Mid-wave to near-IR optoelectronic properties and epsilon-near-zero behavior in indium-doped cadmium oxide

Indium-doped cadmium oxide (In:CdO) thin films exhibit tunable epsilon-near-zero (ENZ) modal frequencies across a wide spectral range, bridging the mid-wave and near-infrared (IR). In:CdO thin films are prepared by reactive cosputtering from metallic Cd and In targets using high-power impulse magnet...

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Veröffentlicht in:Physical review materials 2021-03, Vol.5 (3), Article 035202
Hauptverfasser: Cleri, Angela, Tomko, John, Quiambao-Tomko, Kathleen, Imperatore, Mario V., Zhu, Yanglin, Nolen, J. Ryan, Nordlander, Joshua, Caldwell, Joshua D., Mao, Zhiqiang, Giebink, Noel C., Kelley, Kyle P., Runnerstrom, Evan L., Hopkins, Patrick E., Maria, Jon-Paul
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Sprache:eng
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Zusammenfassung:Indium-doped cadmium oxide (In:CdO) thin films exhibit tunable epsilon-near-zero (ENZ) modal frequencies across a wide spectral range, bridging the mid-wave and near-infrared (IR). In:CdO thin films are prepared by reactive cosputtering from metallic Cd and In targets using high-power impulse magnetron sputtering (HiPIMS) and radio frequency sputtering, respectively. Using this approach, CdO thin films with carrier concentrations ranging from 2.3 × 1019 to 4.0 × 1020 cm–3 and mobilities ranging from 300 to 400 cm2/Vs are readily achieved. UV-VIS absorption spectra are used to measure optical bandgap, revealing a Burstein-Moss shift of 0.58 eV across the doping range investigated. In this work, optical measurements demonstrate the tunability of near-perfect plasmonic ENZ absorption across the mid-wave and into the near-IR spectral ranges by controlling the carrier concentration through doping, while tuning the film thickness for impedance matching. In comparison to other dopants that can be introduced to HiPIMS-deposited CdO, In offers the largest range of carrier concentrations while maintaining high mobility, thus allowing for the widest accessibility of the IR spectrum of a single plasmonic material grown by sputtering.
ISSN:2475-9953
2475-9953
DOI:10.1103/PhysRevMaterials.5.035202