Imaging optical near-fields of nanostructures

We present a method for imaging the optical near-fields of nanostructures, which is based on the local ablation of a smooth silicon substrate by means of a single, femtosecond laser pulse. At those locations, where the field enhancement due to a nanostructure is large, substrate material is removed....

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Veröffentlicht in:Applied physics letters 2004-11, Vol.85 (22), p.5370-5372
Hauptverfasser: Leiderer, P., Bartels, C., König-Birk, J., Mosbacher, M., Boneberg, J.
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container_end_page 5372
container_issue 22
container_start_page 5370
container_title Applied physics letters
container_volume 85
creator Leiderer, P.
Bartels, C.
König-Birk, J.
Mosbacher, M.
Boneberg, J.
description We present a method for imaging the optical near-fields of nanostructures, which is based on the local ablation of a smooth silicon substrate by means of a single, femtosecond laser pulse. At those locations, where the field enhancement due to a nanostructure is large, substrate material is removed. The resulting topography, imaged by scanning electron or atomic force microscopy, thus reflects the intensity distribution caused by the nanostructure at the substrate surface. With this method one avoids a possible distortion of the field distribution due to the presence of a probe tip, and reaches a resolution of a few nanometers. Several examples for the optical near-field patterns of dielectric and metallic nanostructures are given.
doi_str_mv 10.1063/1.1819990
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subjects ABLATION
ATOMIC FORCE MICROSCOPY
COLLOIDS
DIELECTRIC MATERIALS
GOLD
LASERS
MATERIALS SCIENCE
NANOSTRUCTURES
PARTICLES
POLYMERS
SCANNING ELECTRON MICROSCOPY
SILICON
SUBSTRATES
TOPOGRAPHY
title Imaging optical near-fields of nanostructures
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