Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns

Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution approaches like electron beam lithography that cannot be readily scaled beyond prototyping demonstrations. Block copolymer thin film self-assembly offers an attractive alternative for producing periodic nan...

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Veröffentlicht in:	ACS applied materials & interfaces 2022-06, Vol.14 (23), p.27466-27475
Hauptverfasser:	Kulkarni, Ashish A., Doerk, Gregory S.
Format:	Artikel
Sprache:	eng
Schlagworte:	block copolymers lithography NANOSCIENCE AND NANOTECHNOLOGY optical metasurfaces self-assembly solvent vapor annealing structural color Surfaces, Interfaces, and Applications thermal reflow
Online-Zugang:	Volltext
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