Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering

Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluoresce...

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Veröffentlicht in:MRS communications 2018-09, Vol.9 (1)
Hauptverfasser: Ye, Dan, Rongpipi, Sintu, Litofsky, Joshua H., Lee, Youngmin, Culp, Tyler E., Yoo, Sang Ha, Jackson, Thomas N., Wang, Cheng, Gomez, Esther W., Gomez, Enrique D.
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container_issue 1
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container_title MRS communications
container_volume 9
creator Ye, Dan
Rongpipi, Sintu
Litofsky, Joshua H.
Lee, Youngmin
Culp, Tyler E.
Yoo, Sang Ha
Jackson, Thomas N.
Wang, Cheng
Gomez, Esther W.
Gomez, Enrique D.
description Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.
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fullrecord <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_1656502</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1656502</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_16565023</originalsourceid><addsrcrecordid>eNqNi8EKgkAURYcoSMp_eLQX0pgxlxFFH1BrmcanTugb8D3B_j4X0bq7OWdx7kJFWaqLxBxNvvy5LtYqZn7t52mT5bmO1OPUjb2nsYcw-QqhHhATFkuVpwak9QS173oGCYBknx0CeRlCgwRYNQgcaoEpGewb2FkRHObjVq1q2zHGX27U7nq5n29JYPElOy_oWheI0EmZGm30Pjv8FX0ACy9C-A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><source>SpringerNature Journals</source><source>Cambridge University Press Journals Complete</source><creator>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D.</creator><creatorcontrib>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D. ; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><description>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</description><identifier>ISSN: 2159-6859</identifier><identifier>EISSN: 2159-6867</identifier><language>eng</language><publisher>United States: Materials Research Society - Cambridge University Press</publisher><subject>MATERIALS SCIENCE</subject><ispartof>MRS communications, 2018-09, Vol.9 (1)</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,315,782,786,887</link.rule.ids><backlink>$$Uhttps://www.osti.gov/servlets/purl/1656502$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Ye, Dan</creatorcontrib><creatorcontrib>Rongpipi, Sintu</creatorcontrib><creatorcontrib>Litofsky, Joshua H.</creatorcontrib><creatorcontrib>Lee, Youngmin</creatorcontrib><creatorcontrib>Culp, Tyler E.</creatorcontrib><creatorcontrib>Yoo, Sang Ha</creatorcontrib><creatorcontrib>Jackson, Thomas N.</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Gomez, Esther W.</creatorcontrib><creatorcontrib>Gomez, Enrique D.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><title>MRS communications</title><description>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</description><subject>MATERIALS SCIENCE</subject><issn>2159-6859</issn><issn>2159-6867</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqNi8EKgkAURYcoSMp_eLQX0pgxlxFFH1BrmcanTugb8D3B_j4X0bq7OWdx7kJFWaqLxBxNvvy5LtYqZn7t52mT5bmO1OPUjb2nsYcw-QqhHhATFkuVpwak9QS173oGCYBknx0CeRlCgwRYNQgcaoEpGewb2FkRHObjVq1q2zHGX27U7nq5n29JYPElOy_oWheI0EmZGm30Pjv8FX0ACy9C-A</recordid><startdate>20180917</startdate><enddate>20180917</enddate><creator>Ye, Dan</creator><creator>Rongpipi, Sintu</creator><creator>Litofsky, Joshua H.</creator><creator>Lee, Youngmin</creator><creator>Culp, Tyler E.</creator><creator>Yoo, Sang Ha</creator><creator>Jackson, Thomas N.</creator><creator>Wang, Cheng</creator><creator>Gomez, Esther W.</creator><creator>Gomez, Enrique D.</creator><general>Materials Research Society - Cambridge University Press</general><scope>OIOZB</scope><scope>OTOTI</scope></search><sort><creationdate>20180917</creationdate><title>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</title><author>Ye, Dan ; Rongpipi, Sintu ; Litofsky, Joshua H. ; Lee, Youngmin ; Culp, Tyler E. ; Yoo, Sang Ha ; Jackson, Thomas N. ; Wang, Cheng ; Gomez, Esther W. ; Gomez, Enrique D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_16565023</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>MATERIALS SCIENCE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ye, Dan</creatorcontrib><creatorcontrib>Rongpipi, Sintu</creatorcontrib><creatorcontrib>Litofsky, Joshua H.</creatorcontrib><creatorcontrib>Lee, Youngmin</creatorcontrib><creatorcontrib>Culp, Tyler E.</creatorcontrib><creatorcontrib>Yoo, Sang Ha</creatorcontrib><creatorcontrib>Jackson, Thomas N.</creatorcontrib><creatorcontrib>Wang, Cheng</creatorcontrib><creatorcontrib>Gomez, Esther W.</creatorcontrib><creatorcontrib>Gomez, Enrique D.</creatorcontrib><creatorcontrib>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</creatorcontrib><collection>OSTI.GOV - Hybrid</collection><collection>OSTI.GOV</collection><jtitle>MRS communications</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ye, Dan</au><au>Rongpipi, Sintu</au><au>Litofsky, Joshua H.</au><au>Lee, Youngmin</au><au>Culp, Tyler E.</au><au>Yoo, Sang Ha</au><au>Jackson, Thomas N.</au><au>Wang, Cheng</au><au>Gomez, Esther W.</au><au>Gomez, Enrique D.</au><aucorp>Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering</atitle><jtitle>MRS communications</jtitle><date>2018-09-17</date><risdate>2018</risdate><volume>9</volume><issue>1</issue><issn>2159-6859</issn><eissn>2159-6867</eissn><abstract>Resonant soft x-ray scattering (RSoXS) leverages chemical specificity to characterize thin films but is limited near the nitrogen edge. The challenge is that commercially available x-ray transparent substrates are composed of Si3N4 and thereby absorb incident x-rays and generate incoherent fluorescence. To overcome this challenge, we designed and fabricated Al2O3 free-standing films for use as RSoXS windows. Al2O3 films offer higher x-ray transmittance and minimal fluorescence near the nitrogen edge. As an example, Al2O3 windows allow for nitrogen RSoXS of conjugated block copolymer thin films that reveal domain spacings, which are not apparent with commercially available Si3N4 substrates.</abstract><cop>United States</cop><pub>Materials Research Society - Cambridge University Press</pub><oa>free_for_read</oa></addata></record>
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title Aluminum oxide free-standing thin films to enable nitrogen edge soft x-ray scattering
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-05T20%3A06%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Aluminum%20oxide%20free-standing%20thin%20films%20to%20enable%20nitrogen%20edge%20soft%20x-ray%20scattering&rft.jtitle=MRS%20communications&rft.au=Ye,%20Dan&rft.aucorp=Lawrence%20Berkeley%20National%20Lab.%20(LBNL),%20Berkeley,%20CA%20(United%20States)&rft.date=2018-09-17&rft.volume=9&rft.issue=1&rft.issn=2159-6859&rft.eissn=2159-6867&rft_id=info:doi/&rft_dat=%3Costi%3E1656502%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true