Dopamine-Mediated Polymer Coating Facilitates Area-Selective Atomic Layer Deposition

Area-selective atomic layer deposition (ALD) has the potential to significantly improve current fabrication approaches by introducing a bottom-up process in which robust and conformal thin films are selectively deposited onto patterned substrates. This bottom-up approach requires selective areas of...

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Veröffentlicht in:ACS applied polymer materials 2021-10, Vol.3 (10), p.4924-4931
Hauptverfasser: Papananou, Hellen, Katsumata, Reika, Neary, Zachary, Goh, Rubayn, Meng, Xiangxi, Limary, Ratchana, Segalman, Rachel A
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Sprache:eng
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