Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments
Abstract Chemical modifications such as intercalation can be used to modify surface properties or to further functionalize the surface states of topological insulators (TIs). Using ambient pressure x-ray photoelectron spectroscopy, we report copper migration in C u x B i 2 S e 3 , which occurs on a...
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| Veröffentlicht in: | JPhys materials 2022-10, Vol.5 (4) |
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| creator | Gross, Adam L. Falling, Lorenz Staab, Matthew C. Montero, Metzli I. Ullah, Rahim R. Nisson, David M. Klavins, Peter Koski, Kristie J. Curro, Nicholas J. Taufour, Valentin Nemsak, Slavomir Vishik, Inna M. |
| description | Abstract
Chemical modifications such as intercalation can be used to modify surface properties or to further functionalize the surface states of topological insulators (TIs). Using ambient pressure x-ray photoelectron spectroscopy, we report copper migration in
C
u
x
B
i
2
S
e
3
, which occurs on a timescale of hours to days after initial surface cleaving. The increase in near-surface copper proceeds along with the oxidation of the sample surface and large changes in the selenium content. These complex changes are further modeled with core-level spectroscopy simulations, which suggest a composition gradient near the surface which develops with oxygen exposure. Our results shed light on a new phenomenon that must be considered for intercalated TIs—and intercalated materials in general—that surface chemical composition can change when specimens are exposed to ambient conditions. |
| format | Article |
| fullrecord | <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_1891030</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1891030</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_18910303</originalsourceid><addsrcrecordid>eNqNysEKgkAUheEhCpLyHS7thdHRzG1StM992HitGzkjc8fw8RNq0bLVOfx8MxEkWZxF-VYV85-_FCHzQ0qZ5EUq0zwQVWn7Hh10dHO1J2ugNg3w4NpaI9iRmk-1LZTDuKfkjApoUt2V0HjoHfKkEdC8yFnTTZHXYtHWT8bwuyuxOR6q8hRZ9nRhTR71XVtjUPtLvCtiqaT6C70BrCJCjA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments</title><source>DOAJ Directory of Open Access Journals</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Institute of Physics Open Access Journal Titles</source><creator>Gross, Adam L. ; Falling, Lorenz ; Staab, Matthew C. ; Montero, Metzli I. ; Ullah, Rahim R. ; Nisson, David M. ; Klavins, Peter ; Koski, Kristie J. ; Curro, Nicholas J. ; Taufour, Valentin ; Nemsak, Slavomir ; Vishik, Inna M.</creator><creatorcontrib>Gross, Adam L. ; Falling, Lorenz ; Staab, Matthew C. ; Montero, Metzli I. ; Ullah, Rahim R. ; Nisson, David M. ; Klavins, Peter ; Koski, Kristie J. ; Curro, Nicholas J. ; Taufour, Valentin ; Nemsak, Slavomir ; Vishik, Inna M. ; Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)</creatorcontrib><description>Abstract
Chemical modifications such as intercalation can be used to modify surface properties or to further functionalize the surface states of topological insulators (TIs). Using ambient pressure x-ray photoelectron spectroscopy, we report copper migration in
C
u
x
B
i
2
S
e
3
<inline-graphic href='jpmaterac93b5ieqn2.gif' type='simple'/>
, which occurs on a timescale of hours to days after initial surface cleaving. The increase in near-surface copper proceeds along with the oxidation of the sample surface and large changes in the selenium content. These complex changes are further modeled with core-level spectroscopy simulations, which suggest a composition gradient near the surface which develops with oxygen exposure. Our results shed light on a new phenomenon that must be considered for intercalated TIs—and intercalated materials in general—that surface chemical composition can change when specimens are exposed to ambient conditions.</description><identifier>ISSN: 2515-7639</identifier><identifier>EISSN: 2515-7639</identifier><language>eng</language><publisher>United Kingdom: IOP Publishing</publisher><subject>MATERIALS SCIENCE</subject><ispartof>JPhys materials, 2022-10, Vol.5 (4)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000000226225166 ; 0000000261032925 ; 0000000239260104 ; 0000000200249960 ; 0000000285349329 ; 0000000252502593 ; 0000000197691183 ; 0000000178290237</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/1891030$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Gross, Adam L.</creatorcontrib><creatorcontrib>Falling, Lorenz</creatorcontrib><creatorcontrib>Staab, Matthew C.</creatorcontrib><creatorcontrib>Montero, Metzli I.</creatorcontrib><creatorcontrib>Ullah, Rahim R.</creatorcontrib><creatorcontrib>Nisson, David M.</creatorcontrib><creatorcontrib>Klavins, Peter</creatorcontrib><creatorcontrib>Koski, Kristie J.</creatorcontrib><creatorcontrib>Curro, Nicholas J.</creatorcontrib><creatorcontrib>Taufour, Valentin</creatorcontrib><creatorcontrib>Nemsak, Slavomir</creatorcontrib><creatorcontrib>Vishik, Inna M.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)</creatorcontrib><title>Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments</title><title>JPhys materials</title><description>Abstract
Chemical modifications such as intercalation can be used to modify surface properties or to further functionalize the surface states of topological insulators (TIs). Using ambient pressure x-ray photoelectron spectroscopy, we report copper migration in
C
u
x
B
i
2
S
e
3
<inline-graphic href='jpmaterac93b5ieqn2.gif' type='simple'/>
, which occurs on a timescale of hours to days after initial surface cleaving. The increase in near-surface copper proceeds along with the oxidation of the sample surface and large changes in the selenium content. These complex changes are further modeled with core-level spectroscopy simulations, which suggest a composition gradient near the surface which develops with oxygen exposure. Our results shed light on a new phenomenon that must be considered for intercalated TIs—and intercalated materials in general—that surface chemical composition can change when specimens are exposed to ambient conditions.</description><subject>MATERIALS SCIENCE</subject><issn>2515-7639</issn><issn>2515-7639</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNqNysEKgkAUheEhCpLyHS7thdHRzG1StM992HitGzkjc8fw8RNq0bLVOfx8MxEkWZxF-VYV85-_FCHzQ0qZ5EUq0zwQVWn7Hh10dHO1J2ugNg3w4NpaI9iRmk-1LZTDuKfkjApoUt2V0HjoHfKkEdC8yFnTTZHXYtHWT8bwuyuxOR6q8hRZ9nRhTR71XVtjUPtLvCtiqaT6C70BrCJCjA</recordid><startdate>20221005</startdate><enddate>20221005</enddate><creator>Gross, Adam L.</creator><creator>Falling, Lorenz</creator><creator>Staab, Matthew C.</creator><creator>Montero, Metzli I.</creator><creator>Ullah, Rahim R.</creator><creator>Nisson, David M.</creator><creator>Klavins, Peter</creator><creator>Koski, Kristie J.</creator><creator>Curro, Nicholas J.</creator><creator>Taufour, Valentin</creator><creator>Nemsak, Slavomir</creator><creator>Vishik, Inna M.</creator><general>IOP Publishing</general><scope>OTOTI</scope><orcidid>https://orcid.org/0000000226225166</orcidid><orcidid>https://orcid.org/0000000261032925</orcidid><orcidid>https://orcid.org/0000000239260104</orcidid><orcidid>https://orcid.org/0000000200249960</orcidid><orcidid>https://orcid.org/0000000285349329</orcidid><orcidid>https://orcid.org/0000000252502593</orcidid><orcidid>https://orcid.org/0000000197691183</orcidid><orcidid>https://orcid.org/0000000178290237</orcidid></search><sort><creationdate>20221005</creationdate><title>Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments</title><author>Gross, Adam L. ; Falling, Lorenz ; Staab, Matthew C. ; Montero, Metzli I. ; Ullah, Rahim R. ; Nisson, David M. ; Klavins, Peter ; Koski, Kristie J. ; Curro, Nicholas J. ; Taufour, Valentin ; Nemsak, Slavomir ; Vishik, Inna M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_18910303</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>MATERIALS SCIENCE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gross, Adam L.</creatorcontrib><creatorcontrib>Falling, Lorenz</creatorcontrib><creatorcontrib>Staab, Matthew C.</creatorcontrib><creatorcontrib>Montero, Metzli I.</creatorcontrib><creatorcontrib>Ullah, Rahim R.</creatorcontrib><creatorcontrib>Nisson, David M.</creatorcontrib><creatorcontrib>Klavins, Peter</creatorcontrib><creatorcontrib>Koski, Kristie J.</creatorcontrib><creatorcontrib>Curro, Nicholas J.</creatorcontrib><creatorcontrib>Taufour, Valentin</creatorcontrib><creatorcontrib>Nemsak, Slavomir</creatorcontrib><creatorcontrib>Vishik, Inna M.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)</creatorcontrib><collection>OSTI.GOV</collection><jtitle>JPhys materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gross, Adam L.</au><au>Falling, Lorenz</au><au>Staab, Matthew C.</au><au>Montero, Metzli I.</au><au>Ullah, Rahim R.</au><au>Nisson, David M.</au><au>Klavins, Peter</au><au>Koski, Kristie J.</au><au>Curro, Nicholas J.</au><au>Taufour, Valentin</au><au>Nemsak, Slavomir</au><au>Vishik, Inna M.</au><aucorp>Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments</atitle><jtitle>JPhys materials</jtitle><date>2022-10-05</date><risdate>2022</risdate><volume>5</volume><issue>4</issue><issn>2515-7639</issn><eissn>2515-7639</eissn><abstract>Abstract
Chemical modifications such as intercalation can be used to modify surface properties or to further functionalize the surface states of topological insulators (TIs). Using ambient pressure x-ray photoelectron spectroscopy, we report copper migration in
C
u
x
B
i
2
S
e
3
<inline-graphic href='jpmaterac93b5ieqn2.gif' type='simple'/>
, which occurs on a timescale of hours to days after initial surface cleaving. The increase in near-surface copper proceeds along with the oxidation of the sample surface and large changes in the selenium content. These complex changes are further modeled with core-level spectroscopy simulations, which suggest a composition gradient near the surface which develops with oxygen exposure. Our results shed light on a new phenomenon that must be considered for intercalated TIs—and intercalated materials in general—that surface chemical composition can change when specimens are exposed to ambient conditions.</abstract><cop>United Kingdom</cop><pub>IOP Publishing</pub><orcidid>https://orcid.org/0000000226225166</orcidid><orcidid>https://orcid.org/0000000261032925</orcidid><orcidid>https://orcid.org/0000000239260104</orcidid><orcidid>https://orcid.org/0000000200249960</orcidid><orcidid>https://orcid.org/0000000285349329</orcidid><orcidid>https://orcid.org/0000000252502593</orcidid><orcidid>https://orcid.org/0000000197691183</orcidid><orcidid>https://orcid.org/0000000178290237</orcidid></addata></record> |
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| source | DOAJ Directory of Open Access Journals; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Institute of Physics Open Access Journal Titles |
| subjects | MATERIALS SCIENCE |
| title | Copper migration and surface oxidation of CuxBi2Se3 in ambient pressure environments |
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