Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates

Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2018-09, Vol.36 (5)
Hauptverfasser: Alameri, Dheyaa, Ocola, Leonidas E., Kuljanishvili, Irma
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Sprache:eng
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container_title Journal of vacuum science & technology. A, Vacuum, surfaces, and films
container_volume 36
creator Alameri, Dheyaa
Ocola, Leonidas E.
Kuljanishvili, Irma
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fullrecord <record><control><sourceid>osti</sourceid><recordid>TN_cdi_osti_scitechconnect_1461717</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1461717</sourcerecordid><originalsourceid>FETCH-osti_scitechconnect_14617173</originalsourceid><addsrcrecordid>eNqNjMFOwzAQRC3USqQt_7DqPcJ2mwbOFMQFcSj3ynE2ypawW3ldBJz4dELFB3Aajea9uTCFq7wtb6rqdmIKW6_WpXfWXZqZ6sFa673dFOb7Kehr2SVE6EKTKIZMwhC4hdjj29gHeA9HSdDiUZTOq35y7lFJQTo4DTmF3BPDF3EE-aAWYRSTJGoa4RFi2NH1jp7Bn4_9FvTU6K-GujDTLgyKV385N8uH-5e7x1I0014jZYx9FGaMee_WG1e7evUv6AfOrVG4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Alameri, Dheyaa ; Ocola, Leonidas E. ; Kuljanishvili, Irma</creator><creatorcontrib>Alameri, Dheyaa ; Ocola, Leonidas E. ; Kuljanishvili, Irma</creatorcontrib><identifier>ISSN: 0734-2101</identifier><identifier>EISSN: 1520-8559</identifier><language>eng</language><publisher>United States: American Vacuum Society</publisher><ispartof>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films, 2018-09, Vol.36 (5)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,776,780,881</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/1461717$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Alameri, Dheyaa</creatorcontrib><creatorcontrib>Ocola, Leonidas E.</creatorcontrib><creatorcontrib>Kuljanishvili, Irma</creatorcontrib><title>Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates</title><title>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</title><issn>0734-2101</issn><issn>1520-8559</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqNjMFOwzAQRC3USqQt_7DqPcJ2mwbOFMQFcSj3ynE2ypawW3ldBJz4dELFB3Aajea9uTCFq7wtb6rqdmIKW6_WpXfWXZqZ6sFa673dFOb7Kehr2SVE6EKTKIZMwhC4hdjj29gHeA9HSdDiUZTOq35y7lFJQTo4DTmF3BPDF3EE-aAWYRSTJGoa4RFi2NH1jp7Bn4_9FvTU6K-GujDTLgyKV385N8uH-5e7x1I0014jZYx9FGaMee_WG1e7evUv6AfOrVG4</recordid><startdate>20180901</startdate><enddate>20180901</enddate><creator>Alameri, Dheyaa</creator><creator>Ocola, Leonidas E.</creator><creator>Kuljanishvili, Irma</creator><general>American Vacuum Society</general><scope>OTOTI</scope></search><sort><creationdate>20180901</creationdate><title>Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates</title><author>Alameri, Dheyaa ; Ocola, Leonidas E. ; Kuljanishvili, Irma</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-osti_scitechconnect_14617173</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Alameri, Dheyaa</creatorcontrib><creatorcontrib>Ocola, Leonidas E.</creatorcontrib><creatorcontrib>Kuljanishvili, Irma</creatorcontrib><collection>OSTI.GOV</collection><jtitle>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Alameri, Dheyaa</au><au>Ocola, Leonidas E.</au><au>Kuljanishvili, Irma</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates</atitle><jtitle>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</jtitle><date>2018-09-01</date><risdate>2018</risdate><volume>36</volume><issue>5</issue><issn>0734-2101</issn><eissn>1520-8559</eissn><cop>United States</cop><pub>American Vacuum Society</pub></addata></record>
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ispartof Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-09, Vol.36 (5)
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1520-8559
language eng
recordid cdi_osti_scitechconnect_1461717
source AIP Journals Complete; Alma/SFX Local Collection
title Mask-free fabrication and chemical vapor deposition synthesis of ultrathin zinc oxide microribbons on Si/SiO 2 and 2D substrates
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T23%3A54%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-osti&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Mask-free%20fabrication%20and%20chemical%20vapor%20deposition%20synthesis%20of%20ultrathin%20zinc%20oxide%20microribbons%20on%20Si/SiO%202%20and%202D%20substrates&rft.jtitle=Journal%20of%20vacuum%20science%20&%20technology.%20A,%20Vacuum,%20surfaces,%20and%20films&rft.au=Alameri,%20Dheyaa&rft.date=2018-09-01&rft.volume=36&rft.issue=5&rft.issn=0734-2101&rft.eissn=1520-8559&rft_id=info:doi/&rft_dat=%3Costi%3E1461717%3C/osti%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true