Low-density polymer thin film formation in supercritical carbon dioxide

We report a method for producing stable low-density polymer films by using supercritical carbon dioxide (scCO2). Two different molecular weight polystyrene films with various thicknesses were exposed to scCO2 along the density fluctuation ridge in P–T phase diagram. The swollen structures could be t...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2003-11, Vol.83 (21), p.4309-4311
Hauptverfasser: Koga, Tadanori, Seo, Y.-S., Jerome, J. L., Ge, S., Rafailovich, M. H., Sokolov, J. C., Chu, B., Seeck, O. H., Tolan, M., Kolb, R.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 4311
container_issue 21
container_start_page 4309
container_title Applied physics letters
container_volume 83
creator Koga, Tadanori
Seo, Y.-S.
Jerome, J. L.
Ge, S.
Rafailovich, M. H.
Sokolov, J. C.
Chu, B.
Seeck, O. H.
Tolan, M.
Kolb, R.
description We report a method for producing stable low-density polymer films by using supercritical carbon dioxide (scCO2). Two different molecular weight polystyrene films with various thicknesses were exposed to scCO2 along the density fluctuation ridge in P–T phase diagram. The swollen structures could be then frozen by flash evaporation of CO2 without forming additional voids. X-ray reflectivity data clearly showed that exposure to scCO2 could be used to produce uniform low-density films of about 2Rg thick or less, where Rg is radius of polymer gyration.
doi_str_mv 10.1063/1.1629799
format Article
fullrecord <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_15015342</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_1629799</sourcerecordid><originalsourceid>FETCH-LOGICAL-c356t-d47338d403c225a866a8580177ef1e7275e754a8b3a39053e5231f09524d2eec3</originalsourceid><addsrcrecordid>eNotkEFLxDAUhIMouK4e_AcFTx665uU1TXuURXeFghc9h2z6ykbapiQR7b-3snsaZvgYhmHsHvgGeIlPsIFS1KquL9gKuFI5AlSXbMU5x7ysJVyzmxi_FisF4ortGv-TtzRGl-Zs8v08UMjS0Y1Z5_oh63wYTHJ-zJYkfk8UbHDJWdNn1oTDkrfO_7qWbtlVZ_pId2dds8_Xl4_tPm_ed2_b5ya3KMuUt4VCrNqCoxVCmqosTSUrDkpRB6SEkqRkYaoDGqy5RFpWQsdrKYpWEFlcs4dTr4_J6WhdInu0fhzJJg2Sg8RCLNTjibLBxxio01NwgwmzBq7_f9Kgzz_hH_65WO4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Low-density polymer thin film formation in supercritical carbon dioxide</title><source>AIP Journals Complete</source><source>AIP Digital Archive</source><creator>Koga, Tadanori ; Seo, Y.-S. ; Jerome, J. L. ; Ge, S. ; Rafailovich, M. H. ; Sokolov, J. C. ; Chu, B. ; Seeck, O. H. ; Tolan, M. ; Kolb, R.</creator><creatorcontrib>Koga, Tadanori ; Seo, Y.-S. ; Jerome, J. L. ; Ge, S. ; Rafailovich, M. H. ; Sokolov, J. C. ; Chu, B. ; Seeck, O. H. ; Tolan, M. ; Kolb, R. ; Brookhaven National Laboratory, National Synchrotron Light Source (US)</creatorcontrib><description>We report a method for producing stable low-density polymer films by using supercritical carbon dioxide (scCO2). Two different molecular weight polystyrene films with various thicknesses were exposed to scCO2 along the density fluctuation ridge in P–T phase diagram. The swollen structures could be then frozen by flash evaporation of CO2 without forming additional voids. X-ray reflectivity data clearly showed that exposure to scCO2 could be used to produce uniform low-density films of about 2Rg thick or less, where Rg is radius of polymer gyration.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.1629799</identifier><language>eng</language><publisher>United States</publisher><subject>CARBON DIOXIDE ; DENSITY ; MATERIALS SCIENCE ; NATIONAL SYNCHROTRON LIGHT SOURCE ; POLYMERS ; SUPERCRITICAL STATE ; SYNTHESIS ; THIN FILMS</subject><ispartof>Applied physics letters, 2003-11, Vol.83 (21), p.4309-4311</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c356t-d47338d403c225a866a8580177ef1e7275e754a8b3a39053e5231f09524d2eec3</citedby><cites>FETCH-LOGICAL-c356t-d47338d403c225a866a8580177ef1e7275e754a8b3a39053e5231f09524d2eec3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881,27901,27902</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/15015342$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Koga, Tadanori</creatorcontrib><creatorcontrib>Seo, Y.-S.</creatorcontrib><creatorcontrib>Jerome, J. L.</creatorcontrib><creatorcontrib>Ge, S.</creatorcontrib><creatorcontrib>Rafailovich, M. H.</creatorcontrib><creatorcontrib>Sokolov, J. C.</creatorcontrib><creatorcontrib>Chu, B.</creatorcontrib><creatorcontrib>Seeck, O. H.</creatorcontrib><creatorcontrib>Tolan, M.</creatorcontrib><creatorcontrib>Kolb, R.</creatorcontrib><creatorcontrib>Brookhaven National Laboratory, National Synchrotron Light Source (US)</creatorcontrib><title>Low-density polymer thin film formation in supercritical carbon dioxide</title><title>Applied physics letters</title><description>We report a method for producing stable low-density polymer films by using supercritical carbon dioxide (scCO2). Two different molecular weight polystyrene films with various thicknesses were exposed to scCO2 along the density fluctuation ridge in P–T phase diagram. The swollen structures could be then frozen by flash evaporation of CO2 without forming additional voids. X-ray reflectivity data clearly showed that exposure to scCO2 could be used to produce uniform low-density films of about 2Rg thick or less, where Rg is radius of polymer gyration.</description><subject>CARBON DIOXIDE</subject><subject>DENSITY</subject><subject>MATERIALS SCIENCE</subject><subject>NATIONAL SYNCHROTRON LIGHT SOURCE</subject><subject>POLYMERS</subject><subject>SUPERCRITICAL STATE</subject><subject>SYNTHESIS</subject><subject>THIN FILMS</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNotkEFLxDAUhIMouK4e_AcFTx665uU1TXuURXeFghc9h2z6ykbapiQR7b-3snsaZvgYhmHsHvgGeIlPsIFS1KquL9gKuFI5AlSXbMU5x7ysJVyzmxi_FisF4ortGv-TtzRGl-Zs8v08UMjS0Y1Z5_oh63wYTHJ-zJYkfk8UbHDJWdNn1oTDkrfO_7qWbtlVZ_pId2dds8_Xl4_tPm_ed2_b5ya3KMuUt4VCrNqCoxVCmqosTSUrDkpRB6SEkqRkYaoDGqy5RFpWQsdrKYpWEFlcs4dTr4_J6WhdInu0fhzJJg2Sg8RCLNTjibLBxxio01NwgwmzBq7_f9Kgzz_hH_65WO4</recordid><startdate>20031124</startdate><enddate>20031124</enddate><creator>Koga, Tadanori</creator><creator>Seo, Y.-S.</creator><creator>Jerome, J. L.</creator><creator>Ge, S.</creator><creator>Rafailovich, M. H.</creator><creator>Sokolov, J. C.</creator><creator>Chu, B.</creator><creator>Seeck, O. H.</creator><creator>Tolan, M.</creator><creator>Kolb, R.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20031124</creationdate><title>Low-density polymer thin film formation in supercritical carbon dioxide</title><author>Koga, Tadanori ; Seo, Y.-S. ; Jerome, J. L. ; Ge, S. ; Rafailovich, M. H. ; Sokolov, J. C. ; Chu, B. ; Seeck, O. H. ; Tolan, M. ; Kolb, R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c356t-d47338d403c225a866a8580177ef1e7275e754a8b3a39053e5231f09524d2eec3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>CARBON DIOXIDE</topic><topic>DENSITY</topic><topic>MATERIALS SCIENCE</topic><topic>NATIONAL SYNCHROTRON LIGHT SOURCE</topic><topic>POLYMERS</topic><topic>SUPERCRITICAL STATE</topic><topic>SYNTHESIS</topic><topic>THIN FILMS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Koga, Tadanori</creatorcontrib><creatorcontrib>Seo, Y.-S.</creatorcontrib><creatorcontrib>Jerome, J. L.</creatorcontrib><creatorcontrib>Ge, S.</creatorcontrib><creatorcontrib>Rafailovich, M. H.</creatorcontrib><creatorcontrib>Sokolov, J. C.</creatorcontrib><creatorcontrib>Chu, B.</creatorcontrib><creatorcontrib>Seeck, O. H.</creatorcontrib><creatorcontrib>Tolan, M.</creatorcontrib><creatorcontrib>Kolb, R.</creatorcontrib><creatorcontrib>Brookhaven National Laboratory, National Synchrotron Light Source (US)</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Koga, Tadanori</au><au>Seo, Y.-S.</au><au>Jerome, J. L.</au><au>Ge, S.</au><au>Rafailovich, M. H.</au><au>Sokolov, J. C.</au><au>Chu, B.</au><au>Seeck, O. H.</au><au>Tolan, M.</au><au>Kolb, R.</au><aucorp>Brookhaven National Laboratory, National Synchrotron Light Source (US)</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low-density polymer thin film formation in supercritical carbon dioxide</atitle><jtitle>Applied physics letters</jtitle><date>2003-11-24</date><risdate>2003</risdate><volume>83</volume><issue>21</issue><spage>4309</spage><epage>4311</epage><pages>4309-4311</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><abstract>We report a method for producing stable low-density polymer films by using supercritical carbon dioxide (scCO2). Two different molecular weight polystyrene films with various thicknesses were exposed to scCO2 along the density fluctuation ridge in P–T phase diagram. The swollen structures could be then frozen by flash evaporation of CO2 without forming additional voids. X-ray reflectivity data clearly showed that exposure to scCO2 could be used to produce uniform low-density films of about 2Rg thick or less, where Rg is radius of polymer gyration.</abstract><cop>United States</cop><doi>10.1063/1.1629799</doi><tpages>3</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0003-6951
ispartof Applied physics letters, 2003-11, Vol.83 (21), p.4309-4311
issn 0003-6951
1077-3118
language eng
recordid cdi_osti_scitechconnect_15015342
source AIP Journals Complete; AIP Digital Archive
subjects CARBON DIOXIDE
DENSITY
MATERIALS SCIENCE
NATIONAL SYNCHROTRON LIGHT SOURCE
POLYMERS
SUPERCRITICAL STATE
SYNTHESIS
THIN FILMS
title Low-density polymer thin film formation in supercritical carbon dioxide
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T07%3A21%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Low-density%20polymer%20thin%20film%20formation%20in%20supercritical%20carbon%20dioxide&rft.jtitle=Applied%20physics%20letters&rft.au=Koga,%20Tadanori&rft.aucorp=Brookhaven%20National%20Laboratory,%20National%20Synchrotron%20Light%20Source%20(US)&rft.date=2003-11-24&rft.volume=83&rft.issue=21&rft.spage=4309&rft.epage=4311&rft.pages=4309-4311&rft.issn=0003-6951&rft.eissn=1077-3118&rft_id=info:doi/10.1063/1.1629799&rft_dat=%3Ccrossref_osti_%3E10_1063_1_1629799%3C/crossref_osti_%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true