Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification u...

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Veröffentlicht in:Journal of materials research 1999-11, Vol.14 (11), p.4351-4357
Hauptverfasser: Falkenstein, Zoran, Walter, Kevin C., Nastasi, Michael A., Rej, Donald J., Gavrilov, Nikolai V.
Format: Artikel
Sprache:eng
Schlagworte:
ALUMINIUM
CHROMIUM
EXPERIMENTAL DATA
ION IMPLANTATION
ION SOURCES
MATERIALS SCIENCE
MICROHARDNESS
NITROGEN
RADIATION DOSES
RADIATION EFFECTS
SLIDING FRICTION
SURFACE PROPERTIES
SURFACE TREATMENTS
WEAR
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Beschreibung
Zusammenfassung:Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of
ISSN:0884-2914
2044-5326
DOI:10.1557/JMR.1999.0589