Surface Instability and Chemical Reactivity of ZrSiS and ZrSiSe Nodal‐Line Semimetals

Materials exhibiting nodal‐line fermions promise superb impact on technology for the prospect of dissipationless spintronic devices. Among nodal‐line semimetals, the ZrSiX (X = S, Se, Te) class is the most suitable candidate for such applications. However, the surface chemical reactivity of ZrSiS an...

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Veröffentlicht in:	Advanced functional materials 2019-05, Vol.29 (18), p.n/a
Hauptverfasser:	Boukhvalov, Danil W., Edla, Raju, Cupolillo, Anna, Fabio, Vito, Sankar, Raman, Zhu, Yanglin, Mao, Zhiqiang, Hu, Jin, Torelli, Piero, Chiarello, Gennaro, Ottaviano, Luca, Politano, Antonio
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical activity Chemical compounds Density functional theory Fermions Materials science Metalloids Organic chemistry Oxidation Silicon surface science Surface stability topological materials vibrational spectroscopy X‐ray photoelectron spectroscopy Zirconium
Online-Zugang:	Volltext
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