAL ABERRATIONS INTERFACES LASER RADIATION LASERS LENSES MODIFICATIONS PULSES REFRACTIVE INDEX SILICA SPATIAL RESOLUTION |
| title | High-resolution study of photoinduced modification in fused silica produced by a tightly focused femtosecond laser beam in the presence of aberrations |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T20%3A35%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=High-resolution%20study%20of%20photoinduced%20modification%20in%20fused%20silica%20produced%20by%20a%20tightly%20focused%20femtosecond%20laser%20beam%20in%20the%20presence%20of%20aberrations&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Hnatovsky,%20C.&rft.date=2005-07-01&rft.volume=98&rft.issue=1&rft.issn=0021-8979&rft.eissn=1089-7550&rft_id=info:doi/10.1063/1.1944223&rft_dat=%3Ccrossref_osti_%3E10_1063_1_1944223%3C/crossref_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |