Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering
Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluoresce...
Gespeichert in:
| Veröffentlicht in: | MRS communications 2018-09, Vol.9 (1) |
|---|---|
| Hauptverfasser: | , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 1 |
| container_start_page | |
| container_title | MRS communications |
| container_volume | 9 |
| creator | Ye, Dan Rongpipi, Sintu Litofsky, Joshua H. Lee, Youngmin Culp, Tyler E. Yoo, Sang Ha Jackson, Thomas N. Wang, Cheng Gomez, Esther W. Gomez, Enrique D. |
| description | Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates. |
| format | Article |
| fullrecord | <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_1656502</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1656502</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_16565023</originalsourceid><addsrcrecordid>eNqNi8EKgkAURYcoSMp_eLQX0pgxlxFFH1BrmcanTugb8D3B_j4X0bq7OWdx7kJFWaqLxBxNvvy5LtYqZn7t52mT5bmO1OPUjb2nsYcw-QqhHhATFkuVpwak9QS173oGCYBknx0CeRlCgwRYNQgcaoEpGewb2FkRHObjVq1q2zHGX27U7nq5n29JYPElOy_oWheI0EmZGm30Pjv8FX0ACy9C-A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><source>Cambridge Journals - CAUL Collection</source><source>SpringerLink Journals - AutoHoldings</source><creator>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D.</creator><creatorcontrib>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D. ; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><description>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</description><identifier>ISSN: 2159-6859</identifier><identifier>EISSN: 2159-6867</identifier><language>eng</language><publisher>United States: Materials Research Society - Cambridge University Press</publisher><subject>MATERIALS SCIENCE</subject><ispartof>MRS communications, 2018-09, Vol.9 (1)</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,315,781,785,886</link.rule.ids><backlink>$$Uhttps://www.osti.gov/servlets/purl/1656502$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Ye, Dan</creatorcontrib><creatorcontrib>Rongpipi, Sintu</creatorcontrib><creatorcontrib>Litofsky, Joshua H.</creatorcontrib><creatorcontrib>Lee, Youngmin</creatorcontrib><creatorcontrib>Culp, Tyler E.</creatorcontrib><creatorcontrib>Yoo, Sang Ha</creatorcontrib><creatorcontrib>Jackson, Thomas N.</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Gomez, Esther W.</creatorcontrib><creatorcontrib>Gomez, Enrique D.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><title>MRS communications</title><description>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</description><subject>MATERIALS SCIENCE</subject><issn>2159-6859</issn><issn>2159-6867</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqNi8EKgkAURYcoSMp_eLQX0pgxlxFFH1BrmcanTugb8D3B_j4X0bq7OWdx7kJFWaqLxBxNvvy5LtYqZn7t52mT5bmO1OPUjb2nsYcw-QqhHhATFkuVpwak9QS173oGCYBknx0CeRlCgwRYNQgcaoEpGewb2FkRHObjVq1q2zHGX27U7nq5n29JYPElOy_oWheI0EmZGm30Pjv8FX0ACy9C-A</recordid><startdate>20180917</startdate><enddate>20180917</enddate><creator>Ye, Dan</creator><creator>Rongpipi, Sintu</creator><creator>Litofsky, Joshua H.</creator><creator>Lee, Youngmin</creator><creator>Culp, Tyler E.</creator><creator>Yoo, Sang Ha</creator><creator>Jackson, Thomas N.</creator><creator>Wang, Cheng</creator><creator>Gomez, Esther W.</creator><creator>Gomez, Enrique D.</creator><general>Materials Research Society - Cambridge University Press</general><scope>OIOZB</scope><scope>OTOTI</scope></search><sort><creationdate>20180917</creationdate><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><author>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_16565023</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>MATERIALS SCIENCE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ye, Dan</creatorcontrib><creatorcontrib>Rongpipi, Sintu</creatorcontrib><creatorcontrib>Litofsky, Joshua H.</creatorcontrib><creatorcontrib>Lee, Youngmin</creatorcontrib><creatorcontrib>Culp, Tyler E.</creatorcontrib><creatorcontrib>Yoo, Sang Ha</creatorcontrib><creatorcontrib>Jackson, Thomas N.</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Gomez, Esther W.</creatorcontrib><creatorcontrib>Gomez, Enrique D.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><collection>OSTI.GOV - Hybrid</collection><collection>OSTI.GOV</collection><jtitle>MRS communications</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ye, Dan</au><au>Rongpipi, Sintu</au><au>Litofsky, Joshua H.</au><au>Lee, Youngmin</au><au>Culp, Tyler E.</au><au>Yoo, Sang Ha</au><au>Jackson, Thomas N.</au><au>Wang, Cheng</au><au>Gomez, Esther W.</au><au>Gomez, Enrique D.</au><aucorp>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</atitle><jtitle>MRS communications</jtitle><date>2018-09-17</date><risdate>2018</risdate><volume>9</volume><issue>1</issue><issn>2159-6859</issn><eissn>2159-6867</eissn><abstract>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</abstract><cop>United States</cop><pub>Materials Research Society - Cambridge University Press</pub><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 2159-6859 |
| ispartof | MRS communications, 2018-09, Vol.9 (1) |
| issn | 2159-6859 2159-6867 |
| language | eng |
| recordid | cdi_osti_scitechconnect_1656502 |
| source | Cambridge Journals - CAUL Collection; SpringerLink Journals - AutoHoldings |
| subjects | MATERIALS SCIENCE |
| title | Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-10T05%3A31%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Aluminum%20oxide%20free-standing%20thin%20films%20to%20enable%20nitrogen%20edge%20soft%20x-ray%20scattering&rft.jtitle=MRS%20communications&rft.au=Ye,%20Dan&rft.aucorp=Lawrence%20Berkeley%20National%20Lab.%20(LBNL),%20Berkeley,%20CA%20(United%20States)&rft.date=2018-09-17&rft.volume=9&rft.issue=1&rft.issn=2159-6859&rft.eissn=2159-6867&rft_id=info:doi/&rft_dat=%3Costi%3E1656502%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |